scholarly journals Исследования фоточувствительности узкозонных и бесщелевых твердых растворов HgCdTe в терагерцовом и субтерагерцовом диапазоне частот

2020 ◽  
Vol 54 (9) ◽  
pp. 906
Author(s):  
В.В. Румянцев ◽  
К.В. Маремьянин ◽  
А.А. Разова ◽  
С.М. Сергеев ◽  
Н.Н. Михайлов ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Response Time ◽  
Solid Solutions ◽  
Terahertz Radiation ◽  
Molecular Beam ◽  
Cadmium Concentration ◽  
Epitaxial Layers ◽  
Narrow Gap ◽  
Frequency Range ◽  
Characteristic Response

Abstract The photoresponse is investigated in the frequency range of 0.15–15 THz in HgCdTe epitaxial layers with a cadmium concentration from 15.2 to 19.2% grown by molecular-beam epitaxy. It is shown that narrow-gap and gapless HgCdTe solid solutions can be used as detectors of both terahertz and sub-terahertz radiation with a characteristic response time of 2–4 ns and with a sensitivity approaching n -InSb-based detectors widely used in this range.

scholarly journals Выращивание слоев GaAs-=SUB=-1-x-=/SUB=-Bi-=SUB=-x-=/SUB=- методом молекулярно-лучевой эпитаксии

2022 ◽  
Vol 56 (3) ◽  
pp. 279
Author(s):  
Б.Р. Семягин ◽  
А.В. Колесников ◽  
М.А. Путято ◽  
В.В. Преображенский ◽  
Т.Б. Попова ◽  
...  
Keyword(s):  
Optical Properties ◽  
Molecular Beam Epitaxy ◽  
Substrate Temperature ◽  
Solid Solutions ◽  
Molecular Beam ◽  
Epitaxial Layers ◽  
Structural And Optical Properties ◽  
Bismuth Content

By molecular-beam epitaxy we have grown epitaxial layers of GaAs1-xBix solid solutions with a bismuth content of 0 < x < 0.02. Structural and optical properties of the layers were investigated. We determine the influence of the bismuth flux and substrate temperature on the bismuth incorporation into the growing layers.

Epitaxial Solid-Solution Films of Immiscible MgO and CaO

1994 ◽  
Vol 341 ◽  
Author(s):  
E. S. Hellman ◽  
E. H. Hartford
Keyword(s):  
Solid Solution ◽  
Molecular Beam Epitaxy ◽  
Lattice Constant ◽  
Solid Solutions ◽  
Molecular Beam ◽  
Building Blocks ◽  
Layer Growth ◽  
Growth Mode ◽  
Miscibility Gap ◽  
Layer By Layer

AbstractMetastable solid-solutions in the MgO-CaO system grow readily on MgO at 300°C by molecular beam epitaxy. We observe RHEED oscillations indicating a layer-by-layer growth mode; in-plane orientation can be described by the Matthews theory of island rotations. Although some films start to unmix at 500°C, others have been observed to be stable up to 900°C. The Mgl-xCaxO solid solutions grow despite a larger miscibility gap in this system than in any system for which epitaxial solid solutions have been grown. We describe attempts to use these materials as adjustable-lattice constant epitaxial building blocks

Nitrogen-Passivation Effects of Si Substrates on Properties of ZnO Epitaxial Layers Grown by Plasma-Assisted Molecular Beam Epitaxy

2010 ◽  
Vol 56 (3) ◽  
pp. 827-831 ◽  
Author(s):  
Jae-Young Leem ◽  
Min Su Kim ◽  
Ghun Sik Kim ◽  
Min Young Cho ◽  
Do Yeob Kim ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Epitaxial Layers ◽  
Si Substrates

Influence of Off-Oriented Substrates on Heteroepitaxial Growth of (Ca, Sr)F2 Layers on Si (100)

1989 ◽  
Vol 160 ◽  
Author(s):  
Tetsuroh Minemura ◽  
Junko Asano ◽  
Kazuo Tsutsui ◽  
Seijiro Furukawa
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Epitaxial Layers ◽  
Considerable Influence ◽  
Heteroepitaxial Growth ◽  
Remarkable Effect

