Disorder effects in nitride semiconductors: impact on fundamental and device properties

Author(s):  
Claude Weisbuch ◽  
Shuji Nakamura ◽  
Yuh-Renn Wu ◽  
James S. Speck
Nanophotonics ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 3-21
Author(s):  
Claude Weisbuch ◽  
Shuji Nakamura ◽  
Yuh-Renn Wu ◽  
James S. Speck

AbstractSemiconductor structures used for fundamental or device applications most often incorporate alloy materials. In “usual” or “common” III–V alloys, based on the InGaAsP or InGaAlAs material systems, the effects of compositional disorder on the electronic properties can be treated in a perturbative approach. This is not the case in the more recent nitride-based GaInAlN alloys, where the potential changes associated with the various atoms induce strong localization effects, which cannot be described perturbatively. Since the early studies of these materials and devices, disorder effects have indeed been identified to play a major role in their properties. Although many studies have been performed on the structural characterization of materials, on intrinsic electronic localization properties, and on the impact of disorder on device operation, there are still many open questions on all these topics. Taking disorder into account also leads to unmanageable problems in simulations. As a prerequisite to address material and device simulations, a critical examination of experiments must be considered to ensure that one measures intrinsic parameters as these materials are difficult to grow with low defect densities. A specific property of nitride semiconductors that can obscure intrinsic properties is the strong spontaneous and piezoelectric fields. We outline in this review the remaining challenges faced when attempting to fully describe nitride-based material systems, taking the examples of LEDs. The objectives of a better understanding of disorder phenomena are to explain the hidden phenomena often forcing one to use ad hoc parameters, or additional poorly defined concepts, to make simulations agree with experiments. Finally, we describe a novel simulation tool based on a mathematical breakthrough to solve the Schrödinger equation in disordered potentials that facilitates 3D simulations that include alloy disorder.


1999 ◽  
Author(s):  
D. Munteanu ◽  
S. Cristoloveanu ◽  
Isaac Lagnado ◽  
Paul de la Houssaye

Author(s):  
Silviya Ninova ◽  
Osman Baris Malcioglu ◽  
Philipp Auburger ◽  
Matthias Franke ◽  
Ole Lytken ◽  
...  

Porphyrins are key elements in organic-inorganic hybrid systems for a wide range of applications. Understanding their interaction with the substrate gives a handle on structural and electronic device properties. Here...


Metals ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 772
Author(s):  
Seunghyun Kim ◽  
Osung Kwon ◽  
Hojeong Ryu ◽  
Sungjun Kim

This work demonstrates the synaptic properties of the alloy-type resistive random-access memory (RRAM). We fabricated the HfAlOx-based RRAM for a synaptic device in a neuromorphic system. The deposition of the HfAlOx film on the silicon substrate was verified by X-ray photoelectron spectroscopy (XPS) analysis. It was found that both abrupt and gradual resistive switching could be implemented, depending on the reset stop voltage. In the reset process, the current gradually decreased at weak voltage, and at strong voltage, it tended to decrease rapidly by Joule heating. The type of switching determined by the first reset process was subsequently demonstrated to be stable switching by successive set and reset processes. A gradual switching type has a much smaller on/off window than abrupt switching. In addition, retention maintained stability up to 2000 s in both switching cases. Next, the multiple current states were tested in the gradual switching case by identical pulses. Finally, we demonstrated the potentiation and depression of the Cu/HfAlOx/Si device as a synapse in an artificial neural network and confirmed that gradual resistive switching was suitable for artificial synapses, using neuromorphic system simulation.


2015 ◽  
Vol 30 (20) ◽  
pp. 2977-2990 ◽  
Author(s):  
Ingo Tischer ◽  
Matthias Hocker ◽  
Benjamin Neuschl ◽  
Manfred Madel ◽  
Martin Feneberg ◽  
...  

Abstract


2013 ◽  
Vol 26 (5) ◽  
pp. 805-809 ◽  
Author(s):  
Guigang Zhang ◽  
Mingwen Zhang ◽  
Xinxin Ye ◽  
Xiaoqing Qiu ◽  
Sen Lin ◽  
...  

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