The Effect of Yttrium Ion Implantation on the High Temperature Oxidation Properties of NiAl
ABSTRACTNiAl was ion implanted with yttrium (2×1016 cm−2) in order to study its effect on the very high temperature (1000–1500°C) oxidation properties. At 1000°C, implanted Y stabilizes the faster growing θ-Al2O3 phase, thus slightly increasing the oxidation rate. At 1200°C, where predominantly α-Al2 O3 is formed with and without Y, there is a factor of 4 reduction in the oxidation rate. However at higher than 1200°C, there is little effect by Y on the oxidation rate. Cyclic testing showed that the Y implant had an imperfect and short-lived improvement on adherence relative to other Y-containing alloys. Variations in aluminum content from 23.5 to 36.0wt%(40–55at%) had little effect on the oxidation properties. Initial experiments at 1500°C with a novel Rh marker indicate that alumina grows at least partially by outward cation diffusion both with and without Y.