Infrared reflectance study of chemical-vapor-deposition-grown 3C-silicon carbide on silicon substrate

Mapping Intimacies ◽

10.1117/12.392142 ◽

2000 ◽

Author(s):

W. F. Chan ◽

Zhe Chuan Feng ◽

Soo-Jin Chua ◽

Jianyi Lin

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Infrared Reflectance

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ChemInform Abstract: CHEMICAL VAPOR DEPOSITION OF SINGLE CRYSTALLINE β-SILICON CARBIDE FILMS ON SILICON SUBSTRATE WITH SPUTTERED SILICON CARBIDE INTERMEDIATE LAYER

Chemischer Informationsdienst ◽

10.1002/chin.198112008 ◽

1981 ◽

Vol 12 (12) ◽

Author(s):

S. NISHINO ◽

Y. HAZUKI ◽

H. MATSUNAMI ◽

T. TANAKA

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Substrate ◽

Intermediate Layer ◽

Chemical Vapor ◽

Single Crystalline

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Plasma-Assisted Chemical Vapor Deposition of Cubic Silicon Carbide on Silicon Substrate

Amorphous and Crystalline Silicon Carbide and Related Materials - Springer Proceedings in Physics ◽

10.1007/978-3-642-93406-3_28 ◽

1989 ◽

pp. 186-191 ◽

Author(s):

S. Nishino ◽

J. Saraie

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Cubic Silicon Carbide

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Improvement of process parameters for polycrystalline silicon carbide low pressure chemical vapor deposition on 150mm silicon substrate using monomethylsilane as precursor

Thin Solid Films ◽

10.1016/j.tsf.2013.03.053 ◽

2013 ◽

Vol 536 ◽

pp. 94-98 ◽

Author(s):

A. Ajayakumar ◽

S. Maruthoor ◽

T. Fuchs ◽

F. Rohlfing ◽

O. Jakovlev ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Process Parameters ◽

Vapor Deposition ◽

Silicon Substrate ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Low Pressure ◽

Polycrystalline Silicon Carbide ◽

Pressure Chemical

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AC Plasma-Assisted Chemical Vapor Deposition of Cubic Silicon Carbide on Silicon Substrate

Springer Proceedings in Physics - Amorphous and Crystalline Silicon Carbide IV ◽

10.1007/978-3-642-84804-9_16 ◽

1992 ◽

pp. 119-125 ◽

Author(s):

H. Shimizu ◽

K. Naito ◽

S. Ishio

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Cubic Silicon Carbide

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Modeling of silicon carbide chemical vapor deposition in a vertical reactor

Materials Science and Engineering B ◽

10.1016/s0921-5107(98)00496-6 ◽

1999 ◽

Vol 61-62 ◽

pp. 172-175 ◽

Author(s):

A.N. Vorob’ev ◽

Yu.E. Egorov ◽

Yu.N. Makarov ◽

A.I. Zhmakin ◽

A.O. Galyukov ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

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Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1415 ◽

2007 ◽

Vol 46 (4A) ◽

pp. 1415-1426 ◽

Author(s):

Shinsuke Miyajima ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Nanocrystalline Silicon Carbide ◽

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CFD Simulation of Chemical Vapor Deposition of Silicon Carbide in CH3SiCl3-H2 System

Current Nanoscience ◽

10.2174/1573413709666131109003414 ◽

2014 ◽

Vol 10 (1) ◽

pp. 135-137 ◽

Author(s):

Kyoon Choi ◽

Jun-Woo Kim

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cfd Simulation ◽

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Low-Pressure Chemical Vapor Deposition of Silicon Carbide Thin Films from Organopolysilanes

Journal of the Chinese Chemical Society ◽

10.1002/jccs.199100039 ◽

1991 ◽

Vol 38 (3) ◽

pp. 231-234 ◽

Author(s):

Hsin-Tien Chiu ◽

Pei-Fang Wu

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical

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The effects of C3H8 on the chemical vapor deposition of silicon carbide in the CH3SiCl3 + H2 system

Journal of the European Ceramic Society ◽

10.1016/0955-2219(92)90094-t ◽

1992 ◽

Vol 9 (5) ◽

pp. 357-363 ◽

Author(s):

Byung Jin Choi ◽

Sun Ho Jeun ◽

Dai Ryong Kim

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

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Pressure dependent structural and optical properties of silicon carbide thin films deposited by hot wire chemical vapor deposition from pure silane and methane gases

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-012-0934-z ◽

2012 ◽

Vol 24 (4) ◽

pp. 1361-1368 ◽

Author(s):

Fatemeh Shariatmadar Tehrani ◽

Boon Tong Goh ◽

Muhamad Rasat Muhamad ◽

Saadah Abdul Rahman

Keyword(s):

Silicon Carbide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Structural And Optical Properties

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