Relationship between Local Contaminated Positions and Breakdown Points in Vacuum under Initial Conditioning Process of Pure Nickel Electrode

Some information on the size and density of voids that develop in several high purity metals and alloys during irradiation with neutrons at elevated temperatures has been reported as a function of irradiation parameters. An area of particular interest is the nucleation and early growth stage of voids. It is the purpose of this paper to describe the microstructure in high purity nickel after irradiation to a very low but constant neutron exposure at three different temperatures.Annealed specimens of 99-997% pure nickel in the form of foils 75μ thick were irradiated in a capsule to a total fluence of 2.2 × 1019 n/cm2 (E > 1.0 MeV). The capsule consisted of three temperature zones maintained by heaters and monitored by thermocouples at 350, 400, and 450°C, respectively. The temperature was automatically dropped to 60°C while the reactor was down.

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HREM observation of NiO growth on submicron spheres of pure nickel

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100154718 ◽

1989 ◽

Vol 47 ◽

pp. 548-549

Author(s):

C.M. Teng ◽

T.F. Kelly ◽

J.P. Zhang ◽

H.M. Lin ◽

Y.W. Kim

Keyword(s):

Nickel Oxide ◽

Grain Boundaries ◽

Pure Nickel ◽

Submicron Particles ◽

Crystal Formation ◽

Nickel Wire ◽

Liquid Droplets ◽

Oxide Interface ◽

Nickel Chromium ◽

Chromium Alloys

Spherical submicron particles of materials produced by electrohydrodynamic (EHD) atomization have been used to study a variety of materials processes including nucleation of alternative crystallization phases in iron-nickel and nickel-chromium alloys, amorphous solidification in submicron droplets of pure metals, and quasi-crystal formation in nickel-chromium alloys. Some experiments on pure nickel, nickel oxide single crystals, the nickel/nickel(II) oxide interface, and grain boundaries in nickel monoxide have been performed by STEM. For these latter studies, HREM is the most direct approach to obtain particle crystal structures at the atomic level. Grain boundaries in nickel oxide have also been investigated by HREM. In this paper, we present preliminary results of HREM observations of NiO growth on submicron spheres of pure nickel.Small particles of pure nickel were prepared by EHD atomization. For the study of pure nickel, 0.5 mm diameter pure nickel wire (99.9975%) is sprayed directly in the EHD process. The liquid droplets solidify in free-flight through a vacuum chamber operated at about 10-7 torr.

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Conditioning: Process or Procedure?

Contemporary Psychology ◽

10.1037/017071 ◽

1978 ◽

Vol 23 (4) ◽

pp. 230-231

Author(s):

BEN A. WILLIAMS

Keyword(s):

Conditioning Process

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Nickel electrode active material; a nickel electrode and a nickel alkali storage cell using such nickel electrode active material; and production methods of such material, electrode, and cell

Journal of Power Sources ◽

10.1016/s0378-7753(97)84041-4 ◽

1998 ◽

Vol 70 (1) ◽

pp. 144

Author(s):

A Yamawaki

Keyword(s):

Active Material ◽

Nickel Electrode ◽

Storage Cell ◽

Production Methods

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KANTHAL 70

Alloy Digest ◽

10.31399/asm.ad.ni0270 ◽

1981 ◽

Vol 30 (9) ◽

Keyword(s):

Operating Temperature ◽

Heat Treating ◽

Positive Temperature Coefficient ◽

Pure Nickel ◽

Voltage Source ◽

Voltage Regulator ◽

Positive Temperature ◽

Automotive Applications ◽

Resistance Thermometers ◽

In Series

Abstract KANTHAL 70 alloy was designed to provide a high positive temperature coefficient to electrical resistance comparable with that of pure nickel; however, it has much higher electrical resistivity than pure nickel. This makes it useful as a voltage regulator when placed in series with another electrical device across a fluctuating voltage source. Kanthal 70 has a maximum recommended operating temperature of 600 C and is used widely in resistance thermometers and in various appliance and automotive applications. This datasheet provides information on composition, physical properties, and tensile properties. It also includes information on corrosion resistance as well as forming, heat treating, and joining. Filing Code: Ni-270. Producer or source: The Kanthal Corporation.

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Kinematic Prediction and Experimental Demonstration of Conditioning Process for Controlling the Profile Shape of a Chemical Mechanical Polishing Pad

Applied Sciences ◽

10.3390/app11104358 ◽

2021 ◽

Vol 11 (10) ◽

pp. 4358

Author(s):

Hanchul Cho ◽

Taekyung Lee ◽

Doyeon Kim ◽

Hyoungjae Kim

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Shape Error ◽

Profile Shape ◽

Conditioning Process ◽

Polishing Pad ◽

Simulation Based ◽

Diamond Conditioner ◽

Pad Conditioning ◽

Good Agreement

The uniformity of the wafer in a chemical mechanical polishing (CMP) process is vital to the ultra-fine and high integration of semiconductor structures. In particular, the uniformity of the polishing pad corresponding to the tool directly affects the polishing uniformity and wafer shape. In this study, the profile shape of a CMP pad was predicted through a kinematic simulation based on the trajectory density of the diamond abrasives of the diamond conditioner disc. The kinematic prediction was found to be in good agreement with the experimentally measured pad profile shape. Based on this, the shape error of the pad could be maintained within 10 μm even after performing the pad conditioning process for more than 2 h, through the overhang of the conditioner.

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