65-nm photolithography process window qualification study with advanced e-beam metrology and inspection systems

Author(s):  
Ruei Hung Hsu ◽  
Benjamin Szu-Min Lin ◽  
Wei-Yih Wu ◽  
Hong Xiao ◽  
Jack Jau
2020 ◽  
Vol 96 (3s) ◽  
pp. 756-757
Author(s):  
Е.С. Шамин ◽  
Е.Л. Харченко

Данная работа посвящена описанию возможного алгоритма создания моделей резиста с постоянным порогом и расчета окон процесса на их основе. Приведенные изыскания реализованы в виде программного средства, использующего средства моделирования фотолитографии Mentor Graphics Calibre. This work is dedicated to the description of one of possible algorithms of constant threshold resist model generation used for photolithography process window calculation. This algorithm has been realized in the form of a program using Mentor Graphics Calibre modeling tools.


2003 ◽  
Vol 766 ◽  
Author(s):  
J. Gambino ◽  
T. Stamper ◽  
H. Trombley ◽  
S. Luce ◽  
F. Allen ◽  
...  

AbstractA trench-first dual damascene process has been developed for fat wires (1.26 μm pitch, 1.1 μm thickness) in a 0.18 μm CMOS process with copper/fluorosilicate glass (FSG) interconnect technology. The process window for the patterning of vias in such deep trenches depends on the trench depth and on the line width of the trench, with the worse case being an intermediate line width (lines that are 3X the via diameter). Compared to a single damascene process, the dual damascene process has comparable yield and reliability, with lower via resistance and lower cost.


2007 ◽  
Vol 18 (1) ◽  
pp. 30-48 ◽  
Author(s):  
Edem Tetteh ◽  
Xiaochun Jiang ◽  
Daniel Mountjoy ◽  
Younho Seong ◽  
Maranda McBride
Keyword(s):  

Author(s):  
Baichun Zhang ◽  
Jianguo Yang ◽  
Lei Sun ◽  
Quanbo Li ◽  
Jun Huang ◽  
...  
Keyword(s):  

Micromachines ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 10
Author(s):  
Alexander Kukaev ◽  
Dmitry Lukyanov ◽  
Denis Mikhailenko ◽  
Daniil Safronov ◽  
Sergey Shevchenko ◽  
...  

Originally, sensors based on surface acoustic waves are fabricated using photolithography, which becomes extremely expensive when a small series or even single elements are needed for the research. A laser thin film local evaporation technique is proposed to substitute the photolithography process in the production of surface acoustic wave based inertial sensors prototypes. To estimate its potential a prototype of a surface acoustic wave gyroscope sensing element was fabricated and tested. Its was shown that the frequency mismatch is no more than 1%, but dispersion of the wave on small inertial masses leads to a spurious parasitic signal on receiving electrodes. Possible ways of its neglecting is discussed.


Sensors ◽  
2021 ◽  
Vol 21 (15) ◽  
pp. 5039
Author(s):  
Tae-Hyun Kim ◽  
Hye-Rin Kim ◽  
Yeong-Jun Cho

In this study, we present a framework for product quality inspection based on deep learning techniques. First, we categorize several deep learning models that can be applied to product inspection systems. In addition, we explain the steps for building a deep-learning-based inspection system in detail. Second, we address connection schemes that efficiently link deep learning models to product inspection systems. Finally, we propose an effective method that can maintain and enhance a product inspection system according to improvement goals of the existing product inspection systems. The proposed system is observed to possess good system maintenance and stability owing to the proposed methods. All the proposed methods are integrated into a unified framework and we provide detailed explanations of each proposed method. In order to verify the effectiveness of the proposed system, we compare and analyze the performance of the methods in various test scenarios. We expect that our study will provide useful guidelines to readers who desire to implement deep-learning-based systems for product inspection.


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