Fabrication and Electrical Characterization of Ba(1-x)SrxTiO3 Based Thin Films

2003 ◽  
Vol 784 ◽  
Author(s):  
E. Ngo ◽  
W. D. Nothwang ◽  
C. Hubbard ◽  
M. W. Cole ◽  
W. Chang ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Low Frequency ◽  
Pulsed Laser ◽  
Electrical Characterization ◽  
Microwave Frequency ◽  
Thin Film Deposition ◽  
Dissipation Factor ◽  
Film Deposition ◽  
Device Applications

ABSTRACTOver the past several years there has been a tremendous growth and development of thin film deposition technology in the electronics industry. Ferroelectric thin films have been recognized for their unique dielectric properties and appear to be desirable for tunable microwave device applications. Among the most promising candidates for such applications are Ba(1−x)SrxTiO3[BST] and BST-based thin films. In this work pure BST and acceptor doped BST-based thin films were fabricated on (100) MgO substrates via pulsed laser deposition [PLD]. X-ray diffraction (XRD) in conjunction with the atomic force microscope (AFM) were used to analyze the film crystalinity and surface morphology. The dielectric properties were characterized at both 100 kHz and 20 GHz. The MIM capacitor configuration was used to attain the dielectric properties at 100 kHz and the microwave measurements, S11 reflection parameters, were achieved via interdigitated capacitor design with Au/Ag top electrodes. The parallel resistor-capacitor models were used to determine the microwave capacitance and Q factors and the permittivity was calculated using a modified conformal-mapping partial-capacitance method using the dimension of the capacitors. Our results demonstrated that the low frequency and microwave frequency dielectric properties were strongly influenced by the film composition. Specifically, the Mg doping served to lower the dissipation factor, permittivity, and tunability of the BST based films at both frequencies. This work demonstrates that the BST based thin films possessed excellent microstructural, structural, and dielectric properties. The structure-process-property correlations of the pulsed laser deposited BST and acceptor doped BST-based thin films are discussed in detail.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

scholarly journals Thin Films of Nanocrystalline Fe(pz)[Pt(CN)4] Deposited by Resonant Matrix-Assisted Pulsed Laser Evaporation

Materials ◽  
2021 ◽  
Vol 14 (23) ◽  
pp. 7135
Author(s):  
Dominik Maskowicz ◽  
Rafał Jendrzejewski ◽  
Wioletta Kopeć ◽  
Maria Gazda ◽  
Jakub Karczewski ◽  
...  
Keyword(s):  
Thin Films ◽  
Absorption Band ◽  
Spin Transition ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Evaporation ◽  
Band Shift ◽  
X Ray ◽  
Vis Spectroscopy

Prior studies of the thin film deposition of the metal-organic compound of Fe(pz)Pt[CN]4 (pz = pyrazine) using the matrix-assisted pulsed laser evaporation (MAPLE) method, provided evidence for laser-induced decomposition of the molecular structure resulting in a significant downshift of the spin transition temperature. In this work we report new results obtained with a tunable pulsed laser, adjusted to water resonance absorption band with a maximum at 3080 nm, instead of 1064 nm laser, to overcome limitations related to laser–target interactions. Using this approach, we obtain uniform and functional thin films of Fe(pz)Pt[CN]4 nanoparticles with an average thickness of 135 nm on Si and/or glass substrates. X-ray diffraction measurements show the crystalline structure of the film identical to that of the reference material. The temperature-dependent Raman spectroscopy indicates the spin transition in the temperature range of 275 to 290 K with 15 ± 3 K hysteresis. This result is confirmed by UV-Vis spectroscopy revealing an absorption band shift from 492 to 550 nm related to metal-to-ligand-charge-transfer (MLCT) for high and low spin states, respectively. Spin crossover is also observed with X-ray absorption spectroscopy, but due to soft X-ray-induced excited spin state trapping (SOXIESST) the transition is not complete and shifted towards lower temperatures.

Leakage Current and Dielectric Properties of Ba0.5Sr0.5TiO3 Films Deposited by RF Sputtering at Low Substrate Temperature

2003 ◽  
Vol 768 ◽  
Author(s):  
Nicholas Cramer ◽  
Thottam S. Kalkur ◽  
Elliot Philofsky ◽  
Lee Kammerdiner
Keyword(s):  
Dielectric Properties ◽  
Substrate Temperature ◽  
Leakage Current ◽  
Rf Sputtering ◽  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Temperature Limit ◽  
Film Deposition ◽  
Processing Temperature ◽  
Device Applications

AbstractMost studies of Ba0.5Sr0.5TiO3 (BST) thin film deposition have focused on chemical vapor deposition or spin-on techniques. Both these techniques require high substrate temperature (greater than 600 °C), either during the deposition or during an anneal after deposition. A few groups have reported on sputtered films, but most of these studies also used high-temperature processes. While such temperatures are compatible with poly-Si plug DRAM and related technologies, they are far above the limits for technologies that require the deposition of non-refractory metals before the deposition of the ceramic film. For example, the use of Al metalization before the deposition of BST would limit the BST processing temperature to about 450 °C. A process compatible with such a temperature limit is reported. Such a process makes fabrication of high quality BST thin films difficult, primarily due to the need for oxidation and grain growth in the ceramic. The leakage current and dielectric properties of BST films deposited in such a process are reported and are shown to be sufficient for practical device applications.

