Oxidation of Planar and Plasmonic Ag Surfaces by Exposure to O2/Ar Plasma for Organic Optoelectronic Applications

MRS Advances ◽  
2016 ◽  
Vol 1 (14) ◽  
pp. 943-948 ◽  
Author(s):  
Christopher E. Petoukhoff ◽  
Catherine Antonick ◽  
Bala Murali Krishna M. ◽  
Keshav M. Dani ◽  
Deirdre M. O'Carroll
Keyword(s):  
Exposure Time ◽  
Photoelectron Spectroscopy ◽  
Dark Field ◽  
Binding Energies ◽  
Surface Oxide Layer ◽  
Pump Probe ◽  
Dark Field Microscopy ◽  
Ar Plasma ◽  
Organic Optoelectronic ◽  
Ultrathin Layer

ABSTRACTHere, we expose planar and plasmonic Ag surfaces to a low-power O2/Ar plasma to form an ultrathin surface oxide layer. We study the chemical state and morphology of the plasma-treated Ag surfaces using X-ray photoelectron spectroscopy, scanning electron microscopy, and dark-field microscopy. We observe the formation of an ultrathin layer (< 10 nm) composed of both AgOx and Ag2CO3 for a plasma exposure time of 1 s by investigating shifts in the Ag3d, O1s, and C1s core level binding energies. For an exposure time of 1 s, the surface structure of the planar and plasmonic Ag surfaces remains unchanged. For exposure times of 5 - 30 s, the planar Ag surfaces become porous and exhibit increased surface roughness. We demonstrate that the plasma-treated planar and plasmonic Ag surfaces lead to improvements in the excited-state population of a polymer:fullerene coating through ultrafast pump-probe reflectometry.

Oxidation of Al–Au intermetallics and its consequences studied by x-ray photoelectron spectroscopy

2008 ◽  
Vol 23 (5) ◽  
pp. 1371-1382 ◽  
Author(s):  
T. Sritharan ◽  
Y.B. Li ◽  
C. Xu ◽  
S. Zhang
Keyword(s):  
Binding Energy ◽  
Exposure Time ◽  
Photoelectron Spectroscopy ◽  
Peak Shift ◽  
Binding Energies ◽  
Chemical State ◽  
Oxide Layers ◽  
X Ray ◽  
Increasing Trend ◽  
Energy Emissions

Three common Al–Au intermetallics, Al2Au, AlAu2, and AlAu4, were oxidized in the air and characterized using x-ray photoelectron spectroscopy in terms of the elemental chemical state. It was found that there is an increasing trend of oxidation in these intermetallics as the Au content increases. AlAu4 shows the greatest tendency to oxidize with two extra peaks appearing on the Au 4f spectra after long exposure time in air. The surface of AlAu2, although fully oxidized, reveals only one Au 4f peak shift as depth increases. Al2Au was the least oxidizing compound, and the oxide is thin. The binding energies of Al 2p and Au 4f peaks were measured and reported. The Au atoms trapped in the oxide layers exhibit higher binding energy emissions compared to those of elemental Au.

Elastic Scattering in Electron Microscopy

1973 ◽  
Vol 31 ◽  
pp. 252-253
Author(s):  
J. Langmore ◽  
M. Isaacson ◽  
J. Wall ◽  
A. V. Crewe
Keyword(s):  
Electron Microscopy ◽  
Elastic Scattering ◽  
Cross Section ◽  
Quantum Noise ◽  
Dark Field ◽  
Elastic Cross Section ◽  
Biological Molecules ◽  
Dark Field Microscopy ◽  
Field Systems ◽  
Effects Of Radiation

High resolution dark field microscopy is becoming an important tool for the investigation of unstained and specifically stained biological molecules. Of primary consideration to the microscopist is the interpretation of image Intensities and the effects of radiation damage to the specimen. Ignoring inelastic scattering, the image intensity is directly related to the collected elastic scattering cross section, σɳ, which is the product of the total elastic cross section, σ and the eficiency of the microscope system at imaging these electrons, η. The number of potentially bond damaging events resulting from the beam exposure required to reduce the effect of quantum noise in the image to a given level is proportional to 1/η. We wish to compare η in three dark field systems.

