Single and Double Variant Cupt-B Ordered GalnAs

1999 ◽  
Vol 583 ◽  
Author(s):  
R. L. Forrest ◽  
E. D. Meserole ◽  
R. T. Nielsen ◽  
M. S. Goorsky ◽  
Y. Zhang ◽  
...  
Keyword(s):  
Order Parameter ◽  
Growth Conditions ◽  
Semiconductor Heterostructures ◽  
X Ray Diffraction ◽  
High Crystalline Quality ◽  
X Ray ◽  
Organic Vapor ◽  
Metal Organic ◽  
Inp Substrates ◽  
Lattice Matched

AbstractNominally lattice-matched GaInAs layers grown by metal organic vapor phase epitaxy on InP substrates have been studied using high-resolution x-ray diffraction (HRXRD) to determine the growth conditions under which ordering is introduced. HRXRD provides an independent means to quantify the order parameter of semiconductor heterostructures as well as the ordering on different {111} planes, i.e., double variant ordering. This independent means to determine ordering provides for a better understanding of the effects of ordering on the electronic and optical properties. Double variant ordering was observed for epitaxial layers grown on exact (001) InP substrates, with an order parameter of about 0.1 in both variants. For substrates that were miscut by 6 degrees, single variant ordering was detected. In these cases, an order parameter as high as 0.66 was measured for certain growth conditions. The layers grown on vicinal substrates are all of high crystalline quality, those on (001) substrates exhibit some mosaic spread.

Ordering in GaxIn1−xAsyP1−y Detected by Diffraction Methods

1995 ◽  
Vol 417 ◽  
Author(s):  
I. Rechenberg ◽  
A. Oster ◽  
A. Knauer ◽  
U. Richter ◽  
J. Menniger ◽  
...  
Keyword(s):  
High Resolution ◽  
Miscibility Gap ◽  
X Ray Diffraction ◽  
Temperature Behaviour ◽  
Anomalous Temperature ◽  
X Ray ◽  
Organic Vapor ◽  
Transmission Electron ◽  
Metal Organic ◽  
Lattice Matched

AbstractGa0.54In0.46As0.12P0.88 lattice matched to GaAs and grown by metal organic vapor phase epitaxy (MOVPE) shows an anomalous temperature behaviour of its cathodoluminescence (CL) emission. Using high resolution x-ray diffraction (HRXRD) and transmission electron diffraction (TED), ordering in this quarternary alloy can be identified as the reason for this behaviour. The ordering follows the same trends with respect to misorientation that are known for InGaP. In addition to ordering, compositional fluctuations related to a miscibility gap are found in this material. In contrast, layers with a higher As-content (y=0.5; y=0.76) do not show properties related to ordering.

Gallium Nitride Growth Using Diethylgallium Chloride as an Alternative Gallium Source

1998 ◽  
Vol 537 ◽  
Author(s):  
Ling Zhang ◽  
Rong Zhang ◽  
Marek P. Boleslawski ◽  
T.F. Kuech
Keyword(s):  
Growth Conditions ◽  
Rocking Curve ◽  
X Ray ◽  
Force Microscopy ◽  
Organic Vapor ◽  
Atomic Force ◽  
Curve Line ◽  
Metal Organic ◽  
Increasing Temperature ◽  
Trimethyl Gallium

AbstractMetal organic vapor phase epitaxy (MOVPE) of GaN has been carried out using diethyl gallium chloride (DEGaCI) and ammonia. The growth rate and efficiency of the DEGaCl-based growth decreases with increasing temperature when compared to trimethyl gallium (TMG)-based growth under similar conditions. Both low temperature buffer and the high temperature GaN layers were grown using the DEGaCI-NH3 precursor combination on the basal plane of sapphire and compared to similar structures grown using TMG and NH3. DEGaCl-based growth reveals an improved growth behavior under identical growth conditions to the conventional TMGa and ammonia growth. X-ray, Hall, and atomic force microscopy (AFM) measurements have been carried out on these samples providing a direct comparison of materials properties associated with these growth precursors. For the DEGaCl-based growth, the x-ray rocking curve line width, using the (0002) reflection, is as low as 300 arcsec on a 2.5-micron thick film. A RMS surface roughness of ∼0.5nm measured over a 10x10 micron area.

