Electrical Characteristics of New LDD Poly-Si TFT with MIS-Alignment Tolerant Structure for AMLCDs

1997 ◽  
Vol 471 ◽  
Author(s):  
Byung-Hyuk Min ◽  
Jerzy Kanicki
Keyword(s):  
Leakage Current ◽  
Experimental Results ◽  
Electrical Characteristics ◽  
Current Ratio ◽  
Low Leakage ◽  
Kink Effect ◽  
Low Leakage Current ◽  
Dual Gate ◽  
Output Characteristics

ABSTRACTA new LDD poly-Si TFT structure having symmetrical electrical characteristics independent of the process induced mis-alignment is described in this paper. Based on the experimental results, we have established there is no difference between the forward and reverse characteristics and a low leakage current, comparable to a conventional LDD poly-Si TFT, has been maintained for this new poly-Si TFTs. The maximum ON/OFF current ratio of about 1×108 is obtained for the LDD length of 1.0 μm. In addition, the kink effect in the output characteristics is remarkably improved in the new TFTs in comparison to the conventional non-LDD single- or dual-gate TFTs.

Large-size (1.7 × 1.7 mm2) β-Ga2O3 field-plated trench MOS-type Schottky barrier diodes with 1.2 kV breakdown voltage and 109 high on/off current ratio

2021 ◽  
Vol 15 (1) ◽  
pp. 016501
Author(s):  
Fumio Otsuka ◽  
Hironobu Miyamoto ◽  
Akio Takatsuka ◽  
Shinji Kunori ◽  
Kohei Sasaki ◽  
...  
Keyword(s):  
Schottky Barrier ◽  
Leakage Current ◽  
Schottky Barrier Diodes ◽  
Wafer Level ◽  
Current Ratio ◽  
Field Plate ◽  
Low Leakage ◽  
Large Size ◽  
Forward Current ◽  
Low Leakage Current

Abstract We fabricated high forward and low leakage current trench MOS-type Schottky barrier diodes (MOSSBDs) in combination with a field plate on a 12 μm thick epitaxial layer grown by halide vapor phase epitaxy on β-Ga2O3 (001) substrate. The MOSSBDs, measuring 1.7 × 1.7 mm2, exhibited a forward current of 2 A (70 A cm−2) at 2 V forward voltage and a leakage current of 5.7 × 10–10 A at −1.2 kV reverse voltage (on/off current ratio of > 109) with an ideality factor of 1.05 and wafer-level specific on-resistance of 17.1 mΩ · cm2.

Effect of Simultaneous Addition of Zr and Y on Electrical Characteristics of ZnO Varistors

2011 ◽  
Vol 485 ◽  
pp. 257-260 ◽  
Author(s):  
Takayuki Watanabe ◽  
Ai Fukumori ◽  
Yuji Akiyamna ◽  
Yuuki Sato ◽  
Shinzo Yoshikado
Keyword(s):  
Leakage Current ◽  
Nonlinear Coefficient ◽  
The Other ◽  
Electrical Characteristics ◽  
Simultaneous Addition ◽  
Zno Varistor ◽  
Low Leakage ◽  
Electrical Degradation ◽  
Low Leakage Current ◽  
Zno Varistors

The effect of simultaneously adding Zr and Y to Bi–Mn–Co–Sb–Si–Cr–Ni-added ZnO varistors (having the same composition as a commercial varistor) on the varistor voltage, leakage current, and resistance to electrical degradation were investigated. Varistor voltage increased with increasing amount of Y for addition of 0–2 mol % Zr. On the other hand, the nonlinear coefficient α prior to electrical degradation changed very little on the addition of both Y and Zr. With the addition of approximately 1 mol% Zr, the leakage current decreased with increasing amount of Y added. A ZnO varistor with a varistor voltage of approximately 600 V/m, a low leakage current, and excellent resistance to electrical degradation was fabricated by adding approximately 2 mol% Y and approximately 1 mol% Zr.

Reverse Electrical Characteristics of 4H-SiC JBS Diodes Fabricated on In-House Substrate with Low Threading Dislocation Density

2011 ◽  
Vol 679-680 ◽  
pp. 694-697 ◽  
Author(s):  
Fujiwara Hirokazu ◽  
Masaki Konishi ◽  
T. Ohnishi ◽  
T. Nakamura ◽  
Kimimori Hamada ◽  
...  
Keyword(s):  
Dislocation Density ◽  
Leakage Current ◽  
Surface Defects ◽  
High Yield ◽  
Threading Dislocation ◽  
Electrical Characteristics ◽  
Large Area ◽  
Low Leakage ◽  
Low Leakage Current ◽  
Threading Dislocation Density

The impacts of threading dislocations, surface defects, donor concentration, and schottky Schottky barrier height on the reverse IV characteristic of silicon carbide (SiC) junction barrier schottky Schottky (JBS) diodes were investigated. The 100 A JBS diodes were fabricated on 4H-SiC 3-inch N-type wafers with two types of threading dislocation density. The typical densities are were 0.2×104 and 3.8×104 cm-2, respectively. The improvement of vIt was found that variations in the leakage current and the high yield of large area JBS diodes werecould be were obtained improved by using a wafer with a low threading dislocation density. In the range of low leakage current, the investigation shows showed a correlation between leakage current and threading dislocation density.