Simulated Dark-Field Electron Micrographs of Point Defects and Organometallics

1975 ◽  
Vol 33 ◽  
pp. 200-201
Author(s):  
William Krakow
Keyword(s):  
Electron Micrographs ◽  
Point Defects ◽  
Structure Determination ◽  
Atomic Structure ◽  
Image Interpretation ◽  
Dark Field ◽  
Field Electron ◽  
Dark Field Microscopy ◽  
Dark Field Electron

Tilted beam dark-field microscopy has been applied to atomic structure determination in perfect crystals, several synthesized molecules with heavy atcm markers and in the study of displaced atoms in crystals. Interpretation of this information in terms of atom positions and atom correlations is not straightforward. Therefore, calculated dark-field images can be an invaluable aid in image interpretation.

scholarly journals Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar

Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1595
Author(s):  
Nomin Lim ◽  
Yeon Sik Choi ◽  
Alexander Efremov ◽  
Kwang-Ho Kwon
Keyword(s):  
Gas Phase ◽  
Photoelectron Spectroscopy ◽  
Reactive Ion Etching ◽  
Research Work ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Ion Etching ◽  
Ar Plasma ◽  
Ar Gas ◽  
Etching Selectivity

This research work deals with the comparative study of C6F12O + Ar and CF4 + Ar gas chemistries in respect to Si and SiO2 reactive-ion etching processes in a low power regime. Despite uncertain applicability of C6F12O as the fluorine-containing etchant gas, it is interesting because of the liquid (at room temperature) nature and weaker environmental impact (lower global warming potential). The combination of several experimental techniques (double Langmuir probe, optical emission spectroscopy, X-ray photoelectron spectroscopy) allowed one (a) to compare performances of given gas systems in respect to the reactive-ion etching of Si and SiO2; and (b) to associate the features of corresponding etching kinetics with those for gas-phase plasma parameters. It was found that both gas systems exhibit (a) similar changes in ion energy flux and F atom flux with variations on input RF power and gas pressure; (b) quite close polymerization abilities; and (c) identical behaviors of Si and SiO2 etching rates, as determined by the neutral-flux-limited regime of ion-assisted chemical reaction. Principal features of C6F12O + Ar plasma are only lower absolute etching rates (mainly due to the lower density and flux of F atoms) as well as some limitations in SiO2/Si etching selectivity.

scholarly journals Multiplexed Plasmonic Nano-Labeling for Bioimaging of Cytological Stained Samples

Cancers ◽  
2021 ◽  
Vol 13 (14) ◽  
pp. 3509
Author(s):  
Paule Marcoux-Valiquette ◽  
Cécile Darviot ◽  
Lu Wang ◽  
Andrée-Anne Grosset ◽  
Morteza Hasanzadeh Kafshgari ◽  
...  
Keyword(s):  
Accurate Determination ◽  
Cell Types ◽  
Fine Needle Biopsy ◽  
Dark Field ◽  
Imaging Method ◽  
New Methods ◽  
Formalin Fixed Paraffin ◽  
Dark Field Microscopy ◽  
Formalin Fixed Paraffin Embedded

Reliable cytopathological diagnosis requires new methods and approaches for the rapid and accurate determination of all cell types. This is especially important when the number of cells is limited, such as in the cytological samples of fine-needle biopsy. Immunoplasmonic-multiplexed- labeling may be one of the emerging solutions to such problems. However, to be accepted and used by the practicing pathologists, new methods must be compatible and complementary with existing cytopathology approaches where counterstaining is central to the correct interpretation of immunolabeling. In addition, the optical detection and imaging setup for immunoplasmonic-multiplexed-labeling must be implemented on the same cytopathological microscope, not interfere with standard H&E imaging, and operate as a second easy-to-use imaging method. In this article, we present multiplex imaging of four types of nanoplasmonic markers on two types of H&E-stained cytological specimens (formalin-fixed paraffin embedded and non-embedded adherent cancer cells) using a specially designed adapter for SI dark-field microscopy. The obtained results confirm the effectiveness of the proposed optical method for quantitative and multiplex identification of various plasmonic NPs, and the possibility of using immunoplasmonic-multiplexed-labeling for cytopathological diagnostics.