AbstractHeteroepitaxial growth of CaxSr1-xF2 layers on Si (100) substrates by molecular beam epitaxy has been investigated for GaAs / fluoride / Si structures. The Si (100) substrates off-oriented toward [011] show no considerable influence on crystallinity of CaF2 and SrF2 epitaxial layers. The off - oriented substrates, however, influence a remarkable effect on CaxSr1-xF2 layers, resulting in poor crystallinity rather than good one. This influence of off-oriented Si (100) substrates on the heteroepitaxy of CaxSr1-xF2 layers was the opposite of that found in GaAs/Si (100) structures.

HOPPING MAGNETOTRANSPORT IN THE δ-DOPING LAYER

1994 ◽  
Vol 08 (07) ◽  
pp. 789-800 ◽  
Author(s):  
F. Koch
Keyword(s):  
Molecular Beam Epitaxy ◽  
Magnetic Flux ◽  
Molecular Beam ◽  
Negative Magnetoresistance ◽  
Epitaxial Layers ◽  
Interference Effects ◽  
Hopping Transport ◽  
Coherent Superposition ◽  
Planar Arrays

We review the observations on hopping transport in planar arrays of Si donor atoms in GaAs epitaxial layers grown by molecular beam epitaxy. It is shown that properly designed δ-doping layers permit one to unambigously identify interference effects that result from the coherent superposition of the tunneling amplitudes along alternative paths in the plane. Magnetic flux through the area generated by the paths destroys the interference and leads to negative magnetoresistance. We discuss the observed non-monotonic variation of the resistance.

scholarly journals Exciton spectra of ZnO epitaxial layers on lattice-matched substrates grown with laser-molecular-beam epitaxy

2000 ◽  
Vol 76 (24) ◽  
pp. 3549-3551 ◽  
Author(s):  
T. Makino ◽  
C. H. Chia ◽  
N. T. Tuan ◽  
Y. Segawa ◽  
M. Kawasaki ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Epitaxial Layers ◽  
Laser Molecular Beam Epitaxy ◽  
Lattice Matched

Development of AlAsSb as a barrier material for ultra-thin-channel InGaAs nMOSFETs

2013 ◽  
Vol 1561 ◽  
Author(s):  
Cheng-Ying Huang ◽  
Jeremy J. M. Law ◽  
Hong Lu ◽  
Mark J. W. Rodwell ◽  
Arthur C. Gossard
Keyword(s):  
Molecular Beam Epitaxy ◽  
Carrier Concentration ◽  
Electron Mobility ◽  
Molecular Beam ◽  
Epitaxial Layers ◽  
Barrier Material ◽  
Double Heterostructures ◽  
Thin Channel ◽  
Si Doped ◽  
Lattice Matched

ABSTRACTWe investigated AlAs0.56Sb0.44 epitaxial layers lattice-matched to InP grown by molecular beam epitaxy (MBE). Silicon (Si) and tellurium (Te) were studied as n-type dopants in AlAs0.56Sb0.44 material. Similar to most Sb-based materials, AlAs0.56Sb0.44 demonstrates a maximum active carrier concentration around low-1018 cm-3 when using Te as a dopant. We propose the use of a heavily Si-doped InAlAs layer embedded in the AlAsSb barrier as a modulation-doped layer. The In0.53Ga0.47As/AlAs0.56Sb0.44 double heterostructures with a 10 nm InGaAs well show an electron mobility of about 9400 cm2/V・s at 295 K and 32000 cm2/V・s at 46 K. A thinner 5 nm InGaAs well has an electron mobility of about 4300 cm2/V・s at 295 K. This study demonstrates that AlAs0.56Sb0.44 is a promising barrier material for highly scaled InGaAs MOSFETs and HEMTs.

Growth mode of AlN epitaxial layers on 6H-SiC by plasma assisted molecular beam epitaxy

2000 ◽  
Vol 209 (2-3) ◽  
pp. 415-418 ◽  
Author(s):  
Gabriel Ferro ◽  
Hajime Okumura ◽  
Sadafumi Yoshida
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Growth Mode ◽  
Epitaxial Layers
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