A Study of the MBE HgTe Growth Process

1986 ◽  
Vol 90 ◽  
Author(s):  
Roland J. Koestner ◽  
H. F. Schaake
Keyword(s):  
Electron Microscopy ◽  
Growth Process ◽  
Substrate Surface ◽  
Flux Ratio ◽  
Important Application ◽  
Multilayered Structures ◽  
Cross Sectional ◽  
Mbe Growth ◽  
Growth Orientation ◽  
Transmission Electron

ABSTRACTThe MBE growth of HgTe on CdTe is examined over a hundred-fold range in Hg/Te2 flux ratio and over four separate substrate surface orientations [(111)Te, (111)Te-4 degrees, (112)Te and (001)]. The 77K Hall mobility of the (112)Te and (001) oriented HgTe layers approaches the best bulk values reported to date, although our (111)Te and (111)Te-4 deg oriented HgTe films yield much lower values. The growth process is shown to be very far from thermodynamic equilibrium at our optimal substrate temperature and calculated equivalent Hg beam pressure. Important clues to help understand the kinetics governing the HgTe growth process are uncovered by studying the defects that form under Hg- or Te-rich conditions with cross-sectional transmission electron microscopy (XTEM). Since multilayered structures are an important application for MBE growth of Hg-based semiconductors, we have also examined the interfacial roughness present in HgTe-CdTe superlattices (SL) as a function of growth orientation.

MORPHOLOGICAL CONTROL OF GaN BUFFER LAYERS GROWN BY MOLECULAR BEAM EPITAXY ON 6H–SiC(0001)

2000 ◽  
Vol 07 (05n06) ◽  
pp. 565-570 ◽  
Author(s):  
CHANGWU HU ◽  
DAVID J. SMITH ◽  
R. B. DOAK ◽  
I. S. T. TSONG
Keyword(s):  
Electron Microscopy ◽  
Substrate Surface ◽  
Supersonic Jet ◽  
Flux Ratio ◽  
Buffer Layers ◽  
Cross Sectional ◽  
Growth Ratio ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron

The growth of GaN buffer layers of thickness 10–25 nm directly on 6H–SiC (0001) substrates was studied using low energy electron microscopy, atomic force microscopy and cross-sectional transmission electron microscopy. The Ga flux was supplied by an evaporative source, while the NH3 flux came from a seeded beam supersonic jet source. By monitoring the growth in situ and by suitably adjusting the Ga/NH 3 flux ratio, smooth basal-plane-oriented GaN layers were grown on hydrogen-etched SiC substrates at temperatures in the range of 600–700°C. The growth proceeds via nucleation of small flat islands at the step edges of the 6H–SiC (0001) substrate surface. The islands increase in size with a lateral-to-vertical growth ratio of ~10 and eventually coalesce into a quasicontinuous layer. A highly defective substrate surface was found to be detrimental to the growth of flat buffer layers.

Ion thinning of integrated circuit transverse specimens for transmission electron microscopy

1992 ◽  
Vol 50 (2) ◽  
pp. 1426-1427
Author(s):  
F. Shaapur
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Integrated Circuit ◽  
Substrate Surface ◽  
Homogeneous Material ◽  
Material System ◽  
Ion Milling ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Motion Profile

Non-uniform ion-thinning of heterogenous material structures has constituted a fundamental difficulty in preparation of specimens for transmission electron microscopy (TEM). A variety of corrective procedures have been developed and reported for reducing or eliminating the effect. Some of these techniques are applicable to any non-homogeneous material system and others only to unidirectionalfy heterogeneous samples. Recently, a procedure of the latter type has been developed which is mainly based on a new motion profile for the specimen rotation during ion-milling. This motion profile consists of reversing partial revolutions (RPR) within a fixed sector which is centered around a direction perpendicular to the specimen heterogeneity axis. The ion-milling results obtained through this technique, as studied on a number of thin film cross-sectional TEM (XTEM) specimens, have proved to be superior to those produced via other procedures.XTEM specimens from integrated circuit (IC) devices essentially form a complex unidirectional nonhomogeneous structure. The presence of a variety of mostly lateral features at different levels along the substrate surface (consisting of conductors, semiconductors, and insulators) generally cause non-uniform results if ion-thinned conventionally.

Nanomechanical Properties and Nanostructure of CMG and CMP Machined Si Substrates

2008 ◽  
Vol 381-382 ◽  
pp. 525-528 ◽  
Author(s):  
B.L. Wang ◽  
Han Huang ◽  
Jin Zou ◽  
Li Bo Zhou
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Substrate Surface ◽  
Transmission Electron Microscopy Analysis ◽  
Cross Sectional ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Transmission Electron ◽  
Electron Microscopy Analysis

Silicon (100) substrates machined by chemo-mechanical-grinding (CMG) and chemicalmechanical- polishing (CMP) were investigated using atomic force microscopy, cross-sectional transmission electron microscopy and nanoindentation. It was found that the substrate surface after CMG was slightly better than machined by CMP in terms of roughness. The transmission electron microscopy analysis showed that the CMG-generated subsurface was defect-free, but the CMP specimen had a crystalline layer of about 4 nm in thickness on the top of the silicon lattice as evidenced by the extra diffraction spots. Nanoindentation results indicated that there exists a slight difference in mechanical properties between the CMG and CMP machined substrates.

