In Situ Measurement of Stress. Included During Annealing, in A1-2%Cu Thin Films
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ABSTRACTStress measurement in thin film systems is discussed and applied to Al-2%Cu filns on SiO2/Si substrates during thermal cycling. Plastic deformation obscrved during compressive stress relaxation is correlated with the formation of hillocks on the metal films. The effect of secondary layers of 10%Ti-90%W on the thermo-mcchanical response of Al films is examined.
2006 ◽
Vol 21
(2)
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pp. 505-511
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1993 ◽
Vol 51
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pp. 842-843
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2019 ◽
Vol 11
(31)
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pp. 28407-28422
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2006 ◽
Vol 326-328
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pp. 689-692
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1998 ◽
Vol 13
(5)
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pp. 1266-1270
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