Photo-Electrochemical Gate Recess Etching for the Fabrication of AlGaN/GaN Heterostructure Field Effect Transistor
2001 ◽
Vol 40
(Part 2, No. 3A)
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pp. L198-L200
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2008 ◽
Vol 47
(4)
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pp. 2103-2107
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2003 ◽
Vol 42
(Part 1, No. 4B)
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pp. 2309-2312
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Keyword(s):
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2012 ◽
Vol 33
(6)
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pp. 788-790
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Keyword(s):
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2001 ◽
Vol 19
(4)
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pp. 1671
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2006 ◽
Vol 21
(7)
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pp. 933-937
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Keyword(s):