Dense and smooth epitaxial BaTiO3 thin films by the dipping-pyrolysis process

1999 ◽  
Vol 14 (2) ◽  
pp. 592-596 ◽  
Author(s):  
S. Kim ◽  
T. Fujimoto ◽  
T. Manabe ◽  
I. Yamaguchi ◽  
T. Kumagai ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Heat Treatment ◽  
Oxygen Partial Pressure ◽  
Smooth Surface ◽  
Precursor Solution ◽  
Final Heat Treatment ◽  
Pyrolysis Process ◽  
Low Oxygen ◽  
Final Heat

Dense and smooth BaTiO3 thin films were prepared on SrTiO3 (100) substrates by the dipping-pyrolysis process using a mixed precursor solution of barium and titanium naphthenates. Combination effects of prefiring [at 150–450 °C in air or low oxygen partial pressure, p(O2)[ and final heat treatment [at 850 °C in air or low p(O2)[ on preparation of BaTiO3 thin films were examined. An epitaxial BaTiO3 thin film with a dense and smooth surface consisting of nanosized grains about 70 nm was prepared by prefiring under low p(O2) at 250 °C and final heat treatment under low p (O2) at 850 °C.

scholarly journals Deep-Ultraviolet Transparent Conductive MWCNT/SiO2 Composite Thin Film Fabricated by UV Irradiation at Ambient Temperature onto Spin-Coated Molecular Precursor Film

Nanomaterials ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 1348
Author(s):  
Hiroki Nagai ◽  
Naoki Ogawa ◽  
Mitsunobu Sato
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Heat Treatment ◽  
Uv Irradiation ◽  
Composite Thin Film ◽  
Precursor Film ◽  
Mixed Solution ◽  
Pencil Hardness ◽  
Strong Base ◽  
Deep Ultraviolet

Deep-ultraviolet (DUV) light-transparent conductive composite thin films, consisting of dispersed multiwalled carbon nanotubes (MWCNTs) and SiO2 matrix composites, were fabricated on a quartz glass substrate. Transparent and well-adhered amorphous thin films, with a thickness of 220 nm, were obtained by weak ultraviolet (UV) irradiation (4 mW cm−2 at 254 nm) for more than 6 h at 20−40 °C onto the precursor films, which were obtained by spin coating with a mixed solution of MWCNT in water and Si(IV) complex in ethanol. The electrical resistivity of MWCNT/SiO2 composite thin film is 0.7 Ω·cm, and transmittance in the wavelength region from DUV to visible light is higher than 80%. The MWCNT/SiO2 composite thin film showed scratch resistance at pencil hardness of 8H. Importantly, the resistivity of the MWCNT/SiO2 composite thin film was maintained at the original level even after heat treatment at 500 °C for 1 h. It was observed that the heat treatment of the composite thin film improved durability against both aqueous solutions involving a strong acid (HCl) and a strong base (NaOH).

Investigation on V2O5 Thin Films Prepared by Spray Pyrolysis Technique

2018 ◽  
Vol 17 (03) ◽  
pp. 1760037 ◽  
Author(s):  
A. Nancy Anna Anasthasiya ◽  
K. Gowtham ◽  
R. Shruthi ◽  
R. Pandeeswari ◽  
B. G. Jeyaprakash
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Spray Pyrolysis ◽  
Glass Substrate ◽  
Spray Pyrolysis Technique ◽  
Precursor Solution ◽  
Xrd Pattern ◽  
Good Crystallinity ◽  
Solution Volume

The spray pyrolysis technique was employed to deposit V2O5 thin films on a glass substrate. By varying the precursor solution volume from 10[Formula: see text]mL to 50[Formula: see text]mL in steps of 10[Formula: see text]mL, films of various thicknesses were prepared. Orthorhombic polycrystalline V2O5 films were inferred from the XRD pattern irrespective of precursor solution volume. The micro-Raman studies suggested that annealed V2O5 thin film has good crystallinity. The effect of precursor solution volume on morphological and optical properties were analysed and reported.

Pulsed Laser Deposited Oxide Green Emitting Thin Film Phosphors : Optimization of Growth Conditions

2006 ◽  
Vol 988 ◽  
Author(s):  
P. Thiyagarajan ◽  
M. Kottaismay ◽  
M S Ramachandra Rao
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Diffuse Reflectance Spectroscopy ◽  
Quartz Substrate ◽  
Pulsed Laser ◽  
Growth Conditions ◽  
Ex Situ ◽  
Morphological Studies

AbstractStructural and photoluminescence (PL) properties of Zn2(1-x)MnxSiO4 (1 ≤ x ≤ 5) and diffuse reflectance spectroscopy (DRS) and morphological studies of ZnGa2O4:Mn thin film green emitting phosphors grown using pulsed laser deposition (PLD) technique have been investigated. Zn2(1-x)MnxSiO4 thin films grown on Si substrate at 700°C in 300 mTorr of oxygen partial pressure, upon ex-situ annealing at higher temperatures exhibit superior PL intensity. ZnGa2O4:Mn phosphor thin films grown on quartz substrate at 650oC and in-situ annealed in 300mTorr of oxygen partial pressure show better emission intensity. For both Zn2SiO4:Mn and ZnGa2O4:Mn phosphors, luminescence can be assigned to 4T1 – 6A1 transition of Mn2+ within the 3d orbital giving rise to emission at 525 and 503 nm, respectively.

