Plasma Enhanced Atomic Layer Deposition of High Purity Titanium Nitride: Comparison of Hollow Cathode and Inductively Coupled Discharges

2018 ◽  
Author(s):  
S. Woodward
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Hollow Cathode ◽  
High Purity ◽  
Atomic Layer ◽  
Inductively Coupled ◽  
Layer Deposition ◽  
Purity Titanium

scholarly journals Tertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride

AIP Advances ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 015218
Author(s):  
Changbong Yeon ◽  
Jaesun Jung ◽  
Hyeran Byun ◽  
Kok Chew Tan ◽  
Taeho Song ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Alkyl Halides ◽  
Layer Deposition ◽  
Tertiary Alkyl

Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 °C

Vacuum ◽  
2021 ◽  
pp. 110739
Author(s):  
Jong Hyeon Won ◽  
Heenang Choi ◽  
Seong Ho Han ◽  
Bo Keun Park ◽  
Taek-Mo Chung ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Purity ◽  
Low Temperatures ◽  
Atomic Layer ◽  
Layer Deposition
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