Electron microscopy of pulsed-laser-deposited thin films for tribological applications

1993 ◽  
Vol 51 ◽  
pp. 852-853
Author(s):  
Scott D. Walck ◽  
Jeffrey S. Zabinski ◽  
Michael S. Donley
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Spherical Particles ◽  
Significant Feature ◽  
Great Success ◽  
Deposition Technique ◽  
Coating Materials

Pulsed laser deposition (PLD) is a novel thin film deposition technique which has recently been applied to tribological materials with great success. PLD has several inherent advantages over conventional deposition techniques, including excellent film adhesion, replication of target chemistry, and low film deposition temperature. Because load-bearing materials are typically hardened, heat treated alloys, these properties of PLD are ideally suited for tribological applications. In addition to being a relatively simple deposition technique, considerable processing flexibility is inherent with PLD. Dense, nonporous, stoichiometric films of solid lubricants, such as MoS2, have been grown having long wear lives with low coefficients of friction. Hard coating materials, such as TiC, have been grown at room temperature that were polycrystalline and had excellent wear properties.A significant feature of pulsed laser deposited (PLD) thin films is the incorporation of spherical particles within the films. Figure 1 shows these particles embedded in a film of PLD MoS2 deposited at room temperature.

Electrode effects on the low-frequency dielectric properties of (Ba, Sr)TiO3 thin films prepared by pulsed laser ablation

1999 ◽  
Vol 24 (1-4) ◽  
pp. 33-43 ◽  
Author(s):  
Su-Jae Lee ◽  
Kwang-Yong Kang ◽  
Seok-Kil Han ◽  
Jin-Woo Kim ◽  
Sang-Don Jung
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Laser Ablation ◽  
Low Frequency ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation

Microstructural and Electrical Characterization of Barium Strontium Titanatebased Solid Solution Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition

2002 ◽  
Vol 720 ◽  
Author(s):  
Costas G. Fountzoulas ◽  
Daniel M. Potrepka ◽  
Steven C. Tidrow
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Electrical Characterization ◽  
Field Variable ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Ceramic Substrates ◽  
Nominal Thickness

AbstractFerroelectrics are multicomponent materials with a wealth of interesting and useful properties, such as piezoelectricity. The dielectric constant of the BSTO ferroelectrics can be changed by applying an electric field. Variable dielectric constant results in a change in phase velocity in the device allowing it to be tuned in real time for a particular application. The microstructure of the film influences the electronic properties which in turn influences the performance of the film. Ba0.6Sr0.4Ti1-y(A 3+, B5+)yO3 thin films, of nominal thickness of 0.65 μm, were synthesized initially at substrate temperatures of 400°C, and subsequently annealed to 750°C, on LaAlO3 (100) substrates, previously coated with LaSrCoO conductive buffer layer, using the pulsed laser deposition technique. The microstructural and physical characteristics of the postannealed thin films have been studied using x-ray diffraction, scanning electron microscopy, and nano indentation and are reported. Results of capacitance measurements are used to obtain dielectric constant and tunability in the paraelectric (T>Tc) regime.

Phenethylammonium bismuth halides: from single crystals to bulky-organic cation promoted thin-film deposition for potential optoelectronic applications

2019 ◽  
Vol 7 (36) ◽  
pp. 20733-20741 ◽  
Author(s):  
Mehri Ghasemi ◽  
Miaoqiang Lyu ◽  
Md Roknuzzaman ◽  
Jung-Ho Yun ◽  
Mengmeng Hao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Single Crystals ◽  
Organic Cation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optoelectronic Applications ◽  
Excellent Stability

The phenethylammonium cation significantly promotes the formation of fully-covered thin-films of hybrid bismuth organohalides with low surface roughness and excellent stability.

INK JET PRINTED THIN FILMS ON GLASS AND POLYIMIDE SUBSTRATES

2013 ◽  
Vol 37 (3) ◽  
pp. 873-883 ◽  
Author(s):  
Tsai-Cheng Li ◽  
Rwei-Ching Chang ◽  
Yen-Choung Li
Keyword(s):  
Thin Films ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Electric Resistance ◽  
Ink Jet Printing ◽  
Sputtered Films ◽  
Ink Jet ◽  
Jet Printing ◽  
Conductive Thin Films

Silver conductive thin films deposited on glass and polyimide substrates by using ink jet printing are studied in this work. Characterization of the printed thin films and comparison with sputtered films are investigated. The micro texture, residual stress, adhesion, hardness, optical reflectance, and electric resistance of the thin films are discussed. The result shows that the ink jet printing has the possibility to replace sputtering in thin film deposition, especially for the polymer substrates.

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