Flexible Oxide Thin-Film Transistors Fabricated at Room Temperature By Introducing Polymer Dielectric and Microwave Annealing

2020 ◽  
Vol MA2020-02 (28) ◽  
pp. 1937-1937
Author(s):  
SeongCheol Jang ◽  
Jaehyun Kim ◽  
Kyung Jin Lee ◽  
Hyun-Suk Kim
2010 ◽  
Vol 31 (6) ◽  
pp. 567-569 ◽  
Author(s):  
Joo Hyon Noh ◽  
Seung Yoon Ryu ◽  
Sung Jin Jo ◽  
Chang Su Kim ◽  
Sung-Woo Sohn ◽  
...  

2013 ◽  
Vol 773 ◽  
pp. 660-663
Author(s):  
Li Qiang Guo ◽  
Zhao Jun Guo ◽  
Yuan Yuan Yang ◽  
Ju Mei Zhou

P-doped SiO2 were prepared by PECVD and one metal shadow mask self-assembled method was used for fabricating oxide thin film transistors gated by such proton conductors. Proton conduction of these films was demonstrated and electrical characteristics of oxide thin film transistors gated by such proton conductors were discussed. Due to excellent proton conduction and big capacitance density, oxide thin film transistors gated by such proton conductors have obtained excellent performances with mobility of 48.39 cm2/Vs, threshold voltage of-0.36 V, subthreshold swing of 0.13 V/decade, Ion/off ratio of 3.2×106 with the relative humidity of 30% at the room temperature.


2015 ◽  
Vol 27 (40) ◽  
pp. 6090-6095 ◽  
Author(s):  
Thomas Rembert ◽  
Corsin Battaglia ◽  
André Anders ◽  
Ali Javey

2011 ◽  
Vol 519 (13) ◽  
pp. 4361-4365 ◽  
Author(s):  
Deuk-Hee Lee ◽  
Sangsig Kim ◽  
Sang Yeol Lee

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