Hydrogen Radical Generation and Characterization of a Remote Plasma Source

2015 ◽  
Author(s):  
Scott Polak ◽  
◽  
D. Carter ◽  
A. Bhoj ◽  
A. Roy ◽  
...  
Keyword(s):  
Plasma Source ◽  
Remote Plasma ◽  
Radical Generation ◽  
Hydrogen Radical

scholarly journals Merits of microwave plasmas for optical emission spectrometry – characterization of an axially viewed microwave-sustained, inductively coupled, atmospheric-pressure plasma (MICAP)

2020 ◽  
Vol 35 (10) ◽  
pp. 2369-2377
Author(s):  
Helmar Wiltsche ◽  
Matthias Wolfgang
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Optical Emission ◽  
Plasma Source ◽  
Optical Emission Spectrometry ◽  
Emission Spectrometry ◽  
Icp Oes ◽  
Microwave Plasmas ◽  
Inductively Coupled

The MICAP is a microwave driven plasma source employing nitrogen as the plasma gas. In this work we compare LODs and LOQs obtained in axial viewing with those obtained by ICP-OES and evaluate the effect of air instead of nitrogen as the plasma gas.

Characterization of the Remote Plasma Generated in a Pulsed-DC Gas-Flow Hollow-Cathode Discharge

2007 ◽  
Vol 35 (3) ◽  
pp. 527-533 ◽  
Author(s):  
Cristian Paduraru ◽  
Kurt H. Becker ◽  
Abe Belkind ◽  
Jose L. Lopez ◽  
Y. Aranda Gonzalvo
Keyword(s):  
Hollow Cathode ◽  
Gas Flow ◽  
Hollow Cathode Discharge ◽  
Remote Plasma ◽  
Pulsed Dc

scholarly journals Characterization of membrane polypeptides from pea leaf peroxisomes involved in superoxide radical generation

1999 ◽  
Vol 337 (3) ◽  
pp. 531 ◽  
Author(s):  
Eduardo LÓPEZ-HUERTAS ◽  
Francisco J. CORPAS ◽  
Luisa M. SANDALIO ◽  
Luis A. DEL RÍO
Keyword(s):  
Superoxide Radical ◽  
Leaf Peroxisomes ◽  
Radical Generation

Plasma density measurement and downstream etching of silicon and silicon oxide in Ar/NF3 mixture remote plasma source

2019 ◽  
Vol 21 (6) ◽  
pp. 064007
Author(s):  
H J YEOM ◽  
D H CHOI ◽  
Y S LEE ◽  
J H KIM ◽  
D J SEONG ◽  
...  
Keyword(s):  
Plasma Density ◽  
Silicon Oxide ◽  
Density Measurement ◽  
Plasma Source ◽  
Remote Plasma

scholarly journals Characterization of hydrogen plasma in a permanent ring magnet based helicon plasma source for negative ion source research

2019 ◽  
Vol 61 (6) ◽  
pp. 065003 ◽  
Author(s):  
A Pandey ◽  
Debrup Mukherjee ◽  
Dipshikha Borah ◽  
M Bandyopadhyay ◽  
Himanshu Tyagi ◽  
...  
Keyword(s):  
Hydrogen Plasma ◽  
Plasma Source ◽  
Ion Source ◽  
Negative Ion ◽  
Helicon Plasma ◽  
Ring Magnet
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