scholarly journals Performance Analysis of Double Gate Dielectric Modulation In Schottky FET As Biomolecule Sensor

Author(s):  
Prasahanth Kumar

Abstract In this article, a charge-plasma (CP)-based double gate schottky barrier FET structure has been investigated using dielectric controlled biomolecule sensor. The use of Hafnium as a charge plasma at the source side encourages an n+ charge plasma in an un-doped silicon region, which expressively decreases the Schottky barrier thickness. The oxide below the Metal gate M1 and M2 is etched out to create nanogap openings for biomolecule finding. Here, the existence of molecules is categorized by the modification in oxide material inside the nanogap and the related charge densities, hence, to controls the tunneling thickness at the Metal-source-silicon channel interface, also with the help of plasma charges in an intrinsic-Si film. This paper is mainly focused on the fundamental physics of the proposed structure and approximations of their relative sensitivity detecting enactment. The sensing enactment has been assessed for charged biomolecules and charge-neutral biomolecules by widespread device simulation, and the special properties of the biomolecule. The proposed device improves its control over the tunneling region and this has been used for the sensing, ensuing to larger on-state drain current (Ids) sensitivity for biomolecule. Hence, the gate voltage is recognised as the active design parameters for efficient reduction. Moreover, the sensing of the SB FET-based biosensor threshold voltage (Vth), abnormality in the on-current (Ion), and Ion/Ioff ratio has been shown. Also, the charge-plasma (CP)-based double gate schottky barrier FET simulations calibrated with experimental results. Hence, the relative change in Ion using charge-plasma (CP)-based double gate schottky barrier FET biosensor maintain improved detecting ability for biomolecule recognition.

2019 ◽  
Vol 18 (3) ◽  
pp. 906-917
Author(s):  
Adhithan Pon ◽  
Arkaprava Bhattacharyya ◽  
B. Padmanaban ◽  
R. Ramesh

2006 ◽  
Vol 16 (01) ◽  
pp. 325-350
Author(s):  
FRANCISCO J. GARCIA-SANCHEZ ◽  
ADELMO ORTIZ-CONDE ◽  
JUAN MUCI

Novel analytic modeling approaches for undoped body symmetric double gate MOSFETs are discussed starting with an explicit analytic description of the surface potential using a Lambert W Function type of solution. A conceptual definition of threshold for undoped body devices is used to illustrate its unusual behavior as a function of gate dielectric thickness. Finally an analytic fully consistent physical and continuous drain current description is discussed. It is based on the potentials at the surface and at the center of the silicon film evaluated at source and drain ends. It includes drift and diffusion contributions and is valid for all bias conditions, from subthreshold to strong inversion and from linear to saturation operation.


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