scholarly journals Evaluation of surface roughness and nanostructure of indium tin oxide (ITO) films by atomic force microscopy

Scanning ◽  
2008 ◽  
Vol 30 (3) ◽  
pp. 232-239 ◽  
Author(s):  
G. Kavei ◽  
Y. Zare ◽  
A. Mohammadi Gheidari
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ito Films

Surface Structure and Electrochemical Polymerization of Mixed, Thiophene-Capped Monolayers

2001 ◽  
Vol 708 ◽  
Author(s):  
Jung F. Kang ◽  
Katherine Harrison ◽  
S. Michael Kilbey
Keyword(s):  
Atomic Force Microscopy ◽  
Grain Size ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Electrochemical Polymerization ◽  
Self Assembled Monolayers ◽  
Force Microscopy ◽  
Electrochemical Growth ◽  
Atomic Force ◽  
Assembled Monolayers

ABSTRACTWe have investigated the growth of polythiophene from self-assembled monolayers (SAMs) that contain pendant thiophene groups using electrochemistry and atomic force microscopy. The SAMs are formed on indium tin-oxide (ITO) by coadsorption of 11-(3-thienyl)undecyltrichlorosilane (3TUTS) and undecyltrichlorosilane (UTS). By altering the composition of the underlying monolayers we can manipulate the onset of electrochemical polymerization and affect the surface topography of the resultant polythiophene layer. Films made on SAMs that have high loadings of 3TUTS have small, distinct grains, but as the monolayers become enriched in UTS, the grain size increases; however, these films are neither as rough nor as diffuse as films formed on ITO without an underlying SAM. These experiments suggest that the electrochemical growth and structure of the polythiophene layer can be manipulated by tuning the underlying SAM.

Effect of Annealing on Surface of Nickel (Ni)/Indium Tin Oxide (ITO) Nanostructures Measured by Atomic Force Microscopy (AFM)

2013 ◽  
Vol 832 ◽  
pp. 51-55
Author(s):  
M. Sobri ◽  
A. Shuhaimi ◽  
K.M. Hakim ◽  
M.H. Mamat ◽  
S. Najwa ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Annealing Temperature ◽  
Film Surface ◽  
Rf Magnetron Sputtering ◽  
Root Mean Square Roughness ◽  
Force Microscopy ◽  
Watershed Analysis ◽  
Atomic Force ◽  
Ito Films

Nickel (Ni) / indium tin oxide (ITO) nanostructures were deposited on silicon (111) substrate by RF magnetron sputtering using a nickel target and metallic alloy target (In-Sn, 90%-10%). The post-deposition annealing has been done for Ni/ITO films in air and the effect of annealing temperature on the surface morphology of ITO films was studied. It has been found that the annealing temperatures increase the film surface roughness in Ni/ITO structure. At annealing temperature of 600°C, AFM analysis reveals the highest root mean square roughness, peak to valley and thickness value of 2.598 nm, 59.115 nm, and 11.358 nm, respectively. Watershed analysis on AFM images show that the numbers of grain boundaries in Ni/ITO are reduced when annealing temperature is increased to higher temperatures.

Surface Roughness and Grain Size Analysis of Treated Indium Tin Oxide(ITO)Film

2014 ◽  
Vol 680 ◽  
pp. 131-134
Author(s):  
Vithyacharan Retnasamy ◽  
Zaliman Sauli ◽  
Steven Taniselass ◽  
Norhawati Ahmad ◽  
Chai Jee Keng ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Grain Size ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Initial Study ◽  
Grain Size Analysis ◽  
Size Analysis ◽  
Force Microscopy ◽  
Ito Film ◽  
Atomic Force

An initial study has been conducted to characterize the surface morphology of treated Indium Tin Oxide (ITO). Treatment done is annealing process where the samples are put through heat and annealed for an hour. Time of deposition and layers of ITO has been varied to study the correlation between both.The treated ITO are examined under Atomic Force Microscopy (AFM) for the surface roughness and the grain size. Results shows that deposition time of ITO do play an important role in determining a desired grain size in ITO material.

