FIELD EMISSION FROM CARBON FILMS GROWN BY THE CATHODIC ARC PROCESS

2000 ◽  
Vol 14 (02n03) ◽  
pp. 301-307 ◽  
Author(s):  
W. I. MILNE ◽  
J. ROBERTSON ◽  
B. S. SATYANARAYANA ◽  
A. HART
Keyword(s):  
Field Emission ◽  
Room Temperature ◽  
Deposition Process ◽  
Carbon Films ◽  
Deposition Parameters ◽  
Bonding Ratio ◽  
Cluster Beams ◽  
Cathodic Arc ◽  
Tetrahedrally Bonded

By using the catholic vacuum are deposition process, carbon films with variable sp 3/ sp 2 bonding ratio can be deposited on a variety of substrates at room temperature. The morphology of the films can be varied from the mirror like smooth tetrahedrally bonded carbon (ta-C) films through nanocluster to fibrous type carbon by altering the deposition parameters. This paper reviews the work carried out on Field Emission from such carbon films and compares the results with those on nanocluster films prepared using supersonic cluster beams. Threshold fields as low as 1 V /μ m with emission site densities of up to 104-105/ cm 2 have been obtained.

Field emission from heterostructured nanoseeded diamond and nanocluster carbon cathodes

2000 ◽  
Vol 621 ◽  
Author(s):  
B.S. Satyanarayana ◽  
K. Nishimura ◽  
A. Hiraki ◽  
W.I. Milne
Keyword(s):  
Field Emission ◽  
Electron Emission ◽  
Negative Differential Resistance ◽  
Resonant Tunneling ◽  
Room Temperature ◽  
Differential Resistance ◽  
Carbon Films ◽  
Nanocrystalline Diamond ◽  
Cold Cathodes ◽  
Cathodic Arc

ABSTRACTNovel heterostructured cold cathodes made of nanoseeded diamond and cathodic arc process grown nanocluster carbon films, were studied. The nanocrystalline diamond with varying diamond concentration was first coated on to the substrate. The nanocluster carbon films were then deposited on the nanoseeded diamond coated substrates using the cathodic arc process at room temperature. The resultant heterostructured microcathodes were observed to exhibit electron emission currents of 1μA/cm2 at low fields of 1.2 - 5 V/μm. Further some of the samples seem to exhibit I-V characteristics with a negative differential resistance region at room temperature conditions. This negative differential resistance or the resonant tunneling behaviour was observed to be dependent on the nanoseeded diamond concentration.

Low Threshold Field Emission From Nanocluster Carbon Films

1999 ◽  
Vol 593 ◽  
Author(s):  
W.I. Milne ◽  
B.S. Satyanarayana ◽  
J. Robertson
Keyword(s):  
Field Emission ◽  
Deposition Process ◽  
Carbon Films ◽  
Vacuum Arc ◽  
Threshold Field ◽  
Bonding Ratio ◽  
Low Threshold ◽  
Current Densities ◽  
Vacuum Arc Deposition ◽  
Arc Deposition

ABSTRACTCarbon films with variable sp3/sp2 bonding ratio can be deposited on a variety of substrates at room temperature, using the cathodic vacuum arc deposition process. The variation in their surface morphology as a function of He and N2partial pressure during growth have been investigated and it has been shown that the morphology of the films can be varied from the mirror like smooth tetrahedrally bonded carbon (ta-C) films through nanocluster to fibrous type carbon. This paper reviews the work carried out on Field Emission from these various carbon films. Threshold fields as low as 1 V/μm for emission current densities of 1 μA/cm2 and emission site densities of up to 104 -105/cm2 have been obtained.

Field Emission from Tetrahedrally Bonded Amorphous Carbon

1997 ◽  
Vol 471 ◽  
Author(s):  
W. I. Milne ◽  
J. Robertson ◽  
B. S. Satyanarayanan ◽  
A. Hart
Keyword(s):  
Field Emission ◽  
Amorphous Carbon ◽  
Applied Field ◽  
Vacuum Arc ◽  
Threshold Field ◽  
Nitrogen Doped ◽  
Bonding Ratio ◽  
Current Densities ◽  
Filtered Cathodic Vacuum Arc ◽  
Tetrahedrally Bonded

ABSTRACTA series of tetrahedrally bonded carbon (ta-C) films have been produced using a Filtered Cathodic Vacuum Arc System. The threshold field and current densities achievable have been investigated as a function of sp3/sp2 bonding ratio and nitrogen content. Typical undoped ta-C films have a threshold field of 15–20V/μm and optimally nitrogen doped films exhibit threshold fields as low as ∼ 5 V/μm. Current densities of typically 10-4 A/cm2 at an applied field of 20V/micron were also obtained.

