scholarly journals Photo and electroluminescence of porous silicon layers

BIBECHANA ◽  
2012 ◽  
Vol 8 ◽  
pp. 46-52
Author(s):  
E Haji-Ali
Keyword(s):  
Porous Silicon ◽  
Light Emission ◽  
Electrochemical Cell ◽  
Electrochemical Etching ◽  
Light Illumination ◽  
Porous Layers ◽  
Si Substrates ◽  
Orange Yellow ◽  
Intense Light ◽  
P Type

Porous silicon layers were prepared by both chemical and electrochemical methods on n- and ptype Si substrates. In the former technique, light emission was obtained from p-type and n-type samples. It was found that intense light illumination during the preparation process was essential for PSi formation on n-type substrates.An efficient electrochemical cell with some useful features was designed for electrochemical etching of silicon. Various preparation parameters were studied and photoluminescence emissions ranging from dark red to light blue were obtained from PSi samples prepared on p-type substrates. N-type samples produced emissions ranging from dark red to orange-yellow. Electroluminescence of porous silicon samples showed that the color of the emission was the same as the photoluminescence color of the sample, and its intensity and duration depended on the current density passed through the sample. The effects of exposure of samples to air, storage in vacuum, and heat-treatment in air on luminescence intensity of the samples and preparation of patterned porous layers were also studied.Keywords: Porous silicon layers; photoluminescence; electroluminescenceDOI: http://dx.doi.org/10.3126/bibechana.v8i0.4897  BIBECHANA 8 (2012) 46-52

Structural, Surface Morphological and Photoluminescence Properties of Nanostructured Porous Silicon Material for Optoelectronics Application

2012 ◽  
Vol 584 ◽  
pp. 290-294 ◽  
Author(s):  
Jeyaprakash Pandiarajan ◽  
Natarajan Jeyakumaran ◽  
Natarajan Prithivikumaran
Keyword(s):  
Porous Silicon ◽  
Current Density ◽  
Light Emission ◽  
Electrochemical Etching ◽  
Light Emitting Diode ◽  
Radiative Transition ◽  
Sem Images ◽  
Optoelectronic Application ◽  
Gap Opening ◽  
P Type

The promotion of silicon (Si) from being the key material for microelectronics to an interesting material for optoelectronic application is a consequence of the possibility to reduce its device dimensionally by a cheap and easy technique. In fact, electrochemical etching of Si under controlled conditions leads to the formation of nanocrystalline porous silicon (PS) where quantum confinement of photo excited carriers and surface species yield to a band gap opening and an increased radiative transition rate resulting in efficient light emission. In the present study, the nanostructured PS samples were prepared using anodic etching of p-type silicon. The effect of current density on structural and optical properties of PS, has been investigated. XRD studies confirm the presence of silicon nanocrystallites in the PS structure. By increasing the current density, the average estimated values of grain size are found to be decreased. SEM images indicate that the pores are surrounded by a thick columnar network of silicon walls. The observed PL spectra at room temperature for all the current densities confirm the formation of PS structures with nanocrystalline features. PL studies reveal that there is a prominent visible emission peak at 606 nm. The obtained variation of intensity in PL emission may be used for intensity varied light emitting diode applications. These studies confirm that the PS is a versatile material with potential for optoelectronics application.

Porous Silicon Morphology: Photo-Electrochemically Etched by Different Laser Wavelengths

2015 ◽  
Vol 6 (1) ◽  
Author(s):  
Shereen M. Faraj ◽  
Shaimaa M. Abd Al-Baqi ◽  
Nasreen R. Jber ◽  
Johnny Fisher
Keyword(s):  
Porous Silicon ◽  
Electrochemical Etching ◽  
Diode Lasers ◽  
Focus Of Attention ◽  
Blue Laser ◽  
Uniform Structure ◽  
Porous Layers ◽  
Current Densities ◽  
P Type ◽  
532 Nm

Porous silicon (PS) has become the focus of attention in upgrading silicon for optoelectronics. In this work, various structures were produced depending on the formation parameters by photo-electrochemical etching (PECE) process of n- and p-type silicon wafer at different time durations (5–90 mins) and different current densities (5, 15, and 20 mA/cm2) for each set of time durations. Diode lasers of 405 nm, 473 nm, and 532 nm wavelengths, each 50 mW power, were used to illuminate the surface of the samples during the etching process. The results showed that controlled porous layers were achieved by using blue laser, giving uniform structure which can make it possible to dispense with expensive methods of patterning the silicon.

