Structural and electrical properties of CuAlMo thin films prepared by magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2013.05.145 ◽

2013 ◽

Vol 540 ◽

pp. 235-241 ◽

Author(s):

Martin Birkett ◽

Roger Penlington ◽

Chaoying Wan ◽

Guillaume Zoppi

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Structural And Electrical Properties

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Structural and electrical properties of CuIn1−xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process

Applied Surface Science ◽

10.1016/j.apsusc.2014.11.131 ◽

2015 ◽

Vol 326 ◽

pp. 211-215 ◽

Author(s):

Jun Zhang ◽

Hongmei Deng ◽

Jun He ◽

Xiankuan Meng ◽

Tantan Liu ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties

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Effect of annealing on structural and electrical properties of the Li–Mn–O thin films, prepared by high frequency RF magnetron sputtering

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2011.07.018 ◽

2011 ◽

Vol 72 (11) ◽

pp. 1251-1255 ◽

Author(s):

Rajive M. Tomy ◽

K.M. Anil Kumar ◽

P.B. Anand ◽

S. Jayalekshmi

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

High Frequency ◽

Rf Magnetron Sputtering ◽

Structural And Electrical Properties

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Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Applied Physics A ◽

10.1007/s003390000691 ◽

2001 ◽

Vol 73 (2) ◽

pp. 229-236 ◽

Author(s):

H.B. Nie ◽

S.Y. Xu ◽

S.J. Wang ◽

L.P. You ◽

Z. Yang ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Tantalum Nitride ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties

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Structural and electrical properties of Li-doped p-type ZnO thin films fabricated by RF magnetron sputtering

Materials Science and Engineering B ◽

10.1016/j.mseb.2010.12.018 ◽

2011 ◽

Vol 176 (7) ◽

pp. 548-551 ◽

Author(s):

Lidan Tang ◽

Bing Wang ◽

Yue Zhang ◽

Yousong Gu

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Zno Thin Films ◽

Structural And Electrical Properties ◽

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Structural and electrical properties of fluorine-doped zinc tin oxide thin films prepared by radio-frequency magnetron sputtering

Current Applied Physics ◽

10.1016/j.cap.2014.03.020 ◽

2014 ◽

Vol 14 (6) ◽

pp. 850-855 ◽

Author(s):

R. Pandey ◽

S.H. Cho ◽

D.K. Hwang ◽

W.K. Choi

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Structural And Electrical Properties ◽

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Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

Applied Surface Science ◽

10.1016/j.apsusc.2014.01.155 ◽

2014 ◽

Vol 301 ◽

pp. 28-33 ◽

Author(s):

Magdalena Szymańska ◽

Sylwia Gierałtowska ◽

Łukasz Wachnicki ◽

Marcin Grobelny ◽

Katarzyna Makowska ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Hafnium Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Structural And Electrical Properties

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RF Power Dependence on Structural and Electrical Properties of Cu Thin Films on a Glass Substrate Prepared Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement

IEEJ Transactions on Sensors and Micromachines ◽

10.1541/ieejsmas.140.188 ◽

2020 ◽

Vol 140 (8) ◽

pp. 188-192

Author(s):

Taro Katayama ◽

Hiroshi Toyota

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Glass Substrate ◽

Power Dependence ◽

Rf Power ◽

Plasma Confinement ◽

Structural And Electrical Properties ◽

Magnetic Plasma

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Gas Pressure Dependence on Structural and Electrical Properties of Ni Thin Films on an Acrylonitrile-Butadiene-Styrene Resin Prepared Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma

IEEJ Transactions on Sensors and Micromachines ◽

10.1541/ieejsmas.140.60 ◽

2020 ◽

Vol 140 (3) ◽

pp. 60-64

Author(s):

Masayuki Iwasaki ◽

Hiroshi Toyota

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Acrylonitrile Butadiene Styrene ◽

Inductively Coupled ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Structural And Electrical Properties ◽

Butadiene Styrene

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Effect of target materials on structural and electrical properties of unhydrogenated amorphous silicon thin films deposited by RF magnetron sputtering

2008 33rd IEEE Photovolatic Specialists Conference ◽

10.1109/pvsc.2008.4922813 ◽

2008 ◽

Author(s):

S. Paul ◽

S. Chatterjee ◽

Yiqiang Chen ◽

P. Dutta ◽

V. Bommisetty ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Amorphous Silicon ◽

Rf Magnetron Sputtering ◽

Silicon Thin Films ◽

Structural And Electrical Properties

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Composition-dependent structural and electrical properties of p-type SnOx thin films prepared by reactive DC magnetron sputtering: effects of oxygen pressure and heat treatment

RSC Advances ◽

10.1039/c6ra08726d ◽

2016 ◽

Vol 6 (75) ◽

pp. 71757-71766 ◽

Author(s):

Sang Jin Han ◽

Sungmin Kim ◽

Joongyu Ahn ◽

Jae Kyeong Jeong ◽

Hoichang Yang ◽

...

Keyword(s):

Heat Treatment ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

Post Heat Treatment ◽

Dc Sputtering ◽

Partial Pressures ◽

Structural And Electrical Properties ◽

The composition-dependent structural and electrical properties of p-type SnOx films prepared by reactive DC sputtering at various oxygen partial pressures (PO) and post-heat treatment temperatures (TA) were investigated.

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