Optical and X-Ray Diffraction Characterization of MBE-Grown InGaAs, InAlAs and InGaAIAs on InP

1994 ◽  
Vol 340 ◽  
Author(s):  
Z. C. Feng ◽  
S. J. Chua ◽  
A. Raman ◽  
N.N. Lim
Keyword(s):  
Optical Properties ◽  
Fourier Transform ◽  
Molecular Beam ◽  
Growth Conditions ◽  
X Ray Diffraction ◽  
Double Crystal ◽  
X Ray ◽  
Lattice Matched ◽  
Comprehensive Characterization

ABSTRACTA variety of Inl-xGaxAs, Inl-yAlyAs and Inl-x-yGaxAlyAs films have been grown on InP by molecular beam epitaxy. A comprehensive characterization was performed using Raman scattering, photoluminescence (PL), Fourier transform infrared (FTIR) spectroscopy and double crystal X-ray diffraction on these ternary and quaternary heterostructures with different compositions and growth conditions. The lattice matched and mismatched structures are studied. Our analyses show that the interface mismatch exerts an important influence on the optical properties of these heterostructures, and conversely that Raman, PL and FTIR can be used to probe the interface mismatch nondestructively.

Integration of GaAs on Ge/Si towers by MOVPE

2013 ◽  
Vol 1538 ◽  
pp. 283-289
Author(s):  
A. G. Taboada ◽  
T. Kreiliger ◽  
C. V. Falub ◽  
M. Richter ◽  
F. Isa ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Morphological Evolution ◽  
Chemical Vapor ◽  
Lattice Parameter ◽  
Low Energy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Organic Vapor ◽  
Metal Organic

ABSTRACTWe report on the maskless integration of micron-sized GaAs crystals on patterned Si substrates by metal organic vapor phase epitaxy. In order to adapt the mismatch between the lattice parameter and thermal expansion coefficient of GaAs and Si, 2 μm tall Ge crystals were first grown as virtual substrate by low energy plasma enhanced chemical vapor deposition. We investigate the morphological evolution of the GaAs structures grown on top of the Ge crystals at the transition towards full pyramids with energetically stable {111} facets. A substantial release of strain is shown in GaAs crystals with a height of 2 μm and lateral sizes up to 15×15 μm2 by both X-ray diffraction and photoluminescence.

Compositional control and structural properties of ZnSe1-xTex epitaxial films on lattice- matched InGaAs/InP (001) by photoassisted Metal Organic Vapor Phase Expitaxy (MOVPE)

2004 ◽  
Vol 819 ◽  
Author(s):  
Bhanu Prakash Yarlagadda ◽  
Angel Rodriguez ◽  
Peng Li ◽  
John Ayers ◽  
Faquir Jain
Keyword(s):  
Gas Phase ◽  
Vapor Phase ◽  
Structural Data ◽  
Epitaxial Films ◽  
Lower Growth ◽  
X Ray ◽  
Organic Vapor ◽  
Metal Organic ◽  
Compositional Control ◽  
Lattice Matched

AbstractWe report the growth of ZnSe1−xTex (x < 0.9) epitaxial layers using photoassisted Metal- Organic Vapor Phase Epitaxy (MOVPE) on lattice-matched InGaAs/InP (001) substrates. Ternary compositional control was studied as a function of the gas phase composition, growth temperature (360°C – 400°C) and irradiation (12 mW/cm2 – 48mW/cm2). Compositional and structural data were obtained by x-ray rocking curves from 004 and 044 reflections. Lower growth temperatures increased the relative tellurium incorporation but at the expense of the growth rate.