Optical Properties of Free-Standing Ultrahigh Porosity Silicon Films Prepared by Supercritical Drying

1996 ◽  
Vol 452 ◽  
Author(s):  
J. Von Behren ◽  
P. M. Fauchet ◽  
E. H. Chimowitz ◽  
C. T. Lira
Keyword(s):  
Porous Silicon ◽  
Electrochemical Etching ◽  
Supercritical Drying ◽  
Silicon Films ◽  
Index Of Refraction ◽  
Free Standing ◽  
Crystal Silicon ◽  
Si Substrates ◽  
Type C ◽  
P Type

AbstractHighly luminescent free-standing porous silicon thin films of excellent optical quality have been manufactured by using electrochemical etching and lift-off steps combined with supercritical drying. One to 50 μm thick free-standing layers made from highly (p+) and moderately (p) Boron doped single crystal silicon (c-Si) substrates have been produced with porosities (P) up to 95 %. The Fabry-Pérot fringes observed in the transmission and photoluminescence (PL) spectra are used to determine the refractive index. At the highest P the index of refraction is below 1.2 from the IR to 2 eV. The absorption coefficients follow a nearly exponential behavior in the energy range from 1.2 eV and 4 eV. The porosity corrected absorption spectra of free-standing films made from p type c-Si substrates are blue shifted with respect to those prepared from p+ substrates. For P > 70 % a blue shift is also observed in PL. At equal porosities the luminescence intensities of porous silicon films made from p+ and p type c-Si are different by one order of magnitude.

Relationships Between Photoluminescence Spectra and Porosity of Porous Silicon

1994 ◽  
Vol 332 ◽  
Author(s):  
H.Z. Song ◽  
L.Z. Zhang ◽  
B.R. Zhang ◽  
G.G. Qin
Keyword(s):  
Porous Silicon ◽  
Quantum Confinement ◽  
Light Emission ◽  
Photoluminescence Spectra ◽  
Lower Side ◽  
Si Substrates ◽  
Peak Energy ◽  
P Type ◽  
Confinement Model

ABSTRACTIt was found that porous silicon (PS) layers formed on 0.01 Ωcm (111) and 0.02 Ωcm (100) Si substrates show high photoluminescence (PL) peak energies on both lower and higher porosity sides and a minimum of PL peak energy at the moderate porosity, while those formed on 0.8 and 10Ωcm (111) p-type Si substrates show an increase of PL peak energy with porosity on the lower side and a saturation of PL peak energy with porosity on the higher side. These experimental facts are not consistent with the quantum confinement model for light emission of PS, which predicts a monotonous increase of PL peak energy with PS porosity.

Lifetime Measurements of Stain Etched and Passivated Porous Silicon

2003 ◽  
Vol 762 ◽  
Author(s):  
Ricardo Guerrero-Lemus ◽  
Fathi A. Ben-Hander ◽  
Cristoffer Ballif ◽  
Ali Kenanoglu ◽  
Dietmar Borchert ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Vapour Deposition ◽  
Surface Passivation ◽  
Chemical Vapour ◽  
Lifetime Measurements ◽  
Porous Layers ◽  
Si Substrates ◽  
Before And After ◽  
P Type ◽  
Weak Influence

