Surface Acoustic Wave Properties of Lithium Tantalate Films Grown by Pulsed Laser Deposition

1995 ◽  
Vol 34 (Part 1, No. 1) ◽  
pp. 249-253 ◽  
Author(s):  
Yoshihiko Shibata ◽  
Naohiro Kuze ◽  
Masahiro Matsui ◽  
Yasuhito Kanno ◽  
KiyoshiKaya ◽  
...  
1993 ◽  
Vol 62 (23) ◽  
pp. 3046-3048 ◽  
Author(s):  
Yoshihiko Shibata ◽  
Kiyoshi Kaya ◽  
Kageyasu Akashi ◽  
Masaki Kanai ◽  
Tomoji Kawai ◽  
...  

1995 ◽  
Vol 77 (4) ◽  
pp. 1498-1503 ◽  
Author(s):  
Yoshihiko Shibata ◽  
Kiyoshi Kaya ◽  
Kageyasu Akashi ◽  
Masaki Kanai ◽  
Tomoji Kawai ◽  
...  

Nanomaterials ◽  
2020 ◽  
Vol 10 (4) ◽  
pp. 760 ◽  
Author(s):  
Izabela Constantinoiu ◽  
Cristian Viespe

The influence of sensitive porous films obtained by pulsed laser deposition (PLD) on the response of surface acoustic wave (SAW) sensors on hydrogen at room temperature (RT) was studied. Monolayer films of TiO2 and bilayer films of Pd/TiO2 were deposited on the quartz substrates of SAW sensors. By varying the oxygen and argon pressure in the PLD deposition chamber, different morphologies of the sensitive films were obtained, which were analyzed based on scanning electron microscopy (SEM) images. SAW sensors were realized with different porosity degrees, and these were tested at different hydrogen concentrations. It has been confirmed that the high porosity of the film and the bilayer structure leads to a higher frequency shift and allow the possibility to make tests at lower concentrations. Thus, the best sensor, Pd-1500/TiO2-600, with the deposition pressure of 600 mTorr for TiO2 and 1500 mTorr for Pd, had a frequency shift of 1.8 kHz at 2% hydrogen concentration, a sensitivity of 0.10 Hz/ppm and a limit of detection (LOD) of 1210 ppm. SAW sensors based on such porous films allow the detection of hydrogen but also of other gases at RT, and by PLD method such sensitive porous and nanostructured films can be easily developed.


2006 ◽  
Vol 510 (1-2) ◽  
pp. 77-81 ◽  
Author(s):  
Andreas Heinrich ◽  
Andreas L. Hörner ◽  
Achim Wixforth ◽  
Bernd Stritzker

2009 ◽  
Vol 381 (1) ◽  
pp. 92-99 ◽  
Author(s):  
Wen-Ching Shih ◽  
Xiao-Yun Sun ◽  
Tzyy-Long Wang ◽  
Mu-Shiang Wu

2014 ◽  
Vol 288 ◽  
pp. 572-578 ◽  
Author(s):  
Rafik Serhane ◽  
Samira Abdelli-Messaci ◽  
Slimane Lafane ◽  
Hammouche Khales ◽  
Walid Aouimeur ◽  
...  

2005 ◽  
Vol 19 (30) ◽  
pp. 1775-1782 ◽  
Author(s):  
HONG-YU LIU ◽  
XUE-MING MA ◽  
WANG-ZHOU SHI

Polycrystalline aluminium nitride (AlN) films were deposited on silicon substrates by pulsed laser deposition (PLD) at a substrate temperature in the range room temperature (RT)-800° C . Films grown on Si (111) substrates feature (002) and (110) preferred orientations at substrate temperatures below 400°C and above 600°C, respectively. Films morphology is good enough for surface acoustic wave (SAW) devices. The mechanism for formation and transformation of different preferred orientations in AlN films is discussed.


AIP Advances ◽  
2018 ◽  
Vol 8 (6) ◽  
pp. 065324 ◽  
Author(s):  
Zhen Chai ◽  
Xiaoyong Hu ◽  
Yifan Zhao ◽  
You Wu ◽  
Shufang Wang ◽  
...  

Author(s):  
Michael P. Mallamaci ◽  
James Bentley ◽  
C. Barry Carter

Glass-oxide interfaces play important roles in developing the properties of liquid-phase sintered ceramics and glass-ceramic materials. Deposition of glasses in thin-film form on oxide substrates is a potential way to determine the properties of such interfaces directly. Pulsed-laser deposition (PLD) has been successful in growing stoichiometric thin films of multicomponent oxides. Since traditional glasses are multicomponent oxides, there is the potential for PLD to provide a unique method for growing amorphous coatings on ceramics with precise control of the glass composition. Deposition of an anorthite-based (CaAl2Si2O8) glass on single-crystal α-Al2O3 was chosen as a model system to explore the feasibility of PLD for growing glass layers, since anorthite-based glass films are commonly found in the grain boundaries and triple junctions of liquid-phase sintered α-Al2O3 ceramics.Single-crystal (0001) α-Al2O3 substrates in pre-thinned form were used for film depositions. Prethinned substrates were prepared by polishing the side intended for deposition, then dimpling and polishing the opposite side, and finally ion-milling to perforation.


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