Brittle Behaviour in Aspirin Crystals: Evidence of Spalling Fracture

2020 ◽  
Author(s):  
Benjamin P. A. Gabriele ◽  
Craig J. Williams ◽  
Douglas Stauffer ◽  
Brian Derby ◽  
Aurora J. Cruz-Cabeza
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Single Crystals ◽  
Spalling Fracture ◽  
Force Microscopy ◽  
Atomic Force ◽  
Afm Imaging

<div> <div> <div> <p>Single crystals of aspirin form I were cleaved and indented on their dominant face. Upon inspection, it was possible to observe strongly anisotropic shallow lateral cracks due to the extreme low surface roughness after cleavage. Atomic Force Microscopy (AFM) imaging showed spalling fractures nucleating from the indent corners, forming terraces with a height of one or two interplanar spacings d100. The formation of such spalling fractures in aspirin was rationalised using basic calculations of attachment energies, showing how (100) layers are poorly bonded when compared to their relatively higher intralayer bonding. An attempt at explaining the preferential propagation of these fractures along the [010] direction is discussed. </p> </div> </div> </div>

Brittle Behaviour in Aspirin Crystals: Evidence of Spalling Fracture

2020 ◽  
Author(s):  
Benjamin P. A. Gabriele ◽  
Craig J. Williams ◽  
Douglas Stauffer ◽  
Brian Derby ◽  
Aurora J. Cruz-Cabeza
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Single Crystals ◽  
Spalling Fracture ◽  
Force Microscopy ◽  
Atomic Force ◽  
Afm Imaging

<div> <div> <div> <p>Single crystals of aspirin form I were cleaved and indented on their dominant face. Upon inspection, it was possible to observe strongly anisotropic shallow lateral cracks due to the extreme low surface roughness after cleavage. Atomic Force Microscopy (AFM) imaging showed spalling fractures nucleating from the indent corners, forming terraces with a height of one or two interplanar spacings d100. The formation of such spalling fractures in aspirin was rationalised using basic calculations of attachment energies, showing how (100) layers are poorly bonded when compared to their relatively higher intralayer bonding. An attempt at explaining the preferential propagation of these fractures along the [010] direction is discussed. </p> </div> </div> </div>

scholarly journals Atomic force microscopy comparative analysis of the surface roughness of two posterior chamber phakic intraocular lens models: ICL versus IPCL

2021 ◽  
Vol 21 (1) ◽  
Author(s):  
Juan Gros-Otero ◽  
Samira Ketabi ◽  
Rafael Cañones-Zafra ◽  
Montserrat Garcia-Gonzalez ◽  
Cesar Villa-Collar ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Intraocular Lenses ◽  
Posterior Chamber ◽  
Anterior Surface ◽  
Contact Mode ◽  
Force Microscopy ◽  
Atomic Force ◽  
Phakic Intraocular Lenses ◽  
Roughness Measurements

Abstract Background To compare the anterior surface roughness of two commercially available posterior chamber phakic intraocular lenses (IOLs) using atomic force microscopy (AFM). Methods Four phakic IOLs were used for this prospective, experimental study: two Visian ICL EVO+ V5 lenses and two iPCL 2.0 lenses. All of them were brand new, were not previously implanted in humans, were monofocal and had a dioptric power of − 12 diopters (D). The anterior surface roughness was assessed using a JPK NanoWizard II® atomic force microscope in contact mode immersed in liquid. Olympus OMCL-RC800PSA commercial silicon nitride cantilever tips were used. Anterior surface roughness measurements were made in 7 areas of 10 × 10 μm at 512 × 512 point resolution. The roughness was measured using the root-mean-square (RMS) value within the given regions. Results The mean of all anterior surface roughness measurements was 6.09 ± 1.33 nm (nm) in the Visian ICL EVO+ V5 and 3.49 ± 0.41 nm in the iPCL 2.0 (p = 0.001). Conclusion In the current study, we found a statistically significant smoother anterior surface in the iPCL 2.0 phakic intraocular lenses compared with the VISIAN ICL EVO+ V5 lenses when studied with atomic force microscopy.

Copper Diffusion Into Aluminum-Silicon Metallizations by Accelerated Thermal and Electrical Stressing

1996 ◽  
Vol 428 ◽  
Author(s):  
G. O. Ramseyer ◽  
L. H. Walsh ◽  
J. V. Beasock ◽  
H. F. Helbig ◽  
R. C. Lacoe ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Depth Profiling ◽  
Copper Diffusion ◽  
Force Microscopy ◽  
Atomic Force ◽  
Line Widths ◽  
Electromigration Lifetime

AbstractPatterned 930 nm Al(1%-Si) interconnects over 147 nm of Cu were electromigration lifetime tested at 1.0–1.5 × 105 A/cm2 at 250 °C. The morphology of the surfaces of the electromigrated stripes with different line widths and times to failure were characterized by atomic force microscopy, and changes in surface roughness were compared. The diffusion of copper into the electromigrated aluminum stripes was determined by depth profiling using Auger electron spectroscopy. In particular, areas where hillocks formed were examined and compared to areas of median roughness.

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