scholarly journals Optimization of the Electrodeposition Parameters to Improve the Stoichiometry ofIn2S3Films for Solar Applications Using the Taguchi Method

2014 ◽  
Vol 2014 ◽  
pp. 1-10 ◽  
Author(s):  
Maqsood Ali Mughal ◽  
M. Jason Newell ◽  
Joshua Vangilder ◽  
Shyam Thapa ◽  
Kayla Wood ◽  
...  
Keyword(s):  
Taguchi Method ◽  
Deposition Temperature ◽  
Deposition Time ◽  
Sodium Thiosulfate ◽  
Sulfur Source ◽  
Indium Chloride ◽  
X Ray ◽  
Semiconductor Thin Films ◽  
Deposition Voltage ◽  
Predicted Values

Properties of electrodeposited semiconductor thin films are dependent upon the electrolyte composition, plating time, and temperature as well as the current density and the nature of the substrate. In this study, the influence of the electrodeposition parameters such as deposition voltage, deposition time, composition of solution, and deposition temperature upon the properties of In2S3films was analyzed by the Taguchi Method. According to Taguchi analysis, the interaction between deposition voltage and deposition time was significant. Deposition voltage had the largest impact upon the stoichiometry of In2S3films and deposition temperature had the least impact. The stoichiometric ratios between sulfur and indium (S/In: 3/2) obtained from experiments performed with optimized electrodeposition parameters were in agreement with predicted values from the Taguchi Method. The experiments were carried out according to Taguchi orthogonal array L27(3^4) design of experiments (DOE). Approximately 600 nm thick In2S3films were electrodeposited from an organic bath (ethylene glycol-based) containing indium chloride (InCl3), sodium chloride (NaCl), and sodium thiosulfate (Na2S2O3·5H2O), the latter used as an additional sulfur source along with elemental sulfur (S). An X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) unit, and scanning electron microscope (SEM) were, respectively, used to analyze the phases, elemental composition, and morphology of the electrodeposited In2S3films.

Preparation and Characterization of Relaxor-Based Ferroelectric Thick Films with Single Perovskite Structure

2008 ◽  
Vol 368-372 ◽  
pp. 24-26 ◽  
Author(s):  
Hui Qing Fan ◽  
Jin Chen ◽  
Xiu Li Chen
Keyword(s):  
Deposition Time ◽  
Thick Films ◽  
Colloidal Suspensions ◽  
Lead Magnesium Niobate ◽  
X Ray Diffraction ◽  
X Ray ◽  
Ceramic Films ◽  
Deposition Voltage ◽  
Lead Magnesium

Lead magnesium niobate-lead titanate (0.8Pb(Mg1/3Nb2/3)O3-0.2PbTiO3, PMN-PT) thick films in the thickness range about 75 μm have been successfully fabricated on Au-coated Al2O3 substrates by electrophoretic deposition (EPD). Non-aqueous colloidal suspensions suitable for EPD were prepared by mixing ultrasonically PMN-PT particles in ethanol with pH=6.0. The effect of EPD process parameters such as deposition voltage, deposition time and the specific deposition mass of PMN-PT particles were investigated. The EPD parameters were optimized in order to obtain crack-free, high-quality uniform ceramic films. The deposited pyrochlore-free PMN-PT thick films were sintered at 1000oC for 30 min, and the phase evolvement and the microstructure of the film were characterized by X-ray diffraction and scanning electron microscope.

scholarly journals Chemical bath deposition synthesis and electrochemical properties of MnO2 thin film: Effect of deposition time and bath temperature

2014 ◽  
Vol 32 (4) ◽  
pp. 555-564 ◽  
Author(s):  
A. Aref ◽  
Y. Tang
Keyword(s):  
Electrochemical Properties ◽  
Chemical Bath Deposition ◽  
Indium Tin Oxide ◽  
Deposition Temperature ◽  
Deposition Time ◽  
Bath Temperature ◽  
X Ray Diffraction ◽  
Initial Value ◽  
X Ray ◽  
Amorphous Nature

AbstractManganese dioxide (MnO2) films with different nanostructures were deposited on indium tin oxide (ITO) glasses by using chemical bath deposition (CBD). Deposition temperature and time were varied from 60 °C to 90 °C and from 2 h to 72 h, respectively. The samples have been characterized using an X-ray diffraction (XRD), field emission scanning electron microscope (SEM) and an electrochemical workstation. The films deposited at 60 °C for 8 h showed that obtained nanoflowers had an amorphous nature, while those deposited at higher temperatures of 70, 80 and 90 °C showed a well-developed nanowire and nanorod morphology. However, those which were deposited at 60 °C, showed the best electrochemical properties, including a higher specific capacitance, good rate of performance and a cycling stability (93 % loss of the initial value after 10,000 cycles).

