A Dual-Gate Complementary Metal-Oxide-Semiconductor Technology with Novel Self-Aligned Pocket Implantation which Takes Advantage of Elevated Source/Drain Configurations

2001 ◽  
Vol 40 (Part 1, No. 4B) ◽  
pp. 2611-2615 ◽  
Author(s):  
Kohei Sugihara ◽  
Naruhisa Miura ◽  
Taisuke Furukawa ◽  
Takumi Nakahata ◽  
Toshiyuki Oishi ◽  
...  
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