Mbe Growth and Characterization of GaAs thin Films on SiGe Buffer Layers

1988 ◽  
Vol 116 ◽  
Author(s):  
S.M. Prokes ◽  
W.F. Tseng ◽  
B.R. Wilkins ◽  
H. Dietrich ◽  
A. Christou
Keyword(s):  
Electron Microscopy ◽  
Growth Process ◽  
Molecular Beam ◽  
Buffer Layers ◽  
Defect Production ◽  
Cross Sectional ◽  
Mbe Growth ◽  
Step Growth ◽  
Scanning Electron

AbstractEpitaxial SiGe buffers have been formed by the implantation of 74Ge+ ions into Si(100)4° to <011> substrates. The implants were made at 150keV to a dose of 1×1017 /cm2 . The epitaxial layers were characterized by Rutherford backscattering, Raman spectroscopy, and electroreflectance and were found to be 300Å thick having on average a composition of Si0 . 35 Ge0.65. GaAs layers were then grown on these substrates by molecular beam epitaxy, using the standard two-step growth process. The results from Auger, Scanning Electron Microscopy, and Cross-sectional TEM indicate a lower defect production and propagation in these samples, compared to those grown directly on Si.

Structures of Nb/Al2O3 Interfaces Produced by Different Experimental Routes

1990 ◽  
Vol 183 ◽  
Author(s):  
J. Mayer ◽  
W. Mader ◽  
D. Knauss ◽  
F. Ernst ◽  
M. Rühle
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Molecular Beam ◽  
Al Alloy ◽  
Misfit Dislocations ◽  
Orientation Relationships ◽  
Cross Sectional ◽  
Mbe Growth ◽  
Sapphire Substrates ◽  
Transmission Electron

AbstractNb/Al2O3 interfaces were produced by (i) diffusion bonding of single crystalline Nb and Al2O3 at 1973 K, (ii) internal oxidation of a Nb-3at.% Al alloy at 1773 K, and (iii) molecular beam epitaxy (MBE) growth of 500 nm thick Nb overlayers on sapphire substrates at 1123 K. Cross-sectional specimens were prepared and studied by conventional (CTEM) and high resolution transmission electron microscopy (HREM). The orientation relationships between Nb and Al2O3 were identified by diffraction studies. HREM investigations revealed the structures of the different interfaces including the presence of misfit dislocations at or near the interface. The results for the different interfaces are compared.

Microstructure of In-Situ Grown YBa2Cu4O8 Thin Films Deposited by MOCVD

1992 ◽  
Vol 275 ◽  
Author(s):  
K. Uehara ◽  
H. Sakai ◽  
H. Hayashi ◽  
Y. Shiohara ◽  
S. Tanaka
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Substrate Surface ◽  
Film Surface ◽  
Superconducting Thin Films ◽  
Cross Sectional ◽  
Transmission Electron

ABSTRACTHigh-resolution transmission electron microscopy (HREM) has been used to study the microstructures of Y-Ba-Cu-0 superconducting thin films in which the YBa2Cu4O8 phase was the main phase. From cross-sectional observations, the c-normal 123 phase predominated in the film near the substrate surface, while the c-normal 124 phase occupied the region near the film surface. Another remarkable microstructure was that a-normal 123 variants overcame the c-normal 123 region, but the c-normal 124 phase surpassed the a-normal 123 phase in the upper part of the film.

Transmission electron microscopy study of (103)-oriented epitaxial SrBi2Nb2O9 films grown on (111) SrTiO3 and (111) SrRuO3/(111) SrTiO3

2001 ◽  
Vol 16 (2) ◽  
pp. 489-502 ◽  
Author(s):  
M. A. Zurbuchen ◽  
J. Lettieri ◽  
Y. Jia ◽  
D. G. Schlom ◽  
S. K. Streiffer ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Substrate Surface ◽  
Microscopy Study ◽  
Dark Field ◽  
Electron Microscopy Study ◽  
Cross Sectional ◽  
Plan View ◽  
Transmission Electron ◽  
Second Phases

Portions of the same epitaxial (103)-oriented SrBi2Nb2O9 film grown on (111) SrTiO3 for which we recently reported the highest remanent polarization (Pr) ever achieved in SrBi2Nb2O9 (or SrBi2Ta2O9) films, i.e., Pr = 15.7 μC/cm2, have been characterized microstructurally by plan-view and cross-sectional transmission electron microscopy (TEM) along three orthogonal viewing directions. SrBi2Nb2O9 grows with its c axis tilted 57° from the substrate surface normal in a three-fold twin structure about the substrate [111], with the growth twins' c axes nominally aligned with the three 〈100〉 SrTiO3 directions. (103) SrBi2Nb2O9 films with and without an underlying epitaxial SrRuO3 bottom electrode have been studied. Dark-field TEM imaging over a 12 μm2 area shows no evidence of second phases (crystalline or amorphous). A high density of out-of-phase boundaries exists in the films.

