RF Power Dependence on Structural and Electrical Properties of Cu Thin Films on a Glass Substrate Prepared Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement

Magnetic Plasma

Structural and electrical properties of CuIn1−xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process

Applied Surface Science ◽

10.1016/j.apsusc.2014.11.131 ◽

2015 ◽

Vol 326 ◽

pp. 211-215 ◽

Cited By ~ 2

Author(s):

Jun Zhang ◽

Hongmei Deng ◽

Jun He ◽

Xiankuan Meng ◽

Tantan Liu ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Effect of annealing on structural and electrical properties of the Li–Mn–O thin films, prepared by high frequency RF magnetron sputtering

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2011.07.018 ◽

2011 ◽

Vol 72 (11) ◽

pp. 1251-1255 ◽

Cited By ~ 7

Author(s):

Rajive M. Tomy ◽

K.M. Anil Kumar ◽

P.B. Anand ◽

S. Jayalekshmi

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

High Frequency ◽

Rf Magnetron Sputtering ◽

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

Influence of deposition pressure and rf power on the structure and electrical properties of Zr[sub 0.8]Sn[sub 0.2]TiO[sub 4] thin films prepared by rf magnetron sputtering

10.1116/1.2437153 ◽

2007 ◽

Vol 25 (2) ◽

pp. 299

Author(s):

Cheng-Liang Huang ◽

Jun-Jie Wang ◽

Cheng-Hsing Hsu

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Rf Power ◽

Deposition Pressure

Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Applied Physics A ◽

10.1007/s003390000691 ◽

2001 ◽

Vol 73 (2) ◽

pp. 229-236 ◽

Cited By ~ 114

Author(s):

H.B. Nie ◽

S.Y. Xu ◽

S.J. Wang ◽

L.P. You ◽

Z. Yang ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Tantalum Nitride ◽

Radio Frequency Magnetron Sputtering ◽

Structural and electrical properties of Li-doped p-type ZnO thin films fabricated by RF magnetron sputtering

Materials Science and Engineering B ◽

10.1016/j.mseb.2010.12.018 ◽

2011 ◽

Vol 176 (7) ◽

pp. 548-551 ◽

Cited By ~ 18

Author(s):

Lidan Tang ◽

Bing Wang ◽

Yue Zhang ◽

Yousong Gu

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Zno Thin Films ◽

P Type

The effect of RF power and deposition temperature on the structure and electrical properties of Mg4Ta2O9 thin films prepared by RF magnetron sputtering

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2008.09.083 ◽

2009 ◽

Vol 311 (3) ◽

pp. 627-633 ◽

Cited By ~ 5

Author(s):

Cheng-Liang Huang ◽

Jhih-Yong Chen

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Deposition Temperature ◽

Rf Magnetron Sputtering ◽

Rf Power

Structural and electrical properties of fluorine-doped zinc tin oxide thin films prepared by radio-frequency magnetron sputtering

Current Applied Physics ◽

10.1016/j.cap.2014.03.020 ◽

2014 ◽

Vol 14 (6) ◽

pp. 850-855 ◽

Cited By ~ 17

Author(s):

R. Pandey ◽

S.H. Cho ◽

D.K. Hwang ◽

W.K. Choi

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Zinc Tin Oxide

Structural and electrical properties of CuAlMo thin films prepared by magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2013.05.145 ◽

2013 ◽

Vol 540 ◽

pp. 235-241 ◽

Cited By ~ 3

Author(s):

Martin Birkett ◽

Roger Penlington ◽

Chaoying Wan ◽

Guillaume Zoppi

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

Applied Surface Science ◽

10.1016/j.apsusc.2014.01.155 ◽

2014 ◽

Vol 301 ◽

pp. 28-33 ◽

Cited By ~ 21

Author(s):

Magdalena Szymańska ◽

Sylwia Gierałtowska ◽

Łukasz Wachnicki ◽

Marcin Grobelny ◽

Katarzyna Makowska ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Hafnium Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Gas Pressure Dependence on Structural and Electrical Properties of Ni Thin Films on an Acrylonitrile-Butadiene-Styrene Resin Prepared Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma

IEEJ Transactions on Sensors and Micromachines ◽

10.1541/ieejsmas.140.60 ◽

2020 ◽

Vol 140 (3) ◽

pp. 60-64

Author(s):

Masayuki Iwasaki ◽

Hiroshi Toyota

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Acrylonitrile Butadiene Styrene ◽

Inductively Coupled ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Butadiene Styrene