scholarly journals Механизмы возникновения напряжений в тонких пленках и покрытиях

2020 ◽  
Vol 90 (12) ◽  
pp. 1971
Author(s):  
А.Р. Шугуров ◽  
А.В. Панин
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Chemical Composition ◽  
Phase Transformations ◽  
Stress Generation ◽  
Amorphous Films ◽  
Misfit Stress ◽  
Crystal Lattices ◽  
Generation Mechanisms ◽  
Deposition Conditions

The paper considers current conceptions of generation of mechanical stresses in epitaxial, polycrystalline and amorphous films during their growth and under different external actions. The mechanism of stress generation in geteroepitaxial films due to misfit in crystal lattices of the film and substrate is described. The relation between arising of the misfit stress in heterostructures and variation of their growth mode is shown. The mechanisms of generation of compressive and tensile stresses in polycrystalline films caused by nucleation and coalescence of islands at the beginning of their growth are considered. Different aspects of evolution of intrinsic stresses in continuous films are discussed in dependence of their deposition conditions, chemical composition, microstructure and mechanical properties. Special attention is given to consideration of generation mechanisms of intrinsic stresses in thin films concerned with formation of pint defects, incorporation of impurities and phase transformations during deposition. Factors leading to arising extrinsic stresses in thin films during their storage and operation are described in details.

The Influence of Deposition Conditions on the Properties of a-Sic:H Thin Films

1990 ◽  
Vol 192 ◽  
Author(s):  
L. Magafas ◽  
D. Girginoudi ◽  
N. Georgoulas ◽  
A. Thanailakis
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Optical Absorption ◽  
Flow Rate ◽  
Growth Conditions ◽  
Optical Absorption Coefficient ◽  
Hydrogen Flow Rate ◽  
Hydrogen Flow ◽  
Composition Structure ◽  
Deposition Conditions

ABSTRACTThe dependence of chemical composition, structure and optoelectronic properties of sputtered a-SiC:H thin films on substrate temperature, Ts, and hydrogen flow rate has been studied. The films are amorphous for the growth conditions used in this work. The chemical composition of the alloys is very little influenced by the Ts, whereas the hydrogen content and the optical absorption coefficient depends strongly on Ts and hydrogen flow rate.

Formation of structural parameters and mechanical properties of multi-element coatings based on niobium nitride under different deposition conditions

2021 ◽  
pp. 67-72
Author(s):  
V.P. Tabakov ◽  
A.V. Chikhranov ◽  
Ya.A. Dolzhenko
Keyword(s):  
Mechanical Properties ◽  
Phase Composition ◽  
Chemical Composition ◽  
Deposition Temperature ◽  
Chemical Elements ◽  
Structural Parameters ◽  
Niobium Nitride ◽  
Wear Resistant ◽  
Wear Resistant Coatings ◽  
Deposition Conditions

The results of the dependence of the chemical composition of coatings based on niobium nitride on the layout of the installation are presented. The effect of the chemical elements content in coatings based on niobium nitride on the phase composition, structural parameters and mechanical properties is determined. The effect of the deposition temperature of coatings on the mechanical properties of wear-resistant coatings is studied.

scholarly journals Structure and Mechanical Properties of Explosive Welded Mg/Al Bimetal/ Struktura I Właściwości Mechaniczne Połączenia Uzyskanego Metodą Zgrzewania Wybuchowego Bimetalu Mg/Al

2014 ◽  
Vol 59 (4) ◽  
pp. 1593-1597 ◽  
Author(s):  
D. Balga ◽  
D. Ostroushko ◽  
K. Saksl ◽  
E. Mazancová ◽  
O. Milković
Keyword(s):  
Mechanical Properties ◽  
Solid Solution ◽  
Phase Composition ◽  
Chemical Composition ◽  
Phase Transformations ◽  
Explosion Welding ◽  
Lattice Parameters ◽  
Diffraction Experiment ◽  
X Ray ◽  
Cubic Phases

