Relationships Between Photoluminescence Spectra and Porosity of Porous Silicon

1994 ◽  
Vol 332 ◽  
Author(s):  
H.Z. Song ◽  
L.Z. Zhang ◽  
B.R. Zhang ◽  
G.G. Qin
Keyword(s):  
Porous Silicon ◽  
Quantum Confinement ◽  
Light Emission ◽  
Photoluminescence Spectra ◽  
Lower Side ◽  
Si Substrates ◽  
Peak Energy ◽  
P Type ◽  
Confinement Model

ABSTRACTIt was found that porous silicon (PS) layers formed on 0.01 Ωcm (111) and 0.02 Ωcm (100) Si substrates show high photoluminescence (PL) peak energies on both lower and higher porosity sides and a minimum of PL peak energy at the moderate porosity, while those formed on 0.8 and 10Ωcm (111) p-type Si substrates show an increase of PL peak energy with porosity on the lower side and a saturation of PL peak energy with porosity on the higher side. These experimental facts are not consistent with the quantum confinement model for light emission of PS, which predicts a monotonous increase of PL peak energy with PS porosity.

Photoluminescence in Porous Silicon: Evidence for the Quantum Confinement Model

1991 ◽  
Vol 256 ◽  
Author(s):  
David L. Naylor ◽  
Sung B. Lee ◽  
John C. Pincenti ◽  
Brett E. Bouma
Keyword(s):  
Porous Silicon ◽  
Hydrofluoric Acid ◽  
Quantum Wire ◽  
Quantum Confinement ◽  
Electrochemical Etching ◽  
Photoluminescence Spectra ◽  
Peak Wavelength ◽  
Effects Of Temperature ◽  
Good Agreement ◽  
Confinement Model

ABSTRACTPhotoluminescence spectra have been measured in porous silicon following electrochemical etching in dilute hydrofluoric acid (HF). The effects of HF concentration during etching on the efficiency and peak wavelength of photoluminescence have been investigated. The effects of temperature between 25°C and 200°C on PL spectra have been recorded. Photoluminescence lifetimes as a function of wavelength have been studied following ultrashort UV photoexcitation. A number of lifetime components in the decay are observed the longest in good agreement over the wavelength range of 500 to 600 nm with a silicon quantum wire model. At longer wavelengths a departure from lifetimes of the wire model is observed and two hypotheses for the discrepancy are presented.

Effect of Preparation Conditions on the Silicon L-Edge In Electrochemically Prepared Porous Silicon

1993 ◽  
Vol 298 ◽  
Author(s):  
T. Van Buuren ◽  
T. Tiedje ◽  
W. Weydanz
Keyword(s):  
Electronic Structure ◽  
High Resolution ◽  
Porous Silicon ◽  
Quantum Confinement ◽  
Light Exposure ◽  
Blue Shift ◽  
Bulk Silicon ◽  
Preparation Conditions ◽  
P Type ◽  
Confinement Model

AbstractHigh resolution measurements of the silicon L-edge absorption in electrochemically prepared porous silicon show that the absorption threshold is shifted to higher energy relative to bulk silicon, and that the shift is dependent on how the porous silicon is prepared. When the porous silicon is made from n-type material with light exposure, the blue shift increases logarithmically with the anodizing current. Porous silicon prepared by anodizing p-type silicon exhibits a blue shift in the L-edge which increases with the time spent in the HF solution after the anodizing potential is turned off. The data are consistent with the quantum confinement model for the electronic structure of porous silicon.

Effect of Metallic Ions on Photoluminescence of Porous Silicon

2010 ◽  
Vol 663-665 ◽  
pp. 641-644 ◽  
Author(s):  
Bao Gai Zhai ◽  
Ming Meng ◽  
Qing Lan Ma ◽  
Yuan Ming Huang
Keyword(s):  
Porous Silicon ◽  
Cross Section ◽  
Electrochemical Deposition ◽  
Quantum Confinement ◽  
Careful Consideration ◽  
Metallic Ions ◽  
Photoluminescence Spectra ◽  
Physical Origin ◽  
Sem Images ◽  
Confinement Model

