scholarly journals MODERNIZATION FEATURES OF A VACUUM INSTALLATION BASED ON LOW-PRESSURE ARC DISCHARGE FOR COMPOSITE TIN-CU LAYERS FORMATION

2015 ◽  
Vol 55 (2) ◽  
pp. 136-139 ◽  
Author(s):  
Dmitriy Tsyrenov ◽  
Aleksandr Semenov ◽  
Natalia Smirnyagina

A hybrid technology for forming composite TiN-Cu layers under the combined influence of a magnetron and low pressure arc discharges has been designed. The parameters of the plasma generator have been studied. The technological parameters for layer deposition in the conditions of coordinated action of the vacuum arc evaporator and the planar magnetron have been studied. This report describes the phase composition of TiN-Cu layers and the structure on fused silica substrates.

2011 ◽  
Vol 37 (7) ◽  
pp. 636-639 ◽  
Author(s):  
A. D. Pogrebnyak ◽  
A. P. Shpak ◽  
V. M. Beresnev ◽  
G. V. Kirik ◽  
D. A. Kolesnikov ◽  
...  

Author(s):  
A. S. Bugaev ◽  
A. V. Vizir ◽  
V. I. Gushenets ◽  
A. G. Nikolaev ◽  
A. V. Nikonenko ◽  
...  

2021 ◽  
Vol 2064 (1) ◽  
pp. 012029
Author(s):  
I V Lopatin ◽  
Yu H Akhmadeev ◽  
S S Kovalsky ◽  
D Yu Ignatov

Abstract This paper presents the results of a study of an electron-ion-plasma alitization system using two arc plasma generators: a gas plasma generator based on a non-self-sustained arc discharge with a thermionic cathode “PINK” and a gas-metal plasma generator based on an arc discharge with a cathode spot. The system for discharges supplying and biasing of the samples assumes two sub-modes of operation: the ion cleaning sub-mode (ion sub-mode) and the sub-mode of samples electron heating (electron sub-mode), thus realizing the “elion” mode of the system operation. During the experiments, both the dependences of the average values of currents and voltages of discharges burning and probe measurements of the instantaneous plasma parameters values in both system operating sub-modes were investigated. It is shown, that the electron sub-mode of system operation is characterized by an increased burning voltage, which is caused by the formation of a positive anode drop of more than 10 V in the plasmas. Such a potential distribution in the discharges ensures effective heating of the samples by the discharges plasmas electron component.


2018 ◽  
Vol 9 (2) ◽  
pp. 323-328 ◽  
Author(s):  
L. Yu. Fedorov ◽  
I. V. Karpov ◽  
A. V. Ushakov ◽  
A. A. Lepeshev

2019 ◽  
Vol 61 (12) ◽  
pp. 2515
Author(s):  
А.В. Ушаков ◽  
И.В. Карпов ◽  
Л.Ю. Федоров ◽  
А.А. Шайхадинов ◽  
В.Г. Дёмин ◽  
...  

Quasicrystalline coatings of the Al-Cu-Fe system were obtained by sputtering the cathode using a pulsed high-current low-pressure arc discharge followed by deposition on a hot (600 ° C) and cooled substrate (25 ° C). The surface morphology, chemical and phase composition of evaporation products in the form of powder and the resulting coatings were studied. Powders and coatings were also annealed and the phase composition variation was studied. It was found that during the evaporation process a significant change in the chemical composition occurs in the form of loss of Al from the surface of the particles and the coating, which leads to a decrease in the content of the ψ phase. However, subsequent annealing and sputtering on a hot substrate lead to an increase in the ψ phase, as well as the density and hardness of the coatings.


Author(s):  
L. Wan ◽  
R. F. Egerton

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.


2019 ◽  
Vol 0 (9) ◽  
pp. 9-14
Author(s):  
A. V. Ushakov ◽  
◽  
I. V. Karpov ◽  
L. Yu. Fedorov ◽  
E.A. Dorozhkina ◽  
...  

2021 ◽  
pp. 138731
Author(s):  
Bert Scheffel ◽  
Olaf Zywitzki ◽  
Thomas Preußner ◽  
Torsten Kopte

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