Keypoint-driven line drawing vectorization via PolyVector flow

2021 ◽  
Vol 40 (6) ◽  
pp. 1-17
Author(s):  
Ivan Puhachov ◽  
William Neveu ◽  
Edward Chien ◽  
Mikhail Bessmeltsev
Keyword(s):  
Line Drawing

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

POLYGONAL APPROXIMATION OF DIGITAL CURVE BASED ON REVERSE ENGINEERING CONCEPT

2013 ◽  
Vol 13 (04) ◽  
pp. 1350017 ◽  
Author(s):  
KUMAR S. RAY ◽  
BIMAL KUMAR RAY
Keyword(s):  
Reverse Engineering ◽  
Linear Time ◽  
Line Drawing ◽  
Approximation Error ◽  
Zero Approximation ◽  
Polygonal Approximation ◽  
Digital Curve ◽  
Symmetric Approximation ◽  
Engineering Concept ◽  
Automatic Algorithm

This paper applies reverse engineering on the Bresenham's line drawing algorithm [J. E. Bresenham, IBM System Journal, 4, 106–111 (1965)] for polygonal approximation of digital curve. The proposed method has a number of features, namely, it is sequential and runs in linear time, produces symmetric approximation from symmetric digital curve, is an automatic algorithm and the approximating polygon has the least non-zero approximation error as compared to other algorithms.

scholarly journals The Design of a 2D Graphics Accelerator for Embedded Systems

Electronics ◽  
2021 ◽  
Vol 10 (4) ◽  
pp. 469
Author(s):  
Hyun Woo Oh ◽  
Ji Kwang Kim ◽  
Gwan Beom Hwang ◽  
Seung Eun Lee
Keyword(s):  
Embedded Systems ◽  
Embedded System ◽  
Real Time ◽  
Line Drawing ◽  
Cmos Process ◽  
Embedded Processor ◽  
Processor Core ◽  
Field Programmable ◽  
The Embedded System ◽  
Graphics Processing

Recently, advances in technology have enabled embedded systems to be adopted for a variety of applications. Some of these applications require real-time 2D graphics processing running on limited design specifications such as low power consumption and a small area. In order to satisfy such conditions, including a specific 2D graphics accelerator in the embedded system is an effective method. This method reduces the workload of the processor in the embedded system by exploiting the accelerator. The accelerator assists the system to perform 2D graphics processing in real-time. Therefore, a variety of applications that require 2D graphics processing can be implemented with an embedded processor. In this paper, we present a 2D graphics accelerator for tiny embedded systems. The accelerator includes an optimized line-drawing operation based on Bresenham’s algorithm. The optimized operation enables the accelerator to deal with various kinds of 2D graphics processing and to perform the line-drawing instead of the system processor. Moreover, the accelerator also distributes the workload of the processor core by removing the need for the core to access the frame buffer memory. We measure the performance of the accelerator by implementing the processor, including the accelerator, on a field-programmable gate array (FPGA), and ascertaining the possibility of realization by synthesizing using the 180 nm CMOS process.

scholarly journals Equine Discomfort Ethogram

Animals ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 580
Author(s):  
Catherine Torcivia ◽  
Sue McDonnell
Keyword(s):  
Pain Management ◽  
Line Drawing ◽  
Clinical Work ◽  
Pain Scale ◽  
University Of Pennsylvania ◽  
Systematic Evaluation ◽  
Clear Understanding ◽  
Physical Discomfort ◽  
Professional Health ◽  
The University

In recent years, there has been a growing interest in and need for a comprehensive ethogram of discomfort behavior of horses, particularly for use in recognizing physical discomfort in domestically managed horses. A clear understanding of the physical discomfort behavior of horses among caretakers, trainers, and professional health care personnel is important to animal welfare and caretaker safety. This is particularly relevant to pain management for hospitalized equine patients. Various pain scale rubrics have been published, typically incorporating only a few classically cited pain behaviors that, in many cases, are specific to a particular body system, anatomic location, or disease condition. A consistent challenge in using these rubrics in practice, and especially in research, is difficulty interpreting behaviors listed in various rubrics. The objective of this equine discomfort ethogram is to describe a relatively comprehensive catalog of behaviors associated with discomfort of various degrees and sources, with the goal of improving understanding and clarity of communication regarding equine discomfort and pain. An inventory of discomfort-related behaviors observed in horses has been compiled over 35 years of equine behavior research and clinical consulting to medical and surgical services at the University of Pennsylvania School of Veterinary Medicine’s equine hospital. This research and clinical work included systematic evaluation of thousands of hours of video-recordings, including many hundreds of normal, healthy horses, as well as hospitalized patients with various complaints and/or known medical, neurologic, or orthopedic conditions. Each of 73 ethogram entries is named, defined, and accompanied by a line drawing illustration. Links to online video recorded examples are provided, illustrating each behavior in one or more hospitalized equine patients. This ethogram, unambiguously describing equine discomfort behaviors, should advance welfare of horses by improving recognition of physical discomfort, whether for pain management of hospitalized horses or in routine husbandry.

Line Drawing in the Dark

2021 ◽  
Vol 22 (1) ◽  
pp. 111-136
Author(s):  
Adam J. Kolber
Keyword(s):  
Line Drawing ◽  
The Law ◽  
Do So

Abstract The law inevitably draws lines. These lines distinguish, for example, whether certain conduct reflects ordinary recklessness constituting manslaughter or more extreme recklessness constituting murder. There is no way to meaningfully draw such lines, however, absent shared ways of representing amounts of recklessness or at least knowledge of the consequences of drawing lines in particular places. Yet legal actors frequently draw lines in the dark, establishing cutoffs along a spectrum with little or none of the information required to do so in a way that suits the law’s goals. For example, jurors must decide whether some conduct constitutes extreme recklessness without knowing prior precedent nor the sentencing consequences of drawing cutoffs in particular places. Judges and lawyers cite line drawing precedents from other jurisdictions without considering whether the lines drawn in prior cases had the same consequences as those in the case at bar. And scholars argue about how to classify conduct without making clear what consequences they believe ought to attach once the classification is made, leaving it hard to tell when scholars have substantive or simply superficial disagreements. In this Article, I discuss some line drawing problems and briefly suggest ways we can add meaning to cutoffs. More generally, I argue, we can “smooth” certain features of the law to both reduce our vulnerability to line drawing in the dark and improve the fit between the law and what our best theories of law recommend. Even when we cannot easily smooth the law, thinking about the law in a smoother fashion can help reduce the jurisprudential pathologies I describe.

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