In the present paper, we have not only investigated the top surface and cross-section morphology, but also measured photoluminescence spectra characteristic of porous silicon after deposition of metallic ions by electrochemical deposition employing scanning electron microscopy (SEM) and spectrometer, respectively. It is apparent from the SEM images that the microstructure of porous silicon is seriously ruined by the metallic ions deposited by electrochemical deposition. Most interesting is the finding that in the photoluminescence spectrum of porous silicon after the deposition of metallic ions such as AL3+ and Cu2+, the luminescence band gradually is quenched as the electrochemical deposition progressed. A careful consideration of the results obtained show that according to the basic theory of well-established quantum confinement model, the quenching of photoluminescence spectra of porous silicon may well be attributed to the microstructure fell into ruin. On the other side of the fence, we can interpret the physical origin of the phenomenon in view of the presence of metallic ions which give rise a series of energy level deep in the band gap of porous silicon.

scholarly journals Photo and electroluminescence of porous silicon layers

BIBECHANA ◽  
2012 ◽  
Vol 8 ◽  
pp. 46-52
Author(s):  
E Haji-Ali
Keyword(s):  
Porous Silicon ◽  
Light Emission ◽  
Electrochemical Cell ◽  
Electrochemical Etching ◽  
Light Illumination ◽  
Porous Layers ◽  
Si Substrates ◽  
Orange Yellow ◽  
Intense Light ◽  
P Type

Porous silicon layers were prepared by both chemical and electrochemical methods on n- and ptype Si substrates. In the former technique, light emission was obtained from p-type and n-type samples. It was found that intense light illumination during the preparation process was essential for PSi formation on n-type substrates.An efficient electrochemical cell with some useful features was designed for electrochemical etching of silicon. Various preparation parameters were studied and photoluminescence emissions ranging from dark red to light blue were obtained from PSi samples prepared on p-type substrates. N-type samples produced emissions ranging from dark red to orange-yellow. Electroluminescence of porous silicon samples showed that the color of the emission was the same as the photoluminescence color of the sample, and its intensity and duration depended on the current density passed through the sample. The effects of exposure of samples to air, storage in vacuum, and heat-treatment in air on luminescence intensity of the samples and preparation of patterned porous layers were also studied.Keywords: Porous silicon layers; photoluminescence; electroluminescenceDOI: http://dx.doi.org/10.3126/bibechana.v8i0.4897  BIBECHANA 8 (2012) 46-52

Pholuminuksence Studies on Porous Silioon Quantum Confinement Mechanism

1993 ◽  
Vol 298 ◽  
Author(s):  
Shulin Zhang ◽  
Kuoksan He ◽  
Yangtian Hou ◽  
Xin Wang ◽  
Jingjian Li ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Current Density ◽  
Quantum Wire ◽  
Quantum Confinement ◽  
Mechanism Model ◽  
Peak Energy ◽  
P Type ◽  
Silicon Based ◽  
First Time ◽  
Photoluminescence Peak

AbstractA novel step—like and pinning behavior of photoluminescence peak energy connected with changes in the concentration of HIF and current density were for the first time observed for p— type porous silicon. Based on a theoretical calculation of the electron structure of the silicon quantum wire it is argued that these behaviors can be explained in terms of a novel formation mechanism model of porous silicon.

Structural, Surface Morphological and Photoluminescence Properties of Nanostructured Porous Silicon Material for Optoelectronics Application

2012 ◽  
Vol 584 ◽  
pp. 290-294 ◽  
Author(s):  
Jeyaprakash Pandiarajan ◽  
Natarajan Jeyakumaran ◽  
Natarajan Prithivikumaran
Keyword(s):  
Porous Silicon ◽  
Current Density ◽  
Light Emission ◽  
Electrochemical Etching ◽  
Light Emitting Diode ◽  
Radiative Transition ◽  
Sem Images ◽  
Optoelectronic Application ◽  
Gap Opening ◽  
P Type

The promotion of silicon (Si) from being the key material for microelectronics to an interesting material for optoelectronic application is a consequence of the possibility to reduce its device dimensionally by a cheap and easy technique. In fact, electrochemical etching of Si under controlled conditions leads to the formation of nanocrystalline porous silicon (PS) where quantum confinement of photo excited carriers and surface species yield to a band gap opening and an increased radiative transition rate resulting in efficient light emission. In the present study, the nanostructured PS samples were prepared using anodic etching of p-type silicon. The effect of current density on structural and optical properties of PS, has been investigated. XRD studies confirm the presence of silicon nanocrystallites in the PS structure. By increasing the current density, the average estimated values of grain size are found to be decreased. SEM images indicate that the pores are surrounded by a thick columnar network of silicon walls. The observed PL spectra at room temperature for all the current densities confirm the formation of PS structures with nanocrystalline features. PL studies reveal that there is a prominent visible emission peak at 606 nm. The obtained variation of intensity in PL emission may be used for intensity varied light emitting diode applications. These studies confirm that the PS is a versatile material with potential for optoelectronics application.

