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Image Force Effect on Tunneling Current for Ultra Thin High-K Dielectric Material Al2O3 Based Metal Oxide Semiconductor Devices
Journal of Nanoelectronics and Optoelectronics
◽
10.1166/jno.2015.1812
◽
2015
◽
Vol 10
(5)
◽
pp. 645-648
◽
Cited By ~ 16
Author(s):
N. P. Maity
◽
R. Maity
◽
R. K. Thapa
◽
S. Baishya
Keyword(s):
Metal Oxide
◽
Dielectric Material
◽
Semiconductor Devices
◽
Tunneling Current
◽
Image Force
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Force Effect
◽
High K
◽
High K Dielectric
Download Full-text
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References
Impact of native defects in high-k dielectric oxides on GaN/oxide metal-oxide-semiconductor devices
physica status solidi (b)
◽
10.1002/pssb.201200628
◽
2013
◽
Vol 250
(4)
◽
pp. 787-791
◽
Cited By ~ 17
Author(s):
Minseok Choi
◽
John L. Lyons
◽
Anderson Janotti
◽
Chris G. Van de Walle
Keyword(s):
Metal Oxide
◽
Semiconductor Devices
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Native Defects
◽
High K
◽
High K Dielectric
Download Full-text
Metal-Oxide-Semiconductor Devices on GaAs with High-k Dielectric and MOCVD Grown ZnO Interface Passivation Layer
2011 International Conference on Nanoscience, Technology and Societal Implications
◽
10.1109/nstsi.2011.6111800
◽
2011
◽
Cited By ~ 1
Author(s):
Souvik Kundu
◽
Pallab Banerji
Keyword(s):
Metal Oxide
◽
Semiconductor Devices
◽
Metal Oxide Semiconductor
◽
Passivation Layer
◽
Oxide Semiconductor
◽
High K
◽
High K Dielectric
◽
Interface Passivation
Download Full-text
The influence of image force effect on the accuracy of modeling of tunneling current for ultra thin high- k dielectric material Ta 2 O 5 based MOS devices
Materials Today Proceedings
◽
10.1016/j.matpr.2018.04.065
◽
2018
◽
Vol 5
(7)
◽
pp. 15104-15109
◽
Cited By ~ 2
Author(s):
N.P. Maity
◽
Reshmi Maity
◽
S. Baishya
Keyword(s):
Dielectric Material
◽
Tunneling Current
◽
Image Force
◽
Force Effect
◽
Mos Devices
◽
High K
◽
High K Dielectric
Download Full-text
Effect of Image Force on Tunneling Current for Ultra Thin Oxide Layer Based Metal Oxide Semiconductor Devices
Nanoscience and Nanotechnology Letters
◽
10.1166/nnl.2015.1970
◽
2015
◽
Vol 7
(4)
◽
pp. 331-333
◽
Cited By ~ 6
Author(s):
N. P. Maity
◽
R. Maity
◽
R. K. Thapa
◽
S. Baishya
Keyword(s):
Metal Oxide
◽
Oxide Layer
◽
Semiconductor Devices
◽
Tunneling Current
◽
Image Force
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Thin Oxide Layer
◽
Thin Oxide
Download Full-text
Low temperature atomic layer deposition of high-k dielectric stacks for scaled metal-oxide-semiconductor devices
Thin Solid Films
◽
10.1016/j.tsf.2009.03.190
◽
2009
◽
Vol 517
(18)
◽
pp. 5543-5547
◽
Cited By ~ 8
Author(s):
Ole Bethge
◽
Stephan Abermann
◽
Christoph Henkel
◽
Emmerich Bertagnolli
Keyword(s):
Low Temperature
◽
Atomic Layer Deposition
◽
Metal Oxide
◽
Semiconductor Devices
◽
Atomic Layer
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Layer Deposition
◽
High K
◽
High K Dielectric
Download Full-text
The Effect of Electron Incident Angle on Transmittance and Tunneling Current in an Anisotropic Metal-Oxide-Semiconductor Capacitor with High-K Dielectric Gate Stack
10.1063/1.3537898
◽
2010
◽
Author(s):
Fatimah A. Noor
◽
Yudi Darma
◽
Mikrajuddin Abdullah
◽
Khairurrijal
◽
Khairurrijal
◽
...
Keyword(s):
Metal Oxide
◽
Incident Angle
◽
Tunneling Current
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Gate Stack
◽
High K
◽
High K Dielectric
◽
Metal Oxide Semiconductor Capacitor
◽
Anisotropic Metal
Download Full-text
Inversion-type surface channel In0.53]Ga{in0.47As metal-oxide-semiconductor field-effect transistors with metal-gate/high-k dielectric stack and CMOS-compatible PdGe contacts
2009 International Symposium on VLSI Technology, Systems, and Applications
◽
10.1109/vtsa.2009.5159330
◽
2009
◽
Author(s):
Hock-Chun Chin
◽
Xinke Liu
◽
Leng-Seow Tan
◽
Yee-Chia Yeo
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
High K
◽
Cmos Compatible
◽
High K Dielectric
Download Full-text
Mismatch of dielectric constants at the interface of nanometer metal-oxide-semiconductor devices with high-K gate dielectric impacts on the inversion charge density
Pramana
◽
10.1007/s12043-011-0052-0
◽
2011
◽
Vol 76
(4)
◽
pp. 657-666
◽
Cited By ~ 4
Author(s):
LING-FENG MAO
Keyword(s):
Metal Oxide
◽
Charge Density
◽
Gate Dielectric
◽
Semiconductor Devices
◽
Metal Oxide Semiconductor
◽
Dielectric Constants
◽
Oxide Semiconductor
◽
High K
◽
Inversion Charge
◽
High K Gate Dielectric
Download Full-text
Impact of the crystallization of the high-k dielectric gate oxide on the positive bias temperature instability of the n-channel metal-oxide-semiconductor field emission transistor
Applied Physics Letters
◽
10.1063/1.4811274
◽
2013
◽
Vol 102
(23)
◽
pp. 232909
◽
Cited By ~ 8
Author(s):
Han Jin Lim
◽
Youngkuk Kim
◽
In Sang Jeon
◽
Jaehyun Yeo
◽
Badro Im
◽
...
Keyword(s):
Metal Oxide
◽
Field Emission
◽
Gate Oxide
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Positive Bias
◽
Temperature Instability
◽
Bias Temperature Instability
◽
High K
◽
High K Dielectric
Download Full-text
Role of ultra thin pseudomorphic InP layer to improve the high-k dielectric/GaAs interface in realizing metal-oxide-semiconductor capacitor
Journal of Applied Physics
◽
10.1063/1.4745896
◽
2012
◽
Vol 112
(3)
◽
pp. 034514
◽
Cited By ~ 13
Author(s):
Souvik Kundu
◽
Nripendra N. Halder
◽
D. Biswas
◽
P. Banerji
◽
T. Shripathi
◽
...
Keyword(s):
Metal Oxide
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
High K
◽
High K Dielectric
◽
Metal Oxide Semiconductor Capacitor
Download Full-text
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