Effect of r-Al2O3 Single-Crystal Substrate on Growth of Ti1– xVxO2 Particles under Hydrothermal Conditions

2020 ◽  
Vol 65 (3) ◽  
pp. 299-304
Author(s):  
O. N. Makarevich ◽  
A. V. Ivanov ◽  
A. I. Gavrilov ◽  
A. M. Makarevich ◽  
O. V. Boytsova
2006 ◽  
Vol 89 (23) ◽  
pp. 232906 ◽  
Author(s):  
X. Y. Zhou ◽  
T. Heindl ◽  
G. K. H. Pang ◽  
J. Miao ◽  
R. K. Zheng ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (9) ◽  
pp. 2068 ◽  
Author(s):  
Yusuke Yabara ◽  
Seiichiro Izawa ◽  
Masahiro Hiramoto

In this study, the operation of donor/acceptor photovoltaic cells fabricated on homoepitaxially grown p-doped rubrene single-crystal substrates is demonstrated. The photocurrent density is dominated by the sheet conductivity (σ□) of the p-type single-crystal layer doped to 100 ppm with an iron chloride (Fe2Cl6) acceptor. A 65 μm thick p-type rubrene single-crystal substrate is expected to be required for a photocurrent density of 20 mA·cm−2. An entire bulk doping technique for rubrene single crystals is indispensable for the fabrication of practical organic single-crystal solar cells.


2018 ◽  
Vol 913 ◽  
pp. 264-269
Author(s):  
Lei Li ◽  
Yan Liu ◽  
Xiao Nan Mao ◽  
Vincent Ji

High strength, low density, and excellent corrosion resistance are the main properties that make titanium attractive for a variety of applications. The phase structures and phase transitions of titanium, which are of tremendous scientific and technological interest, have attracted a great deal of attention for many years. In addition to hexagonal close packed α-Ti, high temperature phase β-Ti with body-centered cubic structure and ω-Ti with the hexagonal structure of high-pressure phase, the face-centered cubic structure, which is not in the P-T diagram of titanium, is observed in ultrathin films. In the present paper, the Ti films prepared by magnetron sputtering on MgO(111) single crystal substrate were investigated by means of X-Ray Diffraction (XRD) and High-Resolution Transmission Electron Microscope (HRTEM). The results showed that the Ti films grow epitaxial with a face centered cubic (fcc) structure even the thickness is up to about 50nm. With the thickness increases, the Ti films transformed to hexagonal close packed (hcp) structure and showed an epitaxial growth along (002)hcp-Ti direction. The results show that the onset thickness of fcc-hcp structure transformation is 50-100nm. The temperature and power of sputter affect the formation of fcc-Ti.


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