Изучение микроструктуры кристаллов Si, подвергнутых облучению быстрыми Н-=SUP=-+-=/SUP=--ионами и термообработке, методами высокоразрешающей трехкристальной рентгеновской дифрактометрии и электронной просвечивающей микроскопии
Keyword(s):
X Ray
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The structural features of the formation of radiation defects in proton-implanted layers of silicon wafers during their heat treatment are studied. New data on the nature, characteristics and concentration of microdefects in Si crystals irradiated with protons with energies of 100+200+300 Kev, with a total dose of 2·1016 ion/cm2, and the evolution of the defective structure during heat treatment in a wide temperature range from 200 to 1100°C were obtained from the analysis of the results of studies by high-resolution three-crystal X-ray diffractometry and transmission electron microscopy. This work was supported by the Ministry of Science and Higher Education within the State assignment FSRC «Crystallography and Photonics» RAS.
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