Fabrication of Fe nanowires using anodic alumina template

2017 ◽  
Author(s):  
yongson hong ◽  
O Pong-Sik ◽  
Ryang Se-Hun ◽  
Sin Kum-Chol ◽  
Ri Un-Byol
Keyword(s):  
Magnetic Property ◽  
Deposition Time ◽  
Anodic Alumina ◽  
Aao Template ◽  
Alumina Template ◽  
Deposition Voltage ◽  
Temperature Deposition ◽  
Anodic Alumina Template

In this paper, we considered fabrication of Fe nanowires by AAO template, magnetic property, and influences (fabrication voltage of template, temperature, deposition time, and deposition voltage) on them. <br>

Studies on Magnetron-Sputtered NiO/Si3N4 Thin Films

2018 ◽  
Vol 17 (03) ◽  
pp. 1760039
Author(s):  
K. M. Dhanisha ◽  
M. Manoj Christopher ◽  
M. Abinaya ◽  
P. Deepak Raj ◽  
M. Sridharan
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Smooth Surface ◽  
Deposition Time ◽  
Si Substrate ◽  
X Ray ◽  
Coating Time ◽  
Deposited Films ◽  
Nio Films ◽  
Scanning Electron

The present work deals with NiO/Si3N4 layers formed by depositing nickel oxide (NiO) thin films over silicon nitrate (Si3N[Formula: see text] thin films. NiO films were coated on Si3N4-coated Si substrate using magnetron sputtering method by changing duration of coating time and were analyzed using X-ray diffractometer, field emission-scanning electron microscopy, UV–Vis spectrophotometer and four-point probe method to study the influence of thickness on physical properties. Crystallinity of the deposited films increases with increase in thickness. All films exhibited spherical-like structure, and with increase in deposition time, grains are coalesced to form smooth surface morphology. The optical bandgap of NiO films was found to decrease from 3.31[Formula: see text]eV to 3.22[Formula: see text]eV with upsurge in the thickness. The film deposited for 30[Formula: see text]min exhibits temperature coefficient resistance of [Formula: see text]1.77%/[Formula: see text]C as measured at 80[Formula: see text]C.

scholarly journals Exploring the fundamental effects of deposition time on the microstructure of graphene nanoflakes by Raman scattering and X-ray diffraction

CrystEngComm ◽  
2011 ◽  
Vol 13 (1) ◽  
pp. 312-318 ◽  
Author(s):  
Navneet Soin ◽  
Susanta Sinha Roy ◽  
Christopher O'Kane ◽  
James A. D. McLaughlin ◽  
Teck H. Lim ◽  
...  
Keyword(s):  
Raman Scattering ◽  
Deposition Time ◽  
X Ray Diffraction ◽  
X Ray ◽  
Graphene Nanoflakes

scholarly journals Green Synthesis of Feather-Shaped MoS2/CdS Photocatalyst for Effective Hydrogen Production

2013 ◽  
Vol 2013 ◽  
pp. 1-5 ◽  
Author(s):  
Yang Liu ◽  
Hongtao Yu ◽  
Xie Quan ◽  
Shuo Chen
Keyword(s):  
Electron Microscopy ◽  
Hydrogen Production ◽  
Photoelectron Spectroscopy ◽  
Diffuse Reflectance ◽  
Sulfur Source ◽  
X Ray ◽  
Transmission Electron ◽  
Microscopy Images ◽  
Effective Hydrogen ◽  
Better Than

MoS2/CdS photocatalyst was fabricated by a hydrothermal method for H2production under visible light. This method used low toxic thiourea as a sulfur source and was carried out at 200°C. Thus, it was better than the traditional methods, which are based on an annealing process at relatively high temperature (above 400°C) using toxic H2S as reducing agent. Scanning electron microscopy and transmission electron microscopy images showed that the morphologies of MoS2/CdS samples were feather shaped and MoS2layer was on the surface of CdS. The X-ray photoelectron spectroscopy testified that the sample was composed of stoichiometric MoS2and CdS. The UV-vis diffuse reflectance spectra displayed that the loading of MoS2can enhance the optical absorption of MoS2/CdS. The photocatalytic activity of MoS2/CdS was evaluated by producing hydrogen. The hydrogen production rate on MoS2/CdS reached 192 μmol·h−1. This performance was stable during three repeated photocatalytic processes.

