A transmission electron microscopy investigation of SiC films grown on Si(111) substrates by solid-source molecular beam epitaxy
1998 ◽
Vol 13
(12)
◽
pp. 3571-3579
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Keyword(s):
The effects of different growth parameters on the microstructure of the SiC films formed during simultaneous two-source molecular-beam-epitaxial (MBE) deposition have been investigated. Substrate temperatures as low as 750–900 °C have been used. The relationship between a number of different growth morphologies and deposition conditions has been established. The formation of single-crystal 3C films has been found to occur at low growth rates but within a limited Si: C adatom ratio. A combination of transmission electron microscopy (TEM) and atomic force microscopy (AFM) has been used to examine the different films, and the results of these investigations are described.
2013 ◽
Vol 365
◽
pp. 35-43
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1999 ◽
Vol 14
(8)
◽
pp. 3226-3236
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2021 ◽
pp. 1759-1829