AbstractIn this work we present the first experimental study of photocarrier lifetimes in p-type and n-type Si substrates in which stain etched porous silicon (PS) has been formed on the surface. The lifetime values have been obtained before and after the surface passivation of the samples. The surface pasivation has been produced by two different techniques: (i) hydrogen passivation by immersion of the samples in a HF solution; and (ii) deposition of SiNx in a plasma enhanced chemical vapour deposition system. The results show a degradation of the photocarrier lifetime when the porous layers are not adequately passivated. This lifetime degradation is mainly associated to a large concentration of rapid recombination centres located at the Si/PS interface. We have also detected a weak influence of the PS outermost dangling bonds to the photocarrier lifetimes.

scholarly journals Responsivity of porous silicon for blue visible light with high sensitivity

2018 ◽  
Vol 16 (37) ◽  
pp. 98-107 ◽  
Author(s):  
Iftikhar M. Ali
Keyword(s):  
Porous Silicon ◽  
Blue Light ◽  
Current Density ◽  
Crystalline Silicon ◽  
Electrochemical Etching ◽  
Etching Time ◽  
Light Illumination ◽  
Average Pore ◽  
Zero Bias ◽  
P Type

In this work, porous silicon (PS) are fabricated using electrochemical etching (ECE) process for p-type crystalline silicon (c-Si) wafers of (100) orientation. The structural, morphological and electrical properties of PS synthesized at etching current density of (10, 20, 30) mA/cm2 at constant etching time 10 min are studied. From X-ray diffraction (XRD) measurement, the value of FWHM is in general decreases with increasing current density for p-type porous silicon (p-PS). Atomic force microscope (AFM) showed that for p-PS the average pore diameter decreases at 20 mA. Porous silicon which formed on silicon will be a junction so I-V characteristics have been studied in the dark to calculate ideality factor (n), and saturation current (Is) for these junctions. These junctions are used in photo sensors applications, where the photo sensors have been examined at blue light region. Sensitivity, rise and fall times have been calculated for this wavelength, the maximum value for sensitivity is (3797.6 %) at etching current density 10 mA/cm2 under blue light illumination at zero bias voltage.

scholarly journals Room-Temperature H2 Gas Sensing Characterization of Graphene-Doped Porous Silicon via a Facile Solution Dropping Method

2017 ◽  
Author(s):  
Nu Si A Eom ◽  
Hong-Baek Cho ◽  
Yoseb Song ◽  
Woojin Lee ◽  
Tohru Sekino ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Gas Sensor ◽  
Room Temperature ◽  
Gas Sensing ◽  
Electrochemical Etching ◽  
Sensor Material ◽  
Sensing Mechanism ◽  
Si Substrates ◽  
H2 Sensor ◽  
P Type

In this study, a graphene-doped porous silicon (G-doped/p-Si) substrate for low ppm H2 gas detection by an inexpensive synthesis route was proposed as a potential noble graphene-based gas sensor material and to understand the sensing mechanism. The G-doped/p-Si gas sensor was synthesized by a simple capillary force-assisted solution dropping method on p-Si substrates, whose porosity was generated through an electrochemical etching process. G-doped/p-Si was fabricated with various graphene concentrations and exploited as a H2 sensor operated at room temperature. The sensing mechanism of the sensor with/without graphene decoration on p-Si was proposed to elucidate the synergetic gas sensing effect generated from the interface between the graphene and p-type silicon.

scholarly journals Porous Silicon Biosensor for the Detection of Bacteria through Their Lysate

Biosensors ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 27
Author(s):  
Roselien Vercauteren ◽  
Audrey Leprince ◽  
Jacques Mahillon ◽  
Laurent A. Francis
Keyword(s):  
Porous Silicon ◽  
Electrochemical Etching ◽  
Bacterial Lysate ◽  
Fast Detection ◽  
Porous Layers ◽  
Deep Blue ◽  
Diffusion Limited ◽  
Colony Forming Units ◽  
Selective Lysis ◽  
Microfabrication Techniques