Controlled Growth of GaAs/AlAs(111)B Superlattices

1992 ◽  
Vol 263 ◽  
Author(s):  
J.E. Angelo ◽  
J.W. Hoehn ◽  
A.M. Dabiran ◽  
P.I. Cohen ◽  
W.W. Gerberich
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Temperature ◽  
Defect Structure ◽  
Molecular Beam ◽  
Substantial Reduction ◽  
Flux Ratio ◽  
Cross Sectional ◽  
Temperature Growth ◽  
Transmission Electron

ABSTRACTIn this study, transmission electron microscopy (TEM) was used to investigate the growthconditions which produce the highest quality GaAs(111)B films by molecular beam epitaxy (MBE). Low-temperature growth using both As4 and arsine as an As2 source produced highly twinned structures, although the use of As4 provided for a smoother surface and slightly different defect structure. Two distinct twin boundaries, (112)A and (112)B, were identified by cross-sectional transmission electron microscopy (XTEM). The (112)A defect could be over-grown by a subsequent high temperature growth but the roughness associated with the (112)B defects only increased with further growth. High temperature growth of GaAs and AlAs films, while maintaining the GaAs(11)surface reconstruction, resulted in substantial reduction in the number of twins boundaries. We also found that GaAs(111)B layer quality and surface morphology can be further improved by a high temperature growth with low arsenic to Ga flux ratio of I to 1.5 ona slightly misoriented substrate.

Defect Structures of B12As2 Epilayers Grown on c-plane and a-plane 6H-SiC Substrates

2007 ◽  
Vol 994 ◽  
Author(s):  
Hui Chen ◽  
Guan Wang ◽  
Michael Dudley ◽  
Lihua Zhang ◽  
Yimei Zhu ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Intermediate Layer ◽  
Defect Structures ◽  
Cross Sectional ◽  
X Ray ◽  
Growth Orientation ◽  
Transmission Electron ◽  
Visualization Software ◽  
Hrtem Observation ◽  
Plane Sample

AbstractB12As2 epitaxial layers grown on (0001) 6H-SiC and (1120) 6H-SiC substrates have been studied using scanning electron microscopy (SEM), high resolution transmission electron microscopy (HRTEM) and synchrotron white beam x-ray topography (SWBXT) and investigated with the aid of crystal visualization software. SWBXT showed that B12As2 adopted [111] growth orientation, parallel to [0001]SiC, on c-plane 6H-SiC and adopted [101] growth orientation, parallel to [1120]SiC, on a-plane 6H-SiC. However, SWBXT also revealed the twins in both sets of the B12As2 films, consistent with the SEM observation of the surface morphology. Cross-sectional HRTEM also confirmed the presence of twins in both cases and also revealed the existence of an intermediate layer between the c-plane 6H-SiC and the B12As2 film. By correlating the HRTEM observation and crystal visualization, the atomic configurations across the twin boundaries in both samples as well as those in the intermediate layer in the c-plane sample were proposed.

Microstructure of laser-irradiated, conducting Kapton polyimide

1995 ◽  
Vol 53 ◽  
pp. 502-503
Author(s):  
D. L. Callahan ◽  
Z. Ball ◽  
H. M. Phillips ◽  
R. Sauerbrey
Keyword(s):  
Electron Microscopy ◽  
Phase Transition ◽  
Transmission Electron Microscopy ◽  
Cross Section ◽  
Film Surface ◽  
Cross Sectional ◽  
General Utility ◽  
Transmission Electron ◽  
Considerable Debate ◽  
Potential Applications

Ultraviolet laser-irradiation can be used to induce an insulator-to-conductor phase transition on the surface of Kapton polyimide. Such structures have potential applications as resistors or conductors for VLSI applications as well as general utility electrodes. Although the percolative nature of the phase transformation has been well-established, there has been little definitive work on the mechanism or extent of transformation. In particular, there has been considerable debate about whether or not the transition is primarily photothermal in nature, as we propose, or photochemical. In this study, cross-sectional optical microscopy and transmission electron microscopy are utilized to characterize the nature of microstructural changes associated with the laser-induced pyrolysis of polyimide.Laser-modified polyimide samples initially 12 μm thick were prepared in cross-section by standard ultramicrotomy. Resulting contraction in parallel to the film surface has led to distortions in apparent magnification. The scale bars shown are calibrated for the direction normal to the film surface only.

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