A Dual-Gate Complementary Metal-Oxide-Semiconductor Technology with Novel Self-Aligned Pocket Implantation which Takes Advantage of Elevated Source/Drain Configurations
2001 ◽
Vol 40
(Part 1, No. 4B)
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pp. 2611-2615
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2000 ◽
Vol 39
(Part 1, No. 2A)
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pp. 387-389
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2015 ◽
Vol 64
(2)
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pp. 596-602
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1998 ◽
Vol 16
(1)
◽
pp. 430
2013 ◽
Vol 7
(4)
◽
pp. 204-210
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