NbN Thin Film of Alternating Textures

2017 ◽  
Vol 898 ◽  
pp. 1431-1437
Author(s):  
Hong Yang Shao ◽  
Kan Zhang ◽  
Yi Dan Zhang ◽  
Mao Wen ◽  
Wei Tao Zheng
Keyword(s):  
Deposition Time ◽  
Peak Position ◽  
Preferred Orientation ◽  
Intrinsic Stress ◽  
Competitive Growth ◽  
X Ray Diffraction ◽  
X Ray ◽  
Orientation Distributions ◽  
Different Thickness ◽  
Deposited Films

The δ-NbN thin films with different thickness have been prepared by reactive magnetron sputtering at different deposition time and exhibited alternating textures between (111) and (200) orientations as a function of thickness. In addition, the grain size, peak position, morphology, residual stress and orientation distributions of the deposited films were explored by X-ray diffraction, low-angel X-ray reflectivity, scanning electron microscopy and surface profiler. The film deposited at 300 s showed a (111) preferred orientation, changing to (200) preferred orientation at 600 s, and exhibited alternating textures between (111) and (200) preferred orientations. With further increasing deposition time, in which (200) peak position and the full width at half maximum of (111) peak also displayed a trend of alternating variation with varying deposition time. The intrinsic stress for δ-NbN films calculated by Stoney equation alternately changed with alternating textures, in which (111) orientation always takes place at relatively high intrinsic stress state and vice versa. Meanwhile, the film with (111) preferred orientation showed higher density than (200) preferred orientation. The film deposited at 4800 s owned a mixed texture of (111) and (200), showing an anisotropy distribution of (111)-oriented and (200)-oriented grains, while film deposited at 7200 s owned a strong (200) texture, displaying an isotropy distribution of (200)-oriented grains. The competitive growth between (111)-oriented and (200)-oriented grains was responsibility for alternating texture.

Study of Indium Chloride Vapor Treatment on Cu(In,Ga)Se2 Semiconductor Thin Films

2021 ◽  
Author(s):  
Benjamin Belfore ◽  
Deewakar Poudel ◽  
Tasnuva Ashrafee ◽  
Elizabeth Palmiotti ◽  
Thomas Lepetit ◽  
...  
Keyword(s):  
Thin Films ◽  
Indium Chloride ◽  
Semiconductor Thin Films ◽  
Vapor Treatment

Effect of technological parameters of gas-dynamic deposition on structural-phase transformations in “brass” type coating

2020 ◽  
pp. 554-559
Author(s):  
V.E. Arkhipov ◽  
T.I. Murav’eva ◽  
M.S. Pugachev ◽  
I.V. Shkaley
Keyword(s):  
Deposition Temperature ◽  
Mass Fraction ◽  
Structural Phase ◽  
X Ray Diffraction ◽  
Technological Parameters ◽  
X Ray ◽  
Type Compound ◽  
Gas Dynamic ◽  
Ε Phase ◽  
Overlap Coefficient

The results of effect of deposition temperature and the overlap coefficient on the formation of the phase composition of coating based on Cu, Zn and Al2O3 particles mixture applied by cold gas-dynamic deposition are presented. Using X-ray diffraction and X-ray spectral analysis, it is shown that when using the 55 % overlap coefficient electron-type compound based on CuZn3 (ε-phase) is formed in the coating, the mass fraction of which increases to 11.4 % with increase in the deposition temperature. Deposition with 64 % overlap coefficient is accompanied by the formation not only of the ε-phase, but of electron-type compound based on Cu5Zn8 (γ-phase), the mass fraction of which increases to 33 % at temperature of 450 °C. In the process of coating deposition, the predominant diffusion copper into zinc takes place; the calculations show high value of the diffusion coefficient copper — 1,56•10–13 m2 /s.

scholarly journals Deposition Time induced Structural and Optical Properties of Lead Tin Sulphide Thin Films

2021 ◽  
pp. 455-458
Author(s):  
J. Damisa ◽  
J. O. Emegha ◽  
I. L. Ikhioya
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Optical Properties ◽  
Absorption Coefficient ◽  
Tin Oxide ◽  
Deposition Time ◽  
Deposition Process ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Prepared Material

Lead tin sulphide (Pb-Sn-S) thin films (TFs) were deposited on fluorine-doped tin oxide (FTO) substrates via the electrochemical deposition process using lead (II) nitrate [Pb(NO3)2], tin (II) chloride dehydrate [SnCl2.2H2O] and thiacetamide [C2H5NS] precursors as sources of lead (Pb), tin (Sn) and sulphur (S). The solution of all the compounds was harmonized with a stirrer (magnetic) at 300k. In this study, we reported on the improvements in the properties (structural and optical) of Pb-Sn-S TFs by varying the deposition time. We observed from X-ray diffractometer (XRD) that the prepared material is polycrystalline in nature. UV-Vis measurements were done for the optical characterizations and the band gap values were seen to be increasing from 1.52 to 1.54 eV with deposition time. In addition to this, the absorption coefficient and refractive index were also estimated and discussed.

Sign in / Sign up

Export Citation Format

Share Document