Mechanical Properties of Carbon Films for Thin Film Disks

1990 ◽  
Vol 188 ◽  
Author(s):  
Richard L. White ◽  
Mary F. Doerner ◽  
George W. Walker
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Argon Plasma ◽  
Carbon Films ◽  
Film Stress ◽  
Film Hardness ◽  
Residual Film ◽  
Frictional Performance ◽  
Curvature Measurements ◽  
Relationship Of

ABSTRACTCarbon overcoat films are used extensively in thin film disk applications to provide wear resistance. A nano-indentation technique and wafer curvature measurements have been used to study the mechanical properties of carbon films sputtered under various processing conditions. Specifically, the effects of substrate/target spacing, power, pressure, and substrate bias have been studied for films sputtered in an argon plasma. The relationship of these properties to contact start-stop performance of hydrocarbon lubricated disks is further described. The frictional performance during the test can be related to film hardness, while the durability can be affected by the residual film stress.

Stresses in a Multilayer Thin Film/Substrate System Subjected to Nonuniform Temperature

2008 ◽  
Vol 75 (2) ◽  
Author(s):  
X. Feng ◽  
Y. Huang ◽  
A. J. Rosakis
Keyword(s):  
Thin Film ◽  
Field Measurements ◽  
Film Stress ◽  
Effect Of Temperature ◽  
Multilayer Thin Film ◽  
Nonuniform Temperature ◽  
Curvature Invariant ◽  
Full Field ◽  
Curvature Measurements ◽  
Film Substrate

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to uniform film stress and system curvature states over the entire system of a single thin film on a substrate. By considering a circular multilayer thin film/substrate system subjected to nonuniform temperature distributions, we derive relations between the stresses in each film and temperature, and between the system curvatures and temperature. These relations featured a “local” part that involves a direct dependence of the stress or curvature components on the temperature at the same point, and a “nonlocal” part, which reflects the effect of temperature of other points on the location of scrutiny. We also derive relations between the film stresses in each film and the system curvatures, which allow for the experimental inference of such stresses from full-field curvature measurements in the presence of arbitrary nonuniformities. These relations also feature a “nonlocal” dependence on curvatures making full-field measurements of curvature a necessity for the correct inference of stress. The interfacial shear tractions between the films and between the film and substrate are proportional to the gradient of the first curvature invariant, and can also be inferred experimentally.

Extension of Stoney’s Formula to Arbitrary Temperature Distributions in Thin Film/Substrate Systems

2006 ◽  
Vol 74 (6) ◽  
pp. 1225-1233 ◽  
Author(s):  
Y. Huang ◽  
A. J. Rosakis
Keyword(s):  
Thin Film ◽  
Field Measurements ◽  
Film Stress ◽  
Effect Of Temperature ◽  
Curvature Invariant ◽  
Full Field ◽  
Polar Components ◽  
Temperature Distributions ◽  
Curvature Measurements ◽  
Film Substrate

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to stress and curvature states that are assumed to remain uniform over the entire film/substrate system. By considering a circular thin film/substrate system subject to nonuniform and nonaxisymmetric temperature distributions, we derive relations between the film stresses and temperature, and between the plate system’s curvatures and the temperature. These relations featured a “local” part that involves a direct dependence of the stress or curvature components on the temperature at the same point, and a “nonlocal” part that reflects the effect of temperature of other points on the location of scrutiny. Most notably, we also derive relations between the polar components of the film stress and those of system curvatures which allow for the experimental inference of such stresses from full-field curvature measurements in the presence of arbitrary nonuniformities. These relations also feature a “nonlocal” dependence on curvatures making full-field measurements of curvature a necessity for the correct inference of stress. Finally, it is shown that the interfacial shear tractions between the film and the substrate are related to the gradients of the first curvature invariant and can also be inferred experimentally.