Morphology of Low Temperature Carbon Films Prepared by VHF CVD: Correlation with Field Emission

1998 ◽  
Vol 509 ◽  
Author(s):  
A.N. Titkov ◽  
A.I. Kosarev ◽  
A.J. Vinogradov ◽  
Z. Waqar ◽  
I.V. Makarenko ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Low Temperature ◽  
Field Emission ◽  
Significant Influence ◽  
Substrate Surface ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

AbstractThe effect of deposition parameters and substrate on the morphology of carbon films prepared in VHF plasma at low temperature has been studied by Atomic Force Microscopy. Carbon films demonstrating superior emission characteristics were the smoothest, but not all of the smoothest films demonstrated good emission. Significant influence of pre-growth treatment of the substrate surface on the emission characteristics of the films was found.

Influence of Deposition Parameters on the Properties of Nanocomposite Coatings Prepared by Cathodic Arc Evaporation

2016 ◽  
Vol 368 ◽  
pp. 77-81
Author(s):  
Miroslav Béger ◽  
Jozef Sondor ◽  
Martin Sahul ◽  
Paulína Zacková ◽  
Marián Haršáni ◽  
...  
Keyword(s):  
Residual Stresses ◽  
Bias Voltage ◽  
Deposition Process ◽  
Gas Pressure ◽  
Nanocomposite Coatings ◽  
Evaporation Process ◽  
Deposition Parameters ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

The article deals with the influence of different deposition parameters on the selected properties of AlCrN/Si3N4 nanocomposite coatings. Bias voltage, cathodes currents and working gas pressure were changed during the deposition process. All coatings were deposited using Lateral Rotating Cathodes (LARC®) process that belongs to the group of cathodic arc evaporation PVD technologies. In comparison with the typical cathodic arc evaporation process which usually uses planar targets the LARC® process utilizes rotational cathodes that are positioned close to each other. Nanohardness, Young's modulus, thickness and residual stresses were determinated in order to evaluate the influence of deposition parameters on these coatings properties

Field Emission from Novel Room Temperature Grown Carbon Based Multilayered Cathodes

2001 ◽  
Vol 685 ◽  
Author(s):  
B.S. Satyanarayana ◽  
K. Nishimura ◽  
A. Hiraki
Keyword(s):  
Electron Emission ◽  
Room Temperature ◽  
Carbon Films ◽  
Nanocrystalline Diamond ◽  
Emission Characteristics ◽  
Amorphous Carbon Films ◽  
Cold Cathodes ◽  
Tetrahedral Amorphous Carbon ◽  
Low Field ◽  
Cathodic Arc

AbstractLow field electron emission from novel room temperature grown multilayered cold cathodes were studied. The cathodes consisted of a layer of nanocrystalline diamond and a layer of nanocluster carbon films. The nanocrystalline diamond was first coated on to the substrate. The nanocluster carbon films and the tetrahedral amorphous carbon films were then deposited on the nanocrystalline diamond coated substrates using the cathodic arc process at room temperature. The heterostructured microcathodes were observed to exhibit electron emission currents of 1µA/cm2 at fields as low as 1 V/µm. The effect of the nanoseeded diamond size and concentration and the properties of different nanocluster carbon films on emission characteristics is presented.

Mechanical Properties of Laser Processed Diamond-Like Carbon Films

1995 ◽  
Vol 397 ◽  
Author(s):  
Ashok Kumar ◽  
R. B. Inturi ◽  
Y. Vohra ◽  
U. Ekanayake ◽  
N. Shu ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Room Temperature ◽  
Pyrolytic Graphite ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Chemical Properties ◽  
High Hardness ◽  
Deposition Process ◽  
Carbon Films ◽  
Diamond Like Carbon

ABSTRACTDiamond-like carbon (DLC) films have a unique combination of physical and chemical properties such as high hardness, optical transparency, low coefficient of friction and chemical inertness. A pulsed laser (248 nm) has been used to ablate a pyrolytic graphite target to deposit DLC films on Si (100) and 7059 Corning glass substrates. The deposition was carried out in high vacuum (≤ 10−6 Torr) at different temperatures ranging from room temperature to 400°C. The films were characterized by x-ray diffraction, scanning electron microscope, and Raman spectroscopie techniques. The mechanical properties (hardness and Young's modulus) of these films were characterized by nanoindentation. We have found that the films deposited at room temperature and 100°C show the characteristic features of DLC films and have the better hardness and modulus properties compared to the films fabricated at higher temperatures, which transform into amorphous carbon. Correlations of pulsed laser deposition process parameters with the properties of deposited DLC films will be discussed in this paper.

Sign in / Sign up

Export Citation Format

Share Document