X-ray Diffraction Study of Chalcopyrite ZnSnP2 Epitaxial Layers

1999 ◽  
Vol 583 ◽  
Author(s):  
S. Francoeur ◽  
G. A. Seryogin ◽  
S. A. Nikishin ◽  
H. Temkin
Keyword(s):  
Order Parameter ◽  
Growth Conditions ◽  
Cation Sublattice ◽  
Crystallographic Structure ◽  
Epitaxial Layers ◽  
X Ray Diffraction ◽  
X Ray ◽  
Partially Ordered ◽  
Interesting Candidate

AbstractWe apply the technique of x-ray diffraction to the determination of the crystallographic structure and the quantitative measurement of the order parameter of ZnSnP2 epitaxial layers. In bulk, ZnSnP2 it is possible to obtain highly ordered distribution of Zn and Sn atoms in the cation sublattice, but epitaxial growth often produces partially ordered layers. The ordered and disordered phases correspond to the chalcopyrite and sphalerite structures and their respective band gaps are 1.66 and 1.24 eV. Since ZnSnP2 is almost lattice-matched to GaAs. it is interesting candidate for optoelectronic applications.Samples used in this work were grown by gas source molecular beam epitaxy on GaAs substrates. Slight variations in growth conditions could be induced to produce partially ordered and disordered structures. Chalcopyrite ordering is determined by the observation of several characteristic reflections identifying the lower symmetry of this structure. For example, reflections from (101), (217) and (611) planes, strictly forbidden for sphalerite, were measured. The quantitative determination of the order parameter could be made by comparing intensities of a carefully chosen set of measured and calculated reflections. We show that while kinematic approximation can be used to model weak superstructure reflections, in the calculation of the strong, low-angle, fundamental reflections used for intensity normalization it is necessary to take into account extinction effects. Order parameters varying from 0 to 30% were obtained.

scholarly journals Gallium Nitride Growth Using Diethylgallium Chloride as an Alternative Gallium Source

1999 ◽  
Vol 4 (S1) ◽  
pp. 351-356
Author(s):  
Ling Zhang ◽  
Rong Zhang ◽  
Marek P. Boleslawski ◽  
T.F. Kuech
Keyword(s):  
Growth Conditions ◽  
Rocking Curve ◽  
X Ray ◽  
Force Microscopy ◽  
Organic Vapor ◽  
Atomic Force ◽  
Curve Line ◽  
Metal Organic ◽  
Increasing Temperature ◽  
Trimethyl Gallium

Metal organic vapor phase epitaxy (MOVPE) of GaN has been carried out using diethyl gallium chloride (DEGaCl) and ammonia. The growth rate and efficiency of the DEGaCl-based growth decreases with increasing temperature when compared to trimethyl gallium (TMG)-based growth under similar conditions. Both low temperature buffer and the high temperature GaN layers were grown using the DEGaCl-NH3 precursor combination on the basal plane of sapphire and compared to similar structures grown using TMG and NH3. DEGaCl-based growth reveals an improved growth behavior under identical growth conditions to the conventional TMGa and ammonia growth. X-ray, Hall, and atomic force microscopy (AFM) measurements have been carried out on these samples providing a direct comparison of materials properties associated with these growth precursors. For the DEGaCl-based growth, the x-ray rocking curve line width, using the (0002) reflection, is as low as 300 arcsec on a 2.5-micron thick film. A RMS surface roughness of ∼0.5nm measured over a 10×10 micron area.

scholarly journals High-Resolution X-ray Diffraction Studies of ZnSnAs2 Epitaxial Films Nearly Lattice-matched to InP Substrates

2010 ◽  
Vol 3 (2) ◽  
pp. 1351-1356 ◽  
Author(s):  
Joel T. Asubar ◽  
Yuji Agatsuma ◽  
Hiroshi Yamaguchi ◽  
Shin‘Ichi Nakamura ◽  
Yoshio Jinbo ◽  
...  
Keyword(s):  
High Resolution ◽  
Epitaxial Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Inp Substrates ◽  
Lattice Matched
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