Hydrophobic Properties of Polytetrafluoroethylene Thin Films Fabricated at Various Catalyzer Temperatures Through Catalytic Chemical Vapor Deposition Using a Tungsten Catalyzer

Vapor Deposition ◽

Chemical Vapor ◽

Hydrophobic Properties ◽

Low-Resistivity Phosphorus-Doped Polycrystalline Silicon Thin Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.501 ◽

2002 ◽

Vol 41 (Part 1, No. 2A) ◽

pp. 501-506 ◽

Cited By ~ 13

Author(s):

Rui Morimoto ◽

Akira Izumi ◽

Atsushi Masuda ◽

Hideki Matsumura

Keyword(s):

Thin Films ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Phosphorus Doped

Fabrication of PTFE thin films by dual catalytic chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2007.06.185 ◽

2008 ◽

Vol 516 (5) ◽

pp. 687-690 ◽

Cited By ~ 26

Author(s):

Hiroaki Yasuoka ◽

Masahiro Yoshida ◽

Ken Sugita ◽

Keisuke Ohdaira ◽

Hideyuki Murata ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.3175 ◽

1998 ◽

Vol 37 (Part 1, No. 6A) ◽

pp. 3175-3187 ◽

Cited By ~ 187

Author(s):

Hideki Matsumura

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Cvd Method ◽

Silicon Based

Diffusion length measurements of microcrystalline silicon thin films prepared by hot-wire/catalytic chemical vapor deposition (HWCVD)

Thin Solid Films ◽

10.1016/j.tsf.2005.07.141 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 137-140 ◽

Cited By ~ 8

Author(s):

S. Okur ◽

M. Güneş ◽

F. Finger ◽

R. Carius

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Diffusion Length ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Length Measurements

Luminescence Enhancement in Silicon Oxycarbide Thin Films Obtained by Catalytic Chemical Vapor Deposition Using Mesoporous Silica Pellets and Tetraethoxysilane

Thin Solid Films ◽

10.1016/j.tsf.2020.138358 ◽

2020 ◽

Vol 713 ◽

pp. 138358

Author(s):

Iván García ◽

Crisóforo Morales ◽

Enrique Rosendo ◽

Tomás Díaz ◽

María Pérez ◽

...

Keyword(s):

Thin Films ◽

Mesoporous Silica ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxycarbide ◽

Luminescence Enhancement ◽

White bright luminescence at room temperature from TEOS-based thin films via catalytic chemical vapor deposition

Materials Letters ◽

10.1016/j.matlet.2014.05.206 ◽

2014 ◽

Vol 131 ◽

pp. 295-297 ◽

Cited By ~ 11

Author(s):

A. Dutt ◽

Y. Matsumoto ◽

S. Godavarthi ◽

G. Santana-Rodríguez ◽

J. Santoyo-Salazar ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Bright Luminescence

Parameters determining crystallinity in β-SiC thin films prepared by catalytic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2003.08.026 ◽

2004 ◽

Vol 260 (1-2) ◽

pp. 176-180 ◽

Cited By ~ 22

Author(s):

Q. Zhao ◽

J.C. Li ◽

H. Zhou ◽

H. Wang ◽

B. Wang ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Correlation between O/Er Content Ratio and Photoluminescence Intensity of (Er, O)-Doped Hydrogenated Amorphous Si Thin Films Prepared by a Catalytic Chemical Vapor Deposition/Laser Ablation Hybrid Process

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.4198 ◽

2004 ◽

Vol 43 (7A) ◽

pp. 4198-4201 ◽

Cited By ~ 2

Author(s):

Joe Sakai ◽

Atsushi Masuda ◽

Haruo Akiyama ◽

Osamu Eryu ◽

Kenshiro Nakashima ◽

...

Keyword(s):

Thin Films ◽

Laser Ablation ◽

Vapor Deposition ◽

Chemical Vapor ◽

Photoluminescence Intensity ◽

Content Ratio ◽

Amorphous Si ◽

Hydrogenated Amorphous

Oxygen Impurity in Cubic Boron Nitride Thin Films Prepared by Plasma-enhanced Chemical Vapor Deposition

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2010.00748 ◽

2010 ◽

Vol 25 (7) ◽

pp. 748-752 ◽

Cited By ~ 2

Author(s):

Hang-Sheng YANG ◽

Fa-Min QIU ◽

An-Min NIE

Keyword(s):

Thin Films ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Oxygen Impurity

High Band Gap Nanocrystalline Tungsten Carbide (nc-WC) Thin Films Grown by Hot Wire Chemical Vapor Deposition (HW-CVD) Method

Journal of Nano- and Electronic Physics ◽

10.21272/jnep.10(3).03001 ◽

2018 ◽

Vol 10 (3) ◽

pp. 03001-1-03001-6 ◽

Cited By ~ 2

Author(s):

Bharat Gabhale ◽

◽

Ashok Jadhawar ◽

Ajinkya Bhorde ◽

Shruthi Nair ◽

...

Keyword(s):

Thin Films ◽

Tungsten Carbide ◽

Band Gap ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Cvd Method ◽

High Band