Porous silicon (PSi) has been widely used as a biosensor in recent years due to its large surface area and its optical properties. Most PSi biosensors consist in close-ended porous layers, and, because of the diffusion-limited infiltration of the analyte, they lack sensitivity and speed of response. In order to overcome these shortcomings, PSi membranes (PSiMs) have been fabricated using electrochemical etching and standard microfabrication techniques. In this work, PSiMs have been used for the optical detection of Bacillus cereus lysate. Before detection, the bacteria are selectively lysed by PlyB221, an endolysin encoded by the bacteriophage Deep-Blue targeting B. cereus. The detection relies on the infiltration of bacterial lysate inside the membrane, which induces a shift of the effective optical thickness. The biosensor was able to detect a B. cereus bacterial lysate, with an initial bacteria concentration of 105 colony forming units per mL (CFU/mL), in only 1 h. This proof-of-concept also illustrates the specificity of the lysis before detection. Not only does this detection platform enable the fast detection of bacteria, but the same technique can be extended to other bacteria using selective lysis, as demonstrated by the detection of Staphylococcus epidermidis, selectively lysed by lysostaphin.

Calorimetric Investigation of Relaxation Processes in Disordered Semiconductors

1996 ◽  
Vol 420 ◽  
Author(s):  
B. G. Budaguan ◽  
A. A. Aivazov ◽  
A. Yu. Sazonov
Keyword(s):  
Porous Silicon ◽  
Low Temperature ◽  
Electrochemical Etching ◽  
Structural Rearrangement ◽  
Endothermic Effect ◽  
Relaxation Processes ◽  
Exothermic Effect ◽  
Scanning Calorimetry ◽  
Si Substrates ◽  
Dsc Measurements

AbstractThe comparative study of relaxation processes in amorphous hydrogenated (a- Si:H) and porous silicon (PS) by use of differential scanning calorimetry (DSC) measurements is presented. Films of a-Si:H were deposited by RF glow discharge of two gas mixtures (10% SiH4+ 90% H2) and (5% SiH4 + 95% He). PS films have been prepared by electrochemical etching of 1Ω-cm (p- PS) and of 0.01Ω-cm (p+ PS) ptype Si substrates. The DSC traces were recorded during the heating of samples at a constant rate of 10°C/min from 20 to 5700C in an Ar atmosphere. All investigated samples present a low temperature exothermic effect with a maxima within 120-2800C. At higher temperatures (T>3000C) a second exothermic effect is observed for a-Si:H films prepared from both hydrogen and helium diluted silane mixtures while two endothermic effects are observed for PS samples. Analysis of the low temperature exothermic effects has been performed, and focussed on the relaxation of weak Si-Si bonds which are the features of both amorphous hydrogenated and porous silicon. It was shown that the endothermic effect connected with hydrogen effusion from PS at higher temperatures is compensated by exothermic structural rearrangement in the case of a-Si:H.

I-V and Surface Topography Study of Nanostructure Porous Silicon Layer Prepared by Electrochemical Etching

2012 ◽  
Vol 576 ◽  
pp. 519-522 ◽  
Author(s):  
Fadzilah Suhaimi Husairi ◽  
Maslihan Ain Zubaidah ◽  
Shamsul Faez M. Yusop ◽  
Rusop Mahmood Mohamad ◽  
Saifolah Abdullah
Keyword(s):  
Electrical Properties ◽  
Porous Silicon ◽  
Surface Topography ◽  
Electrochemical Etching ◽  
Silicon Layer ◽  
Porous Silicon Layer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Current Voltage ◽  
P Type

This article reports on the electrical properties of porous silicon nanostructures (PSiNs) in term of its surface topography. In this study, the PsiNs samples were prepared by using different current density during the electrochemical etching of p-type silicon wafer. PSiNs has been investigated its electrical properties and resistances for different surface topography of PSiNs via current-voltage (I-V) measurement system (Keithley 2400) while its physical structural properties was investigated by using atomic force microscopy (AFM-XE100).

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