Inactivation Kinetics of Foodborne Pathogens with Electron Beam EmphasizingSalmonella

2016 ◽  
pp. 671-691
2007 ◽  
Vol 72 (7) ◽  
pp. M280-M285 ◽  
Author(s):  
P.R. Chalise ◽  
E. Hotta ◽  
K.E. Matak ◽  
J. Jaczynski

2017 ◽  
pp. 271-289
Author(s):  
Corliss A. O’Bryan ◽  
Nathan A. Jarvis ◽  
Philip G. Crandall ◽  
Steven C. Ricke

2015 ◽  
Vol 46 ◽  
pp. 263-271 ◽  
Author(s):  
Ginés Benito Martínez-Hernández ◽  
Juan-Pablo Huertas ◽  
Javier Navarro-Rico ◽  
Perla A. Gómez ◽  
Francisco Artés ◽  
...  

Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.


LWT ◽  
2021 ◽  
Vol 142 ◽  
pp. 111037
Author(s):  
Leonardo do Prado-Silva ◽  
Verônica O. Alvarenga ◽  
Gilberto Ú.L. Braga ◽  
Anderson S. Sant’Ana

2012 ◽  
Vol 19 (11) ◽  
pp. 1177-1182
Author(s):  
Ji-Ping Zhang ◽  
Bo Leng ◽  
Qian-Sheng Huang ◽  
Ya-Wen Yan ◽  
Xuan Liu ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document