scholarly journals Влияние образования силицидов на удельное сопротивление кремния

2019 ◽  
Vol 45 (7) ◽  
pp. 49
Author(s):  
Б.Е. Умирзаков ◽  
Д.А. Ташмухамедова ◽  
Г.Х. Аллаярова ◽  
Ж.Ш. Содикжанов
Keyword(s):  
Thin Films ◽  
Layer Thickness ◽  
Bulk Resistance ◽  
Silicide Film ◽  
Nickel Silicides ◽  
P Type ◽  
First Time

AbstractThe effect of the formation of thin films of nickel silicides on the migration of intrinsic p -type impurities in silicon was studied for the first time. It was found that bulk resistance $${{\rho }_{{v}}}$$ of a single Si crystal increases by a factor of 3–4 if  a NiSi_2 film with thickness θ ≥ 50–100 Å forms on its surface. This is attributable to the migration of boron atoms toward the silicide film. The Si layer thickness enabling measurable boron migration was estimated at 800–1000 Å.

scholarly journals Thermoresistive properties of p-type 3C–SiC nanoscale thin films for high-temperature MEMS thermal-based sensors

RSC Advances ◽  
2015 ◽  
Vol 5 (128) ◽  
pp. 106083-106086 ◽  
Author(s):  
Toan Dinh ◽  
Hoang-Phuong Phan ◽  
Takahiro Kozeki ◽  
Afzaal Qamar ◽  
Takahiro Namazu ◽  
...  
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Glass Substrate ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Single Crystalline ◽  
P Type ◽  
First Time ◽  
Si Wafer

We report for the first time the thermoresistive property of p-type single crystalline 3C–SiC (p-3C–SiC), which was epitaxially grown on a silicon (Si) wafer, and then transferred to a glass substrate using a Focused Ion Beam (FIB) technique.

Structure and Optical Properties of Ca Silicide Films and Si/Ca3Si4/Si(111) Heterostructures

2014 ◽  
Vol 213 ◽  
pp. 71-79 ◽  
Author(s):  
Nikolay Gennadievich Galkin ◽  
Dmitrii Aleksandrovich Bezbabnyi ◽  
Sergei Andreevich Dotsenko ◽  
Konstantin Nikolaevich Galkin ◽  
Igor Mikhailovich Chernev ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Optical Properties ◽  
Interband Transition ◽  
Ex Situ ◽  
Silicide Film ◽  
First Time ◽  
Phonon Structure

Thick, thin films and island of Ca silicide have been grown by Ca deposition onto 500 °C Si (111)7x7 substrates. The crystal structure of the grown layers strongly differs from the known Ca silicides (Ca2Si, CaSi, Ca5Si3, Ca14Si19, CaSi2). The phonon peaks at 389 and 416 cm-1 and the interband transition peaks (0.9-1.0, 1.3-1.7 and 2.0-2.5 eV) belongs to another silicide - Ca3Si4. Peculiarities of crystal, electronic, and phonon structure and optical properties of the grown Ca silicide films were measured by in situ and ex situ methods permit to state that the formed Ca silicide film has a composition Ca3Si4. Heterostructures with embedded Ca3Si4 films with different thicknesses have been formed atop the Ca3Si4 films by MBE and SPE at 500 °C. The observed density of pinholes with different sizes suggests the Si growth atop the Ca silicide follows a 3D mechanism. Photoluminescence was found first time in Si/Ca3Si4/Si (111) heterostructures.

Thermodynamics and Microstructure Development in the Thin Film Reaction of Aluminum on Silicon Carbide

1995 ◽  
Vol 403 ◽  
Author(s):  
T. S. Hayes ◽  
F. T. Ray ◽  
K. P. Trumble ◽  
E. P. Kvam
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Silicon Carbide ◽  
Ohmic Contacts ◽  
Microstructure Development ◽  
P Type ◽  
Microstructural Studies

AbstractA refined thernodynamic analysis of the reaction between molen Al and SiC is presented. The calculations indicate much higher Si concentrations for saturation with respect to AkC 3 formation than previously reported. Preliminary microstructural studies confