The Structural, Optical and Electrical Properties of Spray Deposited Fluorine Doped ZnO Thin Films

2013 ◽  
Vol 1494 ◽  
pp. 139-144 ◽  
Author(s):  
Kondaiah Paruchuri ◽  
Vanjari Sundara Raja ◽  
Suda Uthanna ◽  
N. Ravi Chandra Raju
Keyword(s):  
Thin Films ◽  
Dopant Concentration ◽  
Hydrogen Atmosphere ◽  
Charge Carriers ◽  
Zno Films ◽  
Spray Pyrolysis Method ◽  
Fluorine Concentration ◽  
X Ray Diffraction ◽  
Glass Substrates ◽  
Starting Solution

ABSTRACTHighly transparent and conducting Fluorine doped zinc oxide thin films were deposited using spray pyrolysis method on glass substrates held at 450 °C. The X-ray diffraction study revealed that as the dopant concentration increases in ZnO films, the intensity of the preferential orientation of (002) reflection decreased and (101) was found to increase up to 5 at. % F. The crystallite size was varied from 40 to 50 nm with dopant concentration. The optical band gap of the un-doped films was 3.30 eV and it increased to 3.34 eV for 3 at. % F. The refractive index of the films was increased from 2.05 to 2.18 with the increase of dopant concentration from 0 to 5 at. %. The scanning electron microscopy results depicted that the microstructure of ZnO: F films highly influenced by the fluorine doping. After annealing the films in hydrogen atmosphere, the resistivity of the films decreased as increase the dopant concentration and it is 4×10−3 Ω cm for 3at. % F beyond which it increased. The mobility of the charge carriers was 14 cm2/ V sec and the carrier concentration was 7.8×1019 cm3 obtained for the films doped with 3 at. % of fluorine concentration in the starting solution.

scholarly journals Effect of substrate temperature on structural and optical properties of spray deposited ZnO thin films

2015 ◽  
Vol 33 (3) ◽  
pp. 491-496 ◽  
Author(s):  
Y. Larbah ◽  
M. Adnane ◽  
T. Sahraoui
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Energy Gap ◽  
Zno Thin Films ◽  
Effect Of Temperature ◽  
Zno Films ◽  
Spray Pyrolysis Method ◽  
X Ray Diffraction ◽  
Glass Substrates ◽  
Substrate Temperatures

Abstract Undoped ZnO thin films have been prepared on glass substrates at different substrate temperatures by spray pyrolysis method. The effect of temperature on the structural, morphological and optical properties of n-type ZnO films was studied. The X-ray diffraction (XRD) results confirmed that the ZnO thin films were polycrystalline with wurtzite structure. Scanning electron microscopy (SEM) measurements showed that the surface morphology of the films changed with temperature. The studies demonstrated that the ZnO film had a transmission of about 85 % and energy gap of 3.28 eV at 450 °C. The RBS measurements revealed that ZnO layers with a thickness up to 200 nm had a good stoichiometry.

Effect of Solution Concentration in the Optical and Structural Properties of ZnO Thin Films

2018 ◽  
Vol 18 ◽  
pp. 113-117 ◽  
Author(s):  
Abdelkader Hafdallah ◽  
Aimane Guedri ◽  
Mohamed Salah Aida ◽  
Nadhir Attaf
Keyword(s):  
Thin Films ◽  
Solution Concentration ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Glass Substrates ◽  
Optical Band Gaps ◽  
Optical Films ◽  
Spray Technique ◽  
Uv Visible

In the present work we prepared conducting and transparent thin films ZnO with different solution concentrations by pyrolysis spray technique on glass substrates. These films are obtained starting from solution of zinc acetate dehydrate [Zn(CH3COO)2.2H2O] dissolved in methanol, at substrate temperature fixed T =350°C with a concentration of solution vary from 0.05-0.2 M. Our interest is on the investigation of solution concentration on the structural and optical properties of these films. The X-ray diffraction (XRD) results showed that the synthesized ZnO films are polycrystalline with preferred orientation along the (002) plane. The optical films characterization was carried out by the UV-Visible transmission. The optical gap and films disorder were deduced from the absorption spectra, The values of optical band gaps vary between 3.24 and 3.43 eV.

scholarly journals Synthesis and Characterization of Molybdenum Doped ZnO Thin Films by SILAR Deposition Method

2016 ◽  
Vol 4 (1) ◽  
Author(s):  
R. Radha ◽  
A. Sakthivelu ◽  
D. Pradhabhan
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Dopant Concentration ◽  
Blue Shift ◽  
Zno Thin Films ◽  
Zno Films ◽  
Deposition Method ◽  
X Ray Diffraction ◽  
Mo Doping ◽  
Doped Zno

<em>Molybdenum (Mo) doped zinc oxide (ZnO) thin films were deposited on the glass substrate by Successive Ionic Layer Adsorption and Reaction (SILAR) deposition method. The effect of Mo dopant concentration of 5, 6.6 and 10 mol% on the structural, morphological, optical and electrical properties of n-type Mo doped ZnO films was studied. The X-ray diffraction (XRD) results confirmed that the Mo doped ZnO thin films were polycrystalline with wurtzite structure. The field emission scanning electron microscopy (FESEM) studies shows that the surface morphology of the films changes with Mo doping. A blue shift of the optical band gap was observed in the optical studies. Effect of Mo dopant concentration on electrical conductivity was studied and it shows comparatively high electrical conductivity at 10 mol% of Mo doping concentration. </em>

scholarly journals A Copper Oxide (CuO) Thin Films Deposited by Spray Pyrolysis Method

2019 ◽  
Vol 253 ◽  
pp. 03002 ◽  
Author(s):  
Youcef Bellal ◽  
Antar Bouhank ◽  
Hacene Serrar ◽  
Tunç Tüken ◽  
Gökmen Sığırcık
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Spray Pyrolysis ◽  
Visible Region ◽  
Spray Pyrolysis Method ◽  
X Ray Diffraction ◽  
Monoclinic Crystal ◽  
Equal Concentration ◽  
X Ray ◽  
Glass Substrates

A simple and low-cost procedure (spray pyrolysis) was used to elaborate a copper oxide thin films on ordinary glass substrates. A copper nitrate was used and dissolved in two different solutions (Water, Methanol) S1 and S2 respectively in order to obtain an equal concentration; CS1,S2=0.5M. The spray pyrolysis deposition made at fixed temperature T=500°C and different volumes of S1 or S2 on the glass substrates. The X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-vis spectrophotometry were used to determinate the structural, morphological and optical properties of CuO thin films. The X-ray diffraction patterns confirm the presence of the polycrystalline phase of CuO as monoclinic crystal structure with preferential orientation along (110), (002), (111), (200) and (020). Their optical band gaps ranged from 3.95 to 4.02eV for thin films made with S1, and from 1.6 to 1.95eV for thin films made with S2 with a high absorbency in the visible region, which is in agreement with the values of the literature.

Influence of Sputtering Power on the Structure and Photoelectric Property of Ga Doped ZnO Films

2012 ◽  
Vol 591-593 ◽  
pp. 922-926
Author(s):  
Lei Wu ◽  
Qing Nan Zhao ◽  
Gang Wu ◽  
Deng Kui Miao
Keyword(s):  
Thin Films ◽  
Visible Light ◽  
Light Transmittance ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Glass Substrates ◽  
Sputtering Power ◽  
Hall Effect Measurements ◽  
Doped Zno

Ga-doped ZnO (GZO) films were prepared on glass substrates at 523K temperature by non-reactive DC magnetron sputtering. The effects of sputtering power on microstructure and properties of the GZO films were investigated by X-ray diffraction (XRD), field-emission scanning electron microscope (FESEM), Hall effect measurements and UV-Vis-NIR spectrometer. The results show that GZO thin films exhibit high c-axis-orientation, and the intensity of peak increase as the enhanced of sputtering power; the increase of power will reduce the film’s visible-light transmittance, but for all of the GZO thin films the average transmittance of the visible-light is above 80%. The sheet resistance of GZO films decreases when the sputtering power gradually heightened from 80W to 200W. The lowest resistivity of 6.559×10-4Ω•cm can be obtained in the condition of the sputtering power is 100W, and the lowest square resistance is 7.9Ω/□.

scholarly journals STRUCTURAL AND OPTICAL PROPERTIES OF ZnO:Ga THIN FILMS DEPOSITED ON ITO/GLASS SUBSTRATES FOR OPTOELECTRONIC APPLICATIONS

2021 ◽  
Vol 20 (1) ◽  
pp. 84-93
Author(s):  
Dumitru Rusnac ◽  
◽  
Ion Lungu ◽  
Lidia Ghimpu ◽  
Gleb Colibaba ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Films ◽  
Annealing Atmosphere ◽  
X Ray Diffraction ◽  
Homogeneous Surface ◽  
X Ray ◽  
Glass Substrates ◽  
Nanostructured Thin Films ◽  
Ito Glass ◽  
Doped Zno

Doped (with GaCl 3 ), undoped ZnO and ITO/ZnO:Ga nanostructured thin films are synthesized using the spray pyrolysis method. The doped ZnO thin films are synthesized at the atomic ratio of Ga/Zn added in the starting solution fixed at 1, 2, 3, and 5. Gallium-doped ZnO films synthesized on glass/ITO substrates are annealed at 450C in different environments: vacuum, oxygen, and hydrogen. X-ray diffraction (XRD), Energy-dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), and current–voltage (I–V) measurements are applied to characterize the structural properties, composition, surface morphology, and electrical properties of ZnO:Ga nanostructured thin films. X-ray diffraction analysis shows that ZnO:Ga films deposited on glass substrates have a dense and homogeneous surface with a hexagonal structure. The ZnO:Ga films deposited on glass/ITO substrates are composed of two phases, namely, hexagonal ZnO and cubic ITO. The I–V characteristics show the presence of good ohmic contacts between Al and In metals and ZnO:Ga thin films regardless of the nature of the substrate and the annealing atmosphere.

scholarly journals Preparation and Characterization of Indium and Gallium doped Transparent ZnO Films for Solar Cell Applications