Effects of Pre-Crack Depth and Hydrogen Absorption on the Failure Strain of Zircaloy-4 Cladding Tubes Under Biaxial Strain Conditions

2020 ◽  
Author(s):  
Feng Li ◽  
Takeshi Mihara ◽  
Yutaka Udagawa ◽  
Masaki Amaya
Keyword(s):  
Heat Treatment ◽  
Crack Depth ◽  
Strain Ratio ◽  
Final Heat Treatment ◽  
Fuel Cladding ◽  
Hoop Strain ◽  
Final Heat ◽  
Treatment Status ◽  
Biaxial Tensile Stress ◽  
Cold Worked

Abstract Fuel cladding may be subjected to biaxial tensile stress in axial and hoop directions during pellet-cladding mechanical interaction (PCMI) of a reactivity-initiated accident (RIA). Incipient crack in the hydride rim assisted by the scattered hydrides in the metal phase may lead to failure of the cladding at small hoop strain level during PCMI. To get insight of such phenomenon, biaxial-EDC tests under axial to hoop strain ratios ranging from 0 to 1 were performed with pre-cracked (outer surface) and uniformly hydrided Zircaloy-4 cladding tube samples with final heat-treatment status of cold worked (CW), stress relieved (SR) and Recrystallized (RX). Results showed dependencies of failure hoop strain on pre-crack depth, strain ratio, hydrogen content and final heat-treatment status on fabrication, but no apparent dependencies were observed on the distribution pattern of hydrides (with similar hydrogen contents and hydrides predominantly precipitated in hoop direction) and the heat-treatment process for hydrogen charging. J integral at failure seems to be available to unify the effect of pre-crack depth.

In Situ Deposition of YBCO Thin Films by Sputtering under Low Oxygen Partial Pressure

1994 ◽  
Vol 33 (Part 2, No. 5B) ◽  
pp. L718-L721 ◽  
Author(s):  
Yong Ki Park ◽  
Keunseop Park ◽  
Soon-Gul Lee ◽  
Dong Chan Shin ◽  
Jong-Chul Park
Keyword(s):  
Thin Films ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Low Oxygen ◽  
Ybco Thin Films ◽  
In Situ Deposition

Microstructure and Mechanism of Three Spheroidizing Treatment for the Carbide of GCr15 Steel

2012 ◽  
Vol 476-478 ◽  
pp. 351-356 ◽  
Author(s):  
Chong Cai Zhang ◽  
Xiao Lan Yi ◽  
Qun Qun Yuan ◽  
Long Wang
Keyword(s):  
Heat Treatment ◽  
Final Heat Treatment ◽  
Tempered Martensite ◽  
Final Heat ◽  
Gcr15 Steel ◽  
Heat Treated ◽  
Spheroidizing Annealing

Three groups of GCr15 steel were heat-treated respectively by conventional spheroidizing annealing, circulation spheroidizing annealing, 1050°C for 30min oil cooling quenching + 700°C tempering. The final heat treatment of these GCr15 steel was 840°C oil cooling quenching + 150°C tempering. The microstructure of the heat-treated GCr15 were observed and the mechanism of three spheroidizing treatment were discussed in this paper. The results showed that: There is obvious difference among the three groups carbide of GCr15 for the mechanism of three spheroidizing treatments is different. The GCr15 has 1050°C for 30min oil cooling quenching + 700°C tempering showed the best result of carbide spheroidizing. The microstructure of GCr15 after 840°C oil cooling quenching + 150 °C tempering was tempered martensite and carbide which is fine, round and widely distributed.

Nanostructured YSZ Thin Film for Application as Electrolyte in an Electrode Supported SOFC

2012 ◽  
Vol 727-728 ◽  
pp. 873-878
Author(s):  
Cibele Melo Halmenschlager ◽  
Matias de Angelis Korb ◽  
Roberto Neagu ◽  
Carlos Pérez Bergmann ◽  
Célia de Fraga Malfatti
Keyword(s):  
Thin Film ◽  
Heat Treatment ◽  
Treatment Process ◽  
Precursor Solution ◽  
X Ray Diffraction ◽  
X Ray ◽  
Solvent Influence ◽  
Different Temperatures ◽  
Spray Pyrolysis Process ◽  
Fast Increase

The development of solid oxide fuel cell with thin film concepts for an electrode supported design based on the yttria-stabilized zirconia has demonstrated favourable results due to its high chemistry stability in oxidization and environment reduction. The spray pyrolysis process was investigated in order to obtain dense thin films of YSZ on different substrates. The precursor solution was obtained by zirconium and yttrium salt dissolutions in a mixture of water and glycerine in several ratios to study the solvent influence. The substrate was initially heated at 600 °C and during the deposition it ranged from 260-350°C, finishing at a fast increase in temperature of 600°C. The heat treatment was carried out in four different temperatures: 700 °C, 750 °C, 800 °C, and 900 °. The precursors were characterized by thermal analysis. The microstructures of the films were studied using scanning electron microscopy and X-ray diffraction. The results obtained showed that the films obtained were crystalline before the heat treatment process and have shown ionic conductivity above 800°C.

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