Abstract In the article we analyzed shape, local mechanical properties, chemical and phase composition of Magnesium/Aluminium cladded material prepared by explosion welding. In particular we focus our investigation on Mg/Al interface and areas close to the joint. Hardness of the joined materials measured far from their interface is similar for both materials, however in the region of interface the hardness drops down by 40%. Phase transformations in the interface was examined by a hard X-ray micro-diffraction experiment performed at beamline P07 at PETRA III at the energy of 99 keV which helped us identify in Al: fcc-Al, Al2Cu tetragonal and Al7Cu2Fe tetragonal and in Mg: hcp-Mg, Mg2Si cubic phases. In the interface we haven’t observed any new intermetallics, but computation of lattice parameters and profiles of Al and Mg peaks proved an existence of solid solution with different gradient of chemical composition.

scholarly journals Mechanical Behaviour and Corrosion Performance of Thin Film Magnesium WE Alloys

2011 ◽  
Vol 690 ◽  
pp. 286-289 ◽  
Author(s):  
Kristina Schlüter ◽  
Julia Reverey ◽  
Norbert Hort ◽  
Christiane Zamponi ◽  
Eckhard Quandt
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Mechanical Behaviour ◽  
Corrosion Behaviour ◽  
Tensile Tests ◽  
Localized Corrosion ◽  
Nominal Composition ◽  
Corrosion Performance ◽  
Corrosion Tests ◽  
Deposition Conditions

Mg based thin films are of increasing interest due to the potential in varying the corrosion properties in comparison to bulk alloys of the same nominal composition. In this work the mechanical behaviour and the corrosion performance of sputtered thin films consisting of magnesium alloys with the compositions Mg4Y3Gd and Mg4Y3Nd were investigated by tensile tests and electrochemical corrosion tests, respectively. The tensile tests showed that the sputtering parameters have an enormous influence on the mechanical properties of the thin films. By variation of the Ar sputtering pressure and the DC sputtering power it was possible to fabricate films with widely varying mechanical behaviour reaching from brittle to very ductile films which could be strained to more than 30%. The determined dependency between mechanical properties and deposition conditions was found to be present in both investigated alloys. The corrosion tests revealed that the corrosion behaviour of the investigated samples is not correlated to the mechanical properties of the thin films, as the rate of corrosion and the tendency to localized corrosion do not change significantly upon the deposition conditions, which dramatically influence the mechanical properties.

Stress generation mechanisms in carbon thin films grown by ion-beam deposition

2003 ◽  
Vol 51 (17) ◽  
pp. 5211-5222 ◽  
Author(s):  
Sulin Zhang ◽  
Harley T. Johnson ◽  
Gregory J. Wagner ◽  
Wing Kam Liu ◽  
K.Jimmy Hsia
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Stress Generation ◽  
Ion Beam Deposition ◽  
Carbon Thin Films ◽  
Generation Mechanisms ◽  
Beam Deposition

Synthesis of MAX Phase (Cr,V)2AlC Thin Films

2013 ◽  
Vol 750 ◽  
pp. 1-6
Author(s):  
Z.M. Sun ◽  
Tsutomu Sonoda ◽  
Hitoshi Hashimoto ◽  
Akihiro Matsumoto
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Cross Sections ◽  
Room Temperature ◽  
Elevated Temperatures ◽  
Max Phase ◽  
Amorphous Films ◽  
Flat Surfaces ◽  
Substrate Temperatures ◽  
Si Wafer

Multiple target magnetron sputtering technique was employed for the deposition of (Cr,V)2AlC thin films, on the substrate of Si wafer at temperatures ranging from ambient to 840 K. The chemical composition and crystal structure of the deposited thin films were analyzed, surfaces as well the cross sections observed. The experimental results demonstrated that the temperature of the substrate does not affect the chemical composition of the deposited thin films. Deposition at room temperature or moderate elevated temperatures was found to result in amorphous films, whereas crystalline MAX phase thin films were obtained at high temperature. The transition of the substrate temperature was found to be around 743 K. The thin films deposited at temperatures below the transition showed the featureless flat surfaces. At high substrate temperatures, crystalline MAX thin films were formed. When deposited at temperatures near the transition, amorphous/nanocrystalline double layer thin films were deposited.

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