High-Quality Photoconductive Ultraviolet GaN/6H-SiC Detector and Its Properties

1996 ◽  
Vol 449 ◽  
Author(s):  
K. Yang ◽  
R. Zhang ◽  
L. Zang ◽  
B. Shen ◽  
Z.Z. Chen ◽  
...  

ABSTRACTThe properties of photoconductive ultraviolet detector based on GaN epilayer grown on 6H-SiC substrate by metalorganic chemical vapor deposition were investigated in this paper. We obtained the detectable energy span of the device up to ultraviolet by photocurrent measurement. The spectral responsivity remained nearly constant for wavelengths from 250 to 365 nm and dropped by three orders of magnitude within 10 nm of the band edge (by 380 nm). The detector was measured to have a responsivity of 133 A/W at a wavelength of 360 nm under a 5-V bias, and the voltage-dependent responsivity was performed. Furthermore, an easy method was developed to determine the response time, and the relationship between response time and bias was obtained.

1985 ◽  
Vol 56 ◽  
Author(s):  
Y. Shinoda ◽  
Y. Ohmachi

AbstractHigh-quality single domain GaAs epitaxial layers were successfully grown on (100)Ge substrates. Growth was carried out using conventional metalorganic chemical vapor deposition at atmospheric pressure. Antiphase domain free GaAs epitaxial layers were obtained by thermal etching of the Ge surface just prior to growth. Mosaic surface morphology and antiphase boundaries characteristic of domain structures were completely absent in epi-layers following thermal etching. Photoluminescence revealed that domain free epi-layers exhibited characteristics comparable to those of GaAs homoepitaxial layers.


2011 ◽  
Vol 32 (9) ◽  
pp. 896-901 ◽  
Author(s):  
陈耀 CHEN Yao ◽  
王文新 WANG Wen-xin ◽  
黎艳 LI Yan ◽  
江洋 JIANG Yang ◽  
徐培强 XU Pei-qiang ◽  
...  

2020 ◽  
Vol 65 (1) ◽  
pp. 122-125
Author(s):  
I. S. Ezubchenko ◽  
M. Ya. Chernykh ◽  
I. O. Mayboroda ◽  
I. N. Trun’kin ◽  
I. A. Chernykh ◽  
...  

2007 ◽  
Vol 1040 ◽  
Author(s):  
Vibhu Jindal ◽  
James Grandusky ◽  
Neeraj Tripathi ◽  
Mihir Tungare ◽  
Fatemeh Shahedipour-Sandvik ◽  
...  

AbstractHigh quality homoepitaxial growth of m-plane GaN films on freestanding m-plane HVPE GaN substrates has been performed using metalorganic chemical vapor deposition. For this a large growth space was studied. Large areas of no-nucleation along with presence of high density of defects were observed when layers were grown under growth conditions for c-plane GaN. It is believed that these structural defects were in large part due to the low lateral growth rates as well as unequal lateral growth rates in a- and c- crystallographic directions. To achieve high quality, fully coalesced epitaxial layers, growth conditions were optimized with respect to growth temperature, V/III ratios and reactor pressure. Higher growth temperatures led to smoother surfaces due to increased surface diffusion of adatoms. Overall, growth at higher temperature and lower V/III ratio decreased the surface roughness and resulted in better optical properties as observed by photoluminescence. Although optimization resulted in highly smooth layers, some macroscopic defects were still observed on the epi-surface as a result of contamination and subsurface damage remaining on bulk substrates possibly due to polishing. Addition of a step involving annealing of the bulk substrate under H2: N2 environment, prior to growth, drastically reduced such macroscopic defects.


Sign in / Sign up

Export Citation Format

Share Document