Optical Properties of Free-Standing Ultrahigh Porosity Silicon Films Prepared by Supercritical Drying

1996 ◽  
Vol 452 ◽  
Author(s):  
J. Von Behren ◽  
P. M. Fauchet ◽  
E. H. Chimowitz ◽  
C. T. Lira
Keyword(s):  
Porous Silicon ◽  
Electrochemical Etching ◽  
Supercritical Drying ◽  
Silicon Films ◽  
Index Of Refraction ◽  
Free Standing ◽  
Crystal Silicon ◽  
Si Substrates ◽  
Type C ◽  
P Type

AbstractHighly luminescent free-standing porous silicon thin films of excellent optical quality have been manufactured by using electrochemical etching and lift-off steps combined with supercritical drying. One to 50 μm thick free-standing layers made from highly (p+) and moderately (p) Boron doped single crystal silicon (c-Si) substrates have been produced with porosities (P) up to 95 %. The Fabry-Pérot fringes observed in the transmission and photoluminescence (PL) spectra are used to determine the refractive index. At the highest P the index of refraction is below 1.2 from the IR to 2 eV. The absorption coefficients follow a nearly exponential behavior in the energy range from 1.2 eV and 4 eV. The porosity corrected absorption spectra of free-standing films made from p type c-Si substrates are blue shifted with respect to those prepared from p+ substrates. For P > 70 % a blue shift is also observed in PL. At equal porosities the luminescence intensities of porous silicon films made from p+ and p type c-Si are different by one order of magnitude.

ESR Study of Porous Silicon

1992 ◽  
Vol 283 ◽  
Author(s):  
W. Y. Cheung ◽  
S. P. Wong ◽  
I. H. Wilson ◽  
C. F. Kan ◽  
S. K. Hark
Keyword(s):  
Porous Silicon ◽  
Spin Density ◽  
Light Emission ◽  
Blue Shift ◽  
Esr Spectra ◽  
Peak Position ◽  
Silicon Substrates ◽  
Post Annealing ◽  
G Value ◽  
P Type

ABSTRACTA detailed ESR study has been performed on porous silicon on both <100> and <111> p-type silicon substrates prepared using anodization in HF under a range of conditions and the results are correlated with the light emission properties. It is found that the ESR spectra are dependent upon the orientation of the samples. The ESR defect centers are identified to be the Pb centers or Pbo centers of the Si-SiO2 system from the g-value anisotropy maps. The variation of the spin density Ns with annealing conditions has also been studied for samples annealed either in nitrogen or oxygen ambient at 200°C for various time intervals. It is concluded that the increase or decrease of Ns are due to the generation or elimination of the Pb or Pbo centers in conjunction with the oxidation process during annealing. From PL study of these samples, it is found that there is no simple correlation between the spin density and the PL intensity. However, a blue shift in the PL peak position was observed both in samples after a post-annealing etch in HF solution, and in samples annealed in oxygen without a post-annealing etch. This blue shift supports the quantum confinement model of light emission from porous silicon.

Effect of Electrolyte Volume Ratio on Electroluminescence of Porous Silicon Nanostructures (PSiNs) Intensity

2013 ◽  
Vol 686 ◽  
pp. 49-55
Author(s):  
M. Ain Zubaidah ◽  
N.A. Asli ◽  
Mohamad Rusop ◽  
Saifollah Abdullah
Keyword(s):  
Porous Silicon ◽  
Light Emission ◽  
Light Emitting Diode ◽  
Volume Ratio ◽  
Visible Range ◽  
Silicon Nanostructures ◽  
Etching Time ◽  
Light Emitting ◽  
Flat Screen ◽  
P Type

For this experiment, the main purpose of this experiment is to determine the electroluminescence of PSiNs samples with optimum electrolyte volume ratio of photo-electrochemical anodisation. PSiNs samples were prepared by photo-electrochemical anodisation by using p-type silicon substrate. For the formation of PSiNs on the silicon surface, a fixed current density (J=20 mA/cm2) and 30 minutes etching time were applied for the various electrolyte volume ratio. Volume ratio of hydrofluoric acid 48% (HF48%) and absolute ethanol (C2H5OH), HF48%:C2H5OH was used for sample A (3:1), sample B (2:1), sample C (1:1), sample D (1:2) and sample E (1:3). The light emission can be observed at visible range. The effective electroluminescence was observed for sample C. Porous silicon nanostructures light–emitting diode (PSiNs-LED) has high-potential device for future flat screen display and can be high in demand.

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