MOVPE growth of in situ SiNx/AlN/GaN MISHEMTs with low leakage current and high on/off current ratio

2015 ◽  
Vol 414 ◽  
pp. 237-242 ◽  
Author(s):  
Jun Ma ◽  
Xing Lu ◽  
Xueliang Zhu ◽  
Tongde Huang ◽  
Huaxing Jiang ◽  
...  
Keyword(s):  
Leakage Current ◽  
Current Ratio ◽  
Low Leakage ◽  
Low Leakage Current ◽  
Movpe Growth

300°C operation of normally‐off AlGaN/GaN MOSFET with low leakage current and high on/off current ratio

2014 ◽  
Vol 50 (4) ◽  
pp. 315-316 ◽  
Author(s):  
Zhe Xu ◽  
Jinyan Wang ◽  
Yong Cai ◽  
Jingqian Liu ◽  
Zhen Yang ◽  
...  
Keyword(s):  
Leakage Current ◽  
Current Ratio ◽  
Low Leakage ◽  
Low Leakage Current

1200-V JBS Diodes with Low Threshold Voltage and Low Leakage Current

2008 ◽  
Vol 600-603 ◽  
pp. 939-942 ◽  
Author(s):  
Takeo Yamamoto ◽  
Jun Kojima ◽  
Takeshi Endo ◽  
Eiichi Okuno ◽  
Toshio Sakakibara ◽  
...  
Keyword(s):  
Leakage Current ◽  
Schottky Diode ◽  
Threshold Voltage ◽  
Reverse Bias ◽  
Electrical Characteristics ◽  
Low Leakage ◽  
Forward Current ◽  
Low Leakage Current ◽  
Low Threshold ◽  
Power Application

4H-SiC SBDs have been developed by many researchers and commercialized for power application devices in recent years. At present time, the issues of an SiC-SBD are lower on-state current and a relatively larger-leakage current at the reverse bias than Si-PN diodes. A JBS (Junction Barrier Schottky) diode was proposed as a structure to realize a lower leakage current. We simulated the electrical characteristics of JBS diodes, where the Schottky electrode was made of molybdenum in order to optimize its performance. We fabricated JBS diodes based on the simulation with a diameter of 3.9mm (11.9 mm2). The JBS diode has a lower threshold voltage of 0.45 V, a large forward current of 40 A at Vf = 2.5V and a high breakdown voltage of 1660 V. Furthermore, the leakage current at 1200 V was remarkably low (Ir = 20 nA).

Effect of Sb Addition on the Electrical Characteristics of Bi-Based ZnO Varistors Containing Zr and Y

2013 ◽  
Vol 566 ◽  
pp. 223-226
Author(s):  
Takayuki Watanabe ◽  
Yosuke Tokoro ◽  
Yuuki Sato ◽  
Shinzo Yoshikado
Keyword(s):  
Grain Boundaries ◽  
Leakage Current ◽  
High Resistance ◽  
Electrical Characteristics ◽  
Zno Varistor ◽  
Low Leakage ◽  
Electrical Degradation ◽  
Low Leakage Current ◽  
Zno Varistors

The effects of adding Sb to a BiMnCoSiCrNiYZr-added ZnO varistor (with the same composition as a commercial varistor) on the varistor voltage, leakage current, and resistance to electrical degradation were investigated. Bi is incorporated in spinel particles, and δ-Bi2O3eventually disappears with the addition of small amounts of Bi, especially as the amount of Sb2O3added increased. Reduction in both the nonlinearity index and the amount of δ-Bi2O3for small amounts of added Bi with the addition of more than approximately 1.25 mol% Sb2O3demonstrates that Sb inhibits Bi2O3from forming deep interfacial impurity levels at the grain boundaries. The sample containing 1.2 mol% Bi2O3, 1.0 mol% ZrO2, 1.0 mol% Y2O3, and 1.5 mol% Sb2O3added exhibits a high varistor voltage (approximately 630 V/mm), high resistance to electrical degradation and low leakage current.

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