scholarly journals Boron from net charge acceptor to donor and its effect on hydrogen uptake by novel Mg-B-electrochemically synthesized reduced graphene oxide

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Marla V. V. Satya Aditya ◽  
Srikanta Panda ◽  
Sankara Sarma V. Tatiparti
Keyword(s):  
Graphene Oxide ◽  
Reduced Graphene Oxide ◽  
Incubation Time ◽  
Photoelectron Spectroscopy ◽  
Weight Ratio ◽  
Hydrogen Uptake ◽  
Binding Energies ◽  
Unit Cell ◽  
Net Charge ◽  
Reduced Graphene

AbstractHydrogen uptake (H-uptake) is studied in ball milled Mg-B-electrochemically synthesized reduced graphene oxide (erGO) nanocomposites at PH2 ≈ 15 bar, ~ 320 °C. B/C (weight ratio): 0, ~ 0.09, ~ 0.36, ~ 0.90 are synthesized maintaining erGO≈10wt %. B occupies octahedral interstices within Mg unit cell—revealed by electron density maps. Persistent charge donations from Mg and B to C appear as Mg-C (~ 283.2 eV), B-C (~ 283.3–283.9 eV) interactions in C-1s core X-ray photoelectron spectroscopy (XPS) at all B/C. At B/C > 0.09, charge reception by B from Mg yields Mg-B interaction. This net charge acceptor role of B renders it electron-rich and does not alter Mg unit cell size significantly. Despite charge donation to both C and B, the Mg charge is <  + 2, resulting in long incubation times (> 5 h) at B/C > 0.09. At B/C≈0.09 the minimal Mg-B interaction renders B a charge donor, resulting in Mg-B repulsion and Mg unit cell expansion. Mg-C peak shift to lower binding energies (C-1s XPS), decreases incubation time to ~ 2.25 h and enhances H-uptake kinetics. Various atomic interactions influence the reduction of incubation time in H-uptake and increase its kinetics in the order: (Mg → C; B → C)B/C≈0.09, B: donor > (Mg → C)B/C=0 > (ternary Mg → B → C)B/C>0.09, B: acceptor.

scholarly journals Hyperspectral-enhanced dark field analysis of individual and collective photo-responsive gold–copper sulfide nanoparticles

Nanoscale ◽  
2021 ◽  
Author(s):  
Paula Zamora-Perez ◽  
Beatriz Pelaz ◽  
Dionysia Tsoutsi ◽  
Mahmoud G. Soliman ◽  
Wolfgang J. Parak ◽  
...  
Keyword(s):  
Physicochemical Properties ◽  
Real Time ◽  
Copper Sulfide ◽  
Dark Field ◽  
Field Analysis ◽  
Dark Field Microscopy

Hyperspectral-enhanced dark field microscopy to correlate Au/CuS NPs’ changes in their physicochemical properties induced by cellular environments with their functionality as photothermal probes by tracking their scattering profile evolution in real time.

scholarly journals Dark-field microscopy enhance visibility of CD31 endothelial staining

2020 ◽  
Vol 64 (3) ◽  
Author(s):  
Eva Jennische ◽  
Stefan Lange ◽  
Ragnar Hultborn
Keyword(s):  
Phase Contrast ◽  
Scattered Light ◽  
Dark Field ◽  
Light Scatter ◽  
Endothelial Lining ◽  
Microscopy Technique ◽  
Dark Field Microscopy ◽  
Dark Field Illumination ◽  
Normal Human ◽  
Intense Light

A simple dark field microscopy technique was used for visualization of blood vessels in normal human renal tissues and carcinoma. Phase contrast condenser ring apt for high power objectives was combined with a 10x objective in order to create a dark field illumination of the specimens examined. The endothelial lining of the vessels had been stained by using CD31 monoclonal antibodies combined with conventional peroxidase immunohistochemistry. The final DAB addition used for this technique induced an intense light scatter in the dark field microscope. This scattered light originating from the endothelial lining made the walls of the bright vessels easily detectable from the dark background.

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