2018 ◽  
Vol 34 (5) ◽  
pp. 2325-2331
Author(s):  
Reuben Seth Richter ◽  
A. Yaya ◽  
D. Dodoo-Arhin ◽  
B. Agyei-Tuffour ◽  
Robinson Juma Musembi ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Zno Films ◽  
Optical And Electrical Properties ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Spray Pyrolysis Deposition ◽  
Hall Effect Measurements

In this work, the effect of indium (In) and gallium (Ga) dopants on the structural, optical and electrical properties of ZnO thin films was studied. ZnO thin films were deposited on glass substrates at 400°C using the spray pyrolysis deposition technique. X-ray diffraction (XRD) results indicated that both undoped and doped ZnO films had (002) preferred orientation. The undoped ZnO films were found to exhibit high transmittance above 80%, while indium-doped (In:ZnO) and gallium-doped (Ga:ZnO) films had transmittance above 60% and 70% respectively. From the Hall Effect measurements, doping improved the conductivity of the ZnO thin films however, In:ZnO films showed higher electrical conductivity compared to Ga:ZnO films. Electron probe microanalysis (EPMA) results were used to confirm the presence of the respective dopants in the thin film samples.

Chemical synthesis and study of structural and optoelectronic properties of CdS thin films: Effect of SILAR growth cycles

2015 ◽  
Vol 9 (3) ◽  
pp. 2461-2469
Author(s):  
S. R. Gosavi ◽  
K. B. Chaudhari
Keyword(s):  
Thin Films ◽  
Average Crystallite Size ◽  
X Ray Diffraction ◽  
Silar Method ◽  
Growth Cycles ◽  
Glass Substrates ◽  
Layer Adsorption ◽  
Cds Thin Films ◽  
Structural And Optoelectronic Properties ◽  
Deposited Film

CdS thin films were deposited on glass substrates by using successive ionic layer adsorption and reaction (SILAR) method at room temperature. The effect of SILAR growth cycles on structural, morphological, optical and electrical properties of the films has been studied.  The thickness of the deposited film is measured by employing weight difference method. The X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM) studies showed that all the films exhibit polycrystalline nature and are covered well with glass substrates. The values of average crystallite size were found to be 53 nm, 58 nm, 63 nm and 71 nm corresponding to the thin films deposited with 30, 40, 50 and 60 SILAR growth cycles respectively. From the UV–VIS spectra of the deposited thin films, it was seen that both the absorption properties and energy bandgap of the films changes with increasing number of SILAR growth cycles. A decrease of electrical resistivity has been observed with increasing SILAR growth cycle. 

X- ray diffraction and dielectric properties of PbSe thin films

2019 ◽  
Vol 15 (34) ◽  
pp. 1-14
Author(s):  
Bushra A. Hasan
Keyword(s):  
Thin Films ◽  
Thermal Activation ◽  
Thermal Evaporation ◽  
Thermal Activation Energy ◽  
Dielectric Constants ◽  
Conductivity Measurements ◽  
X Ray Diffraction ◽  
Thermal Evaporation Method ◽  
X Ray ◽  
Glass Substrates

Lead selenide PbSe thin films of different thicknesses (300, 500, and 700 nm) were deposited under vacuum using thermal evaporation method on glass substrates. X-ray diffraction measurements showed that increasing of thickness lead to well crystallize the prepared samples, such that the crystallite size increases while the dislocation density decreases with thickness increasing. A.C conductivity, dielectric constants, and loss tangent are studied as function to thickness, frequency (10kHz-10MHz) and temperatures (293K-493K). The conductivity measurements confirm confirmed that hopping is the mechanism responsible for the conduction process. Increasing of thickness decreases the thermal activation energy estimated from Arhinus equation is found to decrease with thickness increasing. The increase of thickness lead to reduce the polarizability α while the increasing of temperature lead to increase α.

Sol-gel growth of Ni doped CdS on glass substrates: effect of spin coating speed and dopant concentration

2020 ◽  
Vol 10 ◽  
Author(s):  
Atefeh Nazari Setayesh ◽  
Hassan Sedghi
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Spin Coating ◽  
Optical Band Gap ◽  
Dopant Concentration ◽  
Rotation Speed ◽  
Sol Gel ◽  
Band Gap Energy ◽  
Gap Energy ◽  
Glass Substrates

Background: In this work, CdS thin films were synthesized by sol-gel method (spin coating technique) on glass substrates to investigate the optical behavior of the film. Methods: Different substrate spin coating speeds of 2400, 3000, 3600 rpm and different Ni dopant concentrations of 0 wt.%, 2.5 wt.%, 5 wt.%) were investigated. The optical properties of thin films such as refraction index, extinction coefficient, dielectric constant and optical band gap energy of the layers were discussed using spectroscopic ellipsometry method in the wavelength range of 300 to 900 nm. Results: It can be deduced that substrate rotation speed and dopant concentration has influenced the optical properties of thin films. By decreasing rotation speed of the substrate which results in films with more thicknesses, more optical interferences were appeared in the results. Conclusion: The samples doped with Ni comparing to pure ones have had more optical band gap energy.

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