InGaN-Channel FETs – Growth, Technology and Characteristics

2001 ◽  
Vol 680 ◽  
Author(s):  
E. Kohn ◽  
I. Daumiller ◽  
M. Neuburger ◽  
M. Seyboth ◽  
C. Kirchner ◽  
...  

ABSTRACTMaking use of the polar nature of III-nitride heterostructures, a new FET device concept is proposed. The structure contains an InGaN QW channel sandwiched in between two GaN barrier layers. The charge inthis structure is mainly generated by the strain field in the InGaN layer and is an electron/hole dipole sheet charge located at the opposite InGaN/GaN interfaces. To obtain nchannel characteristics the hole charge at the rear interface (for Ga-face oriented material) is compensated by donor doping of the channel or by modulation doping from the real GaN barrier layer. Growth, processing technology and characteristics of first fabricated devices is discussed.

2018 ◽  
Vol 5 (2) ◽  
pp. 025906 ◽  
Author(s):  
Xiaowei Wang ◽  
Jing Yang ◽  
Degang Zhao ◽  
Desheng Jiang ◽  
Zongshun Liu ◽  
...  

RSC Advances ◽  
2017 ◽  
Vol 7 (77) ◽  
pp. 48853-48860 ◽  
Author(s):  
Aditya Ashok ◽  
S. N. Vijayaraghavan ◽  
Shantikumar V. Nair ◽  
Mariyappan Shanmugam

MoO3 thin film recombination barrier layer suppresses electron–hole recombination at the FTO–TiO2 interface and facilitates charge transport.


2014 ◽  
Vol 16 (33) ◽  
pp. 17748-17755 ◽  
Author(s):  
P. Sudhagar ◽  
Anitha Devadoss ◽  
Taeseup Song ◽  
P. Lakshmipathiraj ◽  
Hyungkyu Han ◽  
...  

Maximizing the Au nanoparticle decoration on TiO2nanowire through nitrogen doping for simultaneous enhancement in visible light scattering and electron–hole charge separation.


1999 ◽  
Vol 570 ◽  
Author(s):  
Vo Van Tuyen

The realization of Planar Doped Barrier Diode (PDBD) presented in this paper starts out from the limits of the MBE layer growth technology. The limitations due to the background doping concentration and the diffusion of the n and p type dopants during the epitaxial growth are considered. The next parameter is the height of the potential barrier. The choice of this value depends on the requirements of the application. It must take into consideration the current transport mechanisms and the current limitation appearing at higher bias levels.


2013 ◽  
Vol 118 (1) ◽  
pp. 126-134 ◽  
Author(s):  
Luis G. C. Rego ◽  
Bruno C. Hames ◽  
Kahio T. Mazon ◽  
Jan-Ole Joswig

2017 ◽  
Vol 102 ◽  
pp. 35-39 ◽  
Author(s):  
J. Yang ◽  
D.G. Zhao ◽  
D.S. Jiang ◽  
P. Chen ◽  
J.J. Zhu ◽  
...  

1993 ◽  
Vol 54 (1-3) ◽  
pp. 385-390 ◽  
Author(s):  
A. Saxena ◽  
X.Z. Huang ◽  
A.R. Bishop ◽  
L.A. Worl ◽  
S.P. Love ◽  
...  

VLSI Design ◽  
1998 ◽  
Vol 8 (1-4) ◽  
pp. 237-245 ◽  
Author(s):  
F. A. Buot

We introduced a novel high-frequency source based on interband tunneling. A polarization-induced oscillation of trapped-hole-charge occurs in an AlGaSb/InAs/ AlGaSb resonant tunneling device. Rate equations for Zener tunneling, polarization, and electron-hole recombination is used to analyze the nonlinear dynamics of this device structure. The nonoscillatory state is unstable against the limit-cycle operation. The amplitude of trapped hole oscillation increases with bias, but the time-averaged values can be approximated by a step function. These lead to the hysteresis of the averaged trapped hole charge in AlGaSb barrier, and to the experimental intrinsic bistability in AlGaSb/InAs/AlGaSb resonant tunneling device. Large-scale time-dependent simulation of quantum transport with interband-tunneling dynamics is needed for the design optimization of this novel class of oscillator useful for high-bandwidth applications.


2019 ◽  
Vol 21 (4) ◽  
pp. 2102-2114
Author(s):  
Vytautas Grivickas ◽  
Patrik Ščajev ◽  
Vitalijus Bikbajevas ◽  
Olga V. Korolik ◽  
Alexander V. Mazanik

Imprinted transient grating fringes in TlInS2 are attributed to new crystal phase formed by 2D electron–hole charge separation on local layers.


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