Polypyrrole Nanowire Array with High Aspect Ratio Fabricated by Block-Copolymer-Templated Electropolymerization

ABSTRACTConducting polypyrrole (PPy) nanowire array was electrochemically fabricated by using microphase-separated block copolymer (PEOm-b-PMA(Az)n) thin film as an electrode template. Electropolymerization proceeds selectively through the perpendiculary oriented PEO nanocylindrical microdomains on an ITO electrode coated by the above polymer film. The length of the PPy nanowires was controllable in range of 10-120 nm by the thickness of the coated template film and the amount of passed charge. A 10 nm of diameter, 27 nm of periodicity, and 12 of aspect ratio of the crystalline PPy nanowires were successfully achieved. Selective removal of the template is also achieved simply by rinsing with solubility-controlled mixed solvent.

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High aspect ratio cylindrical microdomains oriented vertically on the substrate using block copolymer micelles and temperature-programmed solvent vapor annealing

Soft Matter ◽

10.1039/c3sm27734h ◽

2013 ◽

Vol 9 (23) ◽

pp. 5550 ◽

Cited By ~ 15

Author(s):

Sungnam Kim ◽

Gumhye Jeon ◽

Sung Woo Heo ◽

Hye Jeong Kim ◽

Seung Bin Kim ◽

...

Keyword(s):

Block Copolymer ◽

Aspect Ratio ◽

High Aspect Ratio ◽

Solvent Vapor ◽

Vapor Annealing ◽

Block Copolymer Micelles ◽

Solvent Vapor Annealing ◽

Copolymer Micelles ◽

Temperature Programmed

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Role of high aspect-ratio thin-film metal deposition in Cu back-end-of-line technology

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0000170 ◽

2020 ◽

Vol 38 (5) ◽

pp. 053402

Author(s):

Andrew Simon ◽

Oscar van der Straten ◽

Nicholas A. Lanzillo ◽

Chih-Chao Yang ◽

Takeshi Nogami ◽

...

Keyword(s):

Thin Film ◽

Aspect Ratio ◽

High Aspect Ratio ◽

Metal Deposition ◽

Line Technology

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Porous Ultra-Thin Films from Photocleavable Block Copolymers: In-Situ Degradation Kinetics Study of Pore Material

Polymers ◽

10.3390/polym12040781 ◽

2020 ◽

Vol 12 (4) ◽

pp. 781 ◽

Cited By ~ 1

Author(s):

Sedakat Altinpinar ◽

Wael Ali ◽

Patrick Schuchardt ◽

Pinar Yildiz ◽

Hui Zhao ◽

...

Keyword(s):

Thin Film ◽

Thin Films ◽

Block Copolymer ◽

Block Copolymers ◽

Polymer Film ◽

Uv Exposure ◽

Significant Information ◽

X Ray ◽

Washing Process

On the basis of the major application for block copolymers to use them as separation membranes, lithographic mask, and as templates, the preparation of highly oriented nanoporous thin films requires the selective removal of the minor phase from the pores. In the scope of this study, thin film of polystyrene-block-poly(ethylene oxide) block copolymer with a photocleavable junction groups based on ortho-nitrobenzylester (ONB) (PS-hν-PEO) was papered via the spin coating technique followed by solvent annealing to obtain highly-ordered cylindrical domains. The polymer blocks are cleaved by means of a mild UV exposure and then the pore material is washed out of the polymer film by ultra-pure water resulting in arrays of nanoporous thin films to remove one block. The removal of the PEO materials from the pores was proven using the grazing-incidence small-angle X-ray scattering (GISAXS) technique. The treatment of the polymer film during the washing process was observed in real time after two different UV exposure time (1 and 4 h) in order to draw conclusions regarding the dynamics of the removal process. In-situ X-ray reflectivity measurements provide statistically significant information about the change in the layer thickness as well as the roughness and electron density of the polymer film during pore formation. 4 H UV exposure was found to be more efficient for PEO cleavage. By in-situ SFM measurements, the structure of the ultra-thin block copolymer films was also analysed and, thus, the kinetics of the washing process was elaborated. The results from both measurements confirmed that the washing procedure induces irreversible change in morphology to the surface of the thin film.

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