Bone repair after osteotomy with diamond burs and CVD ultrasonic tips – histological study in rats

This study histologically evaluated the behavior of bone tissue of rats submitted to osteotomy with conventional diamond burs in high speed and a new ultrasonic diamond tips system (CVD – Chemical Vapor Deposition), at different study periods. The study was conducted on 24 Wistar rats. Osteotomy was performed on the posterior paws of each rat, with utilization of diamond burs in high speed under thorough water cooling at the right paw, and CVD tips at the left paw. Animals were killed at 0, 7, 14 and 21 days after treatment, followed by removal of connective tissue and bone at the area of osteotomy. Specimens were fixated, demineralized, dehydrated and sectioned for histological analysis by polarized light microscopy (25, 100 and 200x magnification) by two examiners. The results demonstrated that there were no differences in the repair of bone defects between the two different materials employed for osteotomy.

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High speed metal‐semiconductor‐metal photodetector manufactured on GaAs by low‐temperature photoassisted metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114129 ◽

1995 ◽

Vol 66 (26) ◽

pp. 3651-3653 ◽

Cited By ~ 3

Author(s):

K. S. Boutros ◽

J. C. Roberts ◽

S. M. Bedair ◽

T. F. Carruthers ◽

M. Y. Frankel

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

High Speed ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metal Semiconductor Metal ◽

Metalorganic Chemical

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High‐speed laser chemical vapor deposition of copper: A search for optimum conditions

Journal of Applied Physics ◽

10.1063/1.342817 ◽

1989 ◽

Vol 65 (6) ◽

pp. 2470-2474 ◽

Cited By ~ 30

Author(s):

B. Markwalder ◽

M. Widmer ◽

D. Braichotte ◽

H. van den Bergh

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Speed ◽

Chemical Vapor ◽

Optimum Conditions ◽

Laser Chemical Vapor Deposition

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Growth and Characterization of High-Speed Carbon-Doped-Base InP/InGaAs Heterojunction Bipolar Transistors by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.3343 ◽

1996 ◽

Vol 35 (Part 1, No. 6A) ◽

pp. 3343-3349 ◽

Cited By ~ 17

Author(s):

Hiroshi Ito ◽

Shoji Yamahata ◽

Naoteru Shigekawa ◽

Kenji Kurishima ◽

Yutaka Matsuoka

Keyword(s):

Chemical Vapor Deposition ◽

Heterojunction Bipolar Transistors ◽

Vapor Deposition ◽

High Speed ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Bipolar Transistors ◽

Carbon Doped ◽

Metalorganic Chemical

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High-purity and high-quality 4H–SiC grown at high speed by chimney-type vertical hot-wall chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.1456968 ◽

2002 ◽

Vol 80 (9) ◽

pp. 1586-1588 ◽

Cited By ~ 45

Author(s):

K. Fujihira ◽

T. Kimoto ◽

H. Matsunami

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Purity ◽

High Speed ◽

Chemical Vapor ◽

High Quality

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High-Speed Growth and Characterization of AlN Polycrystalline Layers by High Temperature Chemical Vapor Deposition

ECS Meeting Abstracts ◽

10.1149/ma2009-02/34/2537 ◽

2009 ◽

Keyword(s):

Chemical Vapor Deposition ◽

High Temperature ◽

Vapor Deposition ◽

High Speed ◽

Chemical Vapor

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Growth of high quality AlInAs by low pressure organometallic chemical vapor deposition for high speed and optoelectronic device applications

Journal of Crystal Growth ◽

10.1016/0022-0248(91)90220-y ◽

1991 ◽

Vol 108 (3-4) ◽

pp. 441-448 ◽

Cited By ~ 72

Author(s):

R. Bhat ◽

M.A. Koza ◽

K. Kash ◽

S.J. Allen ◽

W.P. Hong ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Speed ◽

Chemical Vapor ◽

Optoelectronic Device ◽

Low Pressure ◽

High Quality ◽

Device Applications ◽

Organometallic Chemical Vapor Deposition

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Use of CVDentUS Diamond Tips for Ultrasound in Cavity Preparation

The Journal of Contemporary Dental Practice ◽

10.5005/jcdp-7-3-50 ◽

2006 ◽

Vol 7 (3) ◽

pp. 50-58 ◽

Cited By ~ 7

Author(s):

Roberta Tarkany Basting ◽

Juliane Ceolin Predebon ◽

Flávia Martão Flório

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Speed ◽

Cutting Speed ◽

Chemical Vapor ◽

Cutting Efficiency ◽

Cavity Preparation ◽

Tooth Structure ◽

Tooth Preparation ◽

E Mail

Abstract Aim The aim of this study was to evaluate the use of CVDentUS tips for preparing cavities with ultrasound by dentists certified to use the Chemical Vapor Deposition (CVD) system. Methods and Materials One thousand sixty (1060) questionnaires were sent via e-mail inquiring about the use of the system with regard to the indication for use, need for anesthesia, final form of cavity preparation, and tip wear. Results Of the valid answers, 81.4% of the dentists used this system for tooth preparation in up to 60% of cases treated. For these procedures, 17.8% did not require use of local anesthesia while using the system. The final form of preparation compared to high speed diamond tips was considered to be more conservative by 48.3% of the certified professionals. With regard to wear, tip and/or adapter fractures, and low cutting speed, 44.4% of users reported problems. Discussion The CVD system seems to be used for tooth cavity preparation by the majority of the certified dentists. This is due to the resultant conservation of tooth structure despite the necessity of anesthesia and the limitations with regard to the lack of cutting efficiency of CVDentUS and tip wear. Clinical Significance The CVD system seems to present limitations with regard to cutting efficiency, wear, and the use of anesthesia in a majority of restorative procedures. Citation Predebon JC, Flório FM, Basting RT. Use of CVDentUS Diamond Tips for Ultrasound in Cavity Preparation. J Contemp Dent Pract 2006 July;(7)3:050-058.

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