Mechanical and Tribological Properties of a-GeCx Films Deposited by DC-Magnetron Sputtering

1997 ◽  
Vol 505 ◽  
Author(s):  
L. G. Jacobsohn ◽  
D. C. Reigada ◽  
F. L. Freire ◽  
R. Prioli ◽  
S. I. Zanette ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Internal Stress ◽  
Rutherford Backscattering Spectrometry ◽  
Argon Plasma ◽  
Carbon Films ◽  
Elastic Recoil ◽  
Dc Magnetron Sputtering ◽  
Elastic Recoil Detection ◽  
Mechanical And Tribological Properties ◽  
Film Hardness

ABSTRACTAmorphous carbon-germanium films were grown by dc-magnetron sputtering at different argon plasma pressures ranging from 0.17 and 1.4 Pa. The water-cooled sample holder was grounded. The film thickness were typically 0.5 μm. The ratio between germanium and carbon atomic concentration ranges up to 2.8, as measured by Rutherford backscattering spectrometry (RBS). Elastic recoil detection technique was used to measure hydrogen contamination. The film hardness was measured by nanoindentation techniques and the internal stress was determined by the bending of the substrate. The incorporation of Ge reduces both the film hardness and the internal stress. Hardness and internal stress increases when the films are deposited in lower pressures. Atomic Force Microscopy (AFM) was used to measure the surface roughness, which was found to be insensitive to the pressure and to the Ge content. A possible influence of the thickness on the morphology of pure carbon films is discussed. The friction coefficient measured by AFM is independent on the film composition within experimental errors.

scholarly journals Deviation in Nano-Mechanical Properties of Ceramic Nano Composite Thin Films

2017 ◽  
Vol 14 (1) ◽  
pp. 01-04
Author(s):  
A. S. Bhattacharyya ◽  
R. P. Kumar
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Strain Hardening ◽  
Hard Coatings ◽  
Film Stress ◽  
Nano Composite ◽  
Thin Film Stress ◽  
Morphological Patterns

Ceramic hard Coatings based on Si, C , N, Ti and B were developed using magnetron sputtering, applicable for protecting the underlying substrate. Different morphological patterns were observed on the coating surface due to sputtering. Nanoindentation was used to determine the hardness and modulus of the coatings. The deviations in H and E values were attributed to indentation positions, thin film stress and anisotropy. Evidence of strain hardening was found during loading.

Mechanical Properties of Pure Carbon and Carbonnitrogen Coatings on Thin Film Head Sliders

1996 ◽  
Vol 436 ◽  
Author(s):  
G. Wang ◽  
A. Strojny ◽  
J. M. Sivertsen ◽  
J. H. Judy ◽  
W. W. Gerberich
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Elastic Modulus ◽  
Carbon Films ◽  
Wear Protection ◽  
Pure Carbon ◽  
Wear Damage ◽  
Afm Micrographs ◽  
Better Than ◽  
Made In

AbstractThe mechanical properties of pure carbon (C) and carbon-nitrogen (C:N) coatings on thin film head sliders were investigated by continuous drag testing (CDT) and nano-indentation. Comparisons were made in terms of wear protection, elastic modulus and hardness of these two types of carbon films. The C and C:N thin films with various thickness were deposited on thin film head sliders using a facing target sputtering (FTS) system. After 23,000 revolutions of CDT tests, all the testing head sliders which were uncoated and coated with 90 Å C or C:N exhibited some degree of wear damage as indicated in AFM micrographs where that of the uncoated head was the most severe and that of the C:N coated head was the least. Head sliders coated with 1000Å C and C:N were studied under the TriboscopeTM nano-indenter, where load-displacement curves at different maximum loads were recorded. Elastic modulus and hardness were determined from those curves. The results show that elastic modulus and hardness of C:N are greater than that of C. Therefore, one may conclude that both C and C:N behave like a protective coating for the head slider where C:N is better than C, which could be well related to the larger elastic modulus and hardness of C:N.

