scholarly journals Using of Matrix Algorithms for Calculation of Trajectories of Charged Particles and for Defining Parameters of Electron Beam

2020 ◽  
Vol 42 (1) ◽  
pp. 73-90
Author(s):  
I.V. Melnyk ◽  
◽  
A.V. Pochynok ◽  
2007 ◽  
Vol 73 (5) ◽  
pp. 627-634 ◽  
Author(s):  
J. T. MENDONÇA ◽  
L. O. SILVA ◽  
R. BINGHAM

AbstractA new configuration for the laser accelerator is proposed, which is inspired by the relativistic photon mirror effect. The material mirror is replaced here by an intense laser pulse, acting as a photon mirror for the incoming charged particles. A sufficient condition for particle reflection at such a photon mirror is established and three types of particle trajectories are described. A snow-plow acceleration regime is identified and quantitatively defined. Production of intense radiation bursts by the charged particle beam during the reflection process is also demonstrated.


1991 ◽  
Vol 9 (1) ◽  
pp. 149-165 ◽  
Author(s):  
K. Niu ◽  
P. Mulser ◽  
L. Drska

Analyses are given for beam generations of three kinds of charged particles: electrons, light ions, and heavy ions. The electron beam oscillates in a dense plasma irradiated by a strong laser light. When the frequency of laser light is high and its intensity is large, the acceleration of oscillating electrons becomes large and the electrons radiate electromagnetic waves. As the reaction, the electrons feel a damping force, whose effect on oscillating electron motion is investigated first. Second, the electron beam induces the strong electromagnetic field by its self-induced electric current density when the electron number density is high. The induced electric field reduces the oscillation motion and deforms the beam.In the case of a light ion beam, the electrostatic field, induced by the beam charge, as well as the electromagnetic field, induced by the beam current, affects the beam motion. The total energy of the magnetic field surrounding the beam is rather small in comparison with its kinetic energy.In the case of heavy ion beams the beam charge at the leading edge is much smaller in comparison with the case of light ion beams when the heavy ion beam propagates in the background plasma. Thus, the induced electrostatic and electromagnetic fields do not much affect the beam propagation.


2015 ◽  
Vol 2015 ◽  
pp. 1-10 ◽  
Author(s):  
Gerard Granet ◽  
Petr Melezhik ◽  
Anatoliy Poyedinchuk ◽  
Seil Sautbekov ◽  
Yuriy Sirenko ◽  
...  

Resonances in reverse Vavilov-Cherenkov radiation produced by the charged particles beam passage over periodic boundary of dispersive left-handed medium are found out and studied. Analysis and modeling are performed on the base of rigorous mathematical approaches. For the first time, several physical peculiarities owing to these effects are considered in the conditions of possible resonant scattering of electromagnetic waves.


Shinku ◽  
1992 ◽  
Vol 35 (3) ◽  
pp. 286-289
Author(s):  
Hironori OHBA ◽  
Takashi ARISAWA ◽  
Akihiko NISHIMURA ◽  
Koichi OGURA ◽  
Takemasa SHIBATA

Author(s):  
M.K. Lamvik

The intensity of the electron beam in an electron microscope is at once the basis for progress as well as the ultimate limitation in electron microscopy of organic materials. Gabor noted that the highest intensity available for light optics comes from sunlight, which produces an energy density of 2,000 watts/cm2-steradian. The electron sources in early microscopes could produce a million times that amount, and modern sources even more. While the high intensity made good images possible (because numerical apertures used for electron microscopes are less than 1% of the size used in light microscopy) early microscopists feared that such a high flux of charged particles would destroy most specimens, especially organic ones. Although it was soon found that biological specimens could survive observation by electron microscopy, the introduction of double-condenser illumination systems revealed the problem of specimen contamination. In time it became clear that radiation damage was more fundamental than the gross increases or decreases in specimen mass observed in contamination and etching.


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