Effect of internal stress on adhesion and other mechanical properties of evaporated indium tin oxide (ITO) films

First-principle density functional theory simulations have been performed to predict the electronic structures and optoelectronic properties of ultrathin indium tin oxide (ITO) films, having different thicknesses and temperatures. Our results and analysis led us to predict that the physical properties of ultrathin films of ITO have a direct relation with film thickness rather than temperature. Moreover, we found that a thin film of ITO (1 nm thickness) has a larger absorption coefficient, lower reflectivity, and higher transmittance in the visible light region compared with that of 2 and 3 nm thick ITO films. We suggest that this might be due to the stronger surface strain effect in 1 nm thick ITO film. On the other hand, all three thin films produce similar optical spectra. Finally, excellent agreement was found between the calculated electrical resistivities of the ultrathin film of ITO and that of its experimental data. It is concluded that the electrical resistivities reduce along with the increase in film thickness of ITO because of the short strain length and limited bandgap distributions.

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Indium tin oxide films with low resistivity and low internal stress

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1563623 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1351-1354 ◽

Cited By ~ 16

Author(s):

Shinji Takayama ◽

Toshifumi Sugawara ◽

Akira Tanaka ◽

Tokuji Himuro

Keyword(s):

Internal Stress ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Low Resistivity ◽

Tin Oxide Films

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Plasma-Assisted Deposition and Crystal Growth of Thin Indium-Tin-Oxide (ITO) Films

Advances in Solid State Physics 44 - Advances in Solid State Physics ◽

10.1007/978-3-540-39970-4_23 ◽

2004 ◽

pp. 299-312 ◽

Cited By ~ 8

Author(s):

R. Hippler ◽

H. Steffen ◽

M. Quaas ◽

T. Röwf ◽

T.M. Tun ◽

...

Keyword(s):

Crystal Growth ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Ito Films

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Microstructure and Electrical Properties of ITO Films Deposited Using Various ITO Targets by Magnetron Sputtering

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.124-126.431 ◽

2007 ◽

Vol 124-126 ◽

pp. 431-434

Author(s):

Joon Hong Park ◽

Sang Chul Lee ◽

Jin Ho Lee ◽

Pung Keun Song

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Target Surface ◽

Flow Ratio ◽

Dc Power ◽

Alkali Glass ◽

Oxygen Ratio ◽

Ito Films

Indium Tin Oxide (ITO) films were deposited on non-alkali glass substrate by magnetron sputtering using commercial ITO target (target A) and improved ITO target (target B). Depositions were carried out at total gas pressure (Ptot) of 0.5 Pa, substrate temperature (Ts) of RT ~ 300 °C, oxygen flow ratio [O2/(O2+Ar)] of 0 ~ 1.0% and dc power of 100W. Target B showed relatively higher stability in film resistivity with increasing sputtering time, i.e., erosion ratio of target surface. Optimum oxygen ratio to obtain the lowest resistivity was decreased with increasing substrate temperature. The lowest resistivity was 1.06x10-4 6cm for the film deposited using target B at O2/(O2+Ar) ratio of 0.05% and at Ts =300 °C.

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Patterning of indium-tin-oxide (ITO) films using laser-induced forward transfer (LIFT) technique

10.1117/12.873058 ◽

2011 ◽

Cited By ~ 1

Author(s):

Hironobu Sakata ◽

Akira Yoshikado ◽

Eisuke Yokoyama ◽

Moriaki Wakaki

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Forward Transfer ◽

Ito Films

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Efficacy of titanium doped-indium tin oxide (Ti/TiO2–ITO) films in rapid oxygen generation under photocatalysis and their suitability for bio-medical application

Physical Chemistry Chemical Physics ◽

10.1039/c4cp02819h ◽

2014 ◽

Vol 16 (45) ◽

pp. 24790-24799 ◽

Cited By ~ 10

Author(s):

A. Subrahmanyam ◽

A. Rajakumar ◽

Md. Rakibuddin ◽

T. Paul Ramesh ◽

M. Raveendra Kiran ◽

...

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Medical Application ◽

Artificial Lung ◽

Assistive Devices ◽

Oxygen Generation ◽

Ito Films

Fabrication of novel titanium doped ITO films and understanding the mechanism for effective photocatalytic oxygen generation for artificial lung-assistive devices.

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Properties of Indium Tin Oxide Films Prepared by Two-Targets Magnetron Sputtering

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.997.337 ◽

2014 ◽

Vol 997 ◽

pp. 337-340

Author(s):

Jian Guo Chai

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Optical Transmittance ◽

Visible Range ◽

Glass Substrates ◽

Optimized Conditions ◽

Tin Oxide Films ◽

Ito Films

Indium tin oxide (ITO) films were deposited on glass substrates by magnetron sputtering. Properties of ITO films showed a dependence on substrate temperature. With an increasing in substrate temperature, the intensity of XRD peak increased and the grain size showed an evident increasing. The results show that increasing substrate temperature remarkably improves the characteristics of the films. The sheet resistance of 10 Ω/sq and the maximum optical transmittance of 90% in the visible range with optimized conditions can be achicved. The results of experiment demonstrate that high-quality films have been achieved by this technique.

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