On the Stoney Formula for a Thin Film/Substrate System With Nonuniform Substrate Thickness

2007 ◽  
Vol 74 (6) ◽  
pp. 1276-1281 ◽  
Author(s):  
X. Feng ◽  
Y. Huang ◽  
A. J. Rosakis
Keyword(s):  
Thin Film ◽  
Misfit Strain ◽  
Film Stress ◽  
Substrate Thickness ◽  
Full Field ◽  
Temperature Changes ◽  
Thin Film Stress ◽  
Curvature Measurements ◽  
Film Substrate ◽  
Stoney Formula

Current methodologies used for the inference of thin film stress through system curvature measurements are strictly restricted to stress and curvature states which are assumed to remain uniform over the entire film/substrate system. Recently Huang, Rosakis, and co-workers [Acta Mech. Sinica, 21, pp. 362–370 (2005); J. Mech. Phys. Solids, 53, 2483–2500 (2005); Thin Solid Films, 515, pp. 2220–2229 (2006); J. Appl. Mech., in press; J. Mech. Mater. Struct., in press] established methods for the film/substrate system subject to nonuniform misfit strain and temperature changes. The film stresses were found to depend nonlocally on system curvatures (i.e., depend on the full-field curvatures). These methods, however, all assume uniform substrate thickness, which is sometimes violated in the thin film/substrate system. Using the perturbation analysis, we extend the methods to nonuniform substrate thickness for the thin film/substrate system subject to nonuniform misfit strain.

Growth, Structure, and Thin Film Stress in TiAl AND Ti3Al FILMS

1993 ◽  
Vol 317 ◽  
Author(s):  
M. Chinmulgund ◽  
R. B. Inturi ◽  
J. A. Barnard
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Hexagonal Structure ◽  
Film Stress ◽  
Dc Magnetron Sputtering ◽  
Bulk Materials ◽  
Growth Structure ◽  
Thin Film Stress

ABSTRACTThin films of Ti, Al, TiAl and Ti3Al were deposited by dc magnetron sputtering onto 2” dia. oxidized Si<111> wafers and their mechanical properties were studied by measuring the internal stress in the films. Ti and Ti3Al films show hexagonal structure with preferred orientation in the (0002) direction. TiAl is tetragonal, nanocrystalline, and (111) oriented; Al is random fee polycrystalline in nature. Young's Modulii of thin films of these materials were calculated from the stress temperature plots. The E values of TiAI and Ti3Al thin films were found to be significantly higher than those of the bulk Materials.

Microstructure – Mechanical Properties Relationship of Laser Interference Irradiated Ni/Al Multi-Film

2003 ◽  
Vol 795 ◽  
Author(s):  
C. Daniel ◽  
A. Lasagni ◽  
F. Mücklich
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Intermetallic Compounds ◽  
Physical Vapor Deposition ◽  
Thermal Simulation ◽  
Laser Interference ◽  
Structural Investigations ◽  
Relationship Of ◽  
Layered Thin Film ◽  
Made In

ABSTRACTDue to the corresponding intermetallic compounds, Ni/Al multi-layered thin film systems are important to protect against the mechanical and chemical impacts on the bulk component. The mechanical properties of these intermetallic compounds, NiAl, can be further improved by combining with other stiff phases. The mechanical properties would be optimized if the lateral surface composite can be made in such a way that the different phases are arranged periodically with a preferred orientation, micro-scaled period and reticulated phase interfaces. Such optimized surface composites have been achieved by laser interference irradiation in a nano-grained structure.In this study, the thin film systems are produced by physical vapor deposition and subsequently irradiated by the interference pattern of two or more coherent laser beams. The corresponding periodical heat treatment has been analyzed by thermal simulation, and thermal simulation results are compared with the experimental results. Further, the phase transitions during laser interference irradiation are calculated. The structural investigations of irradiated films - grain sizes and deformation by TEM, stress and texture by XRD - are compared with the mechanical properties - hardness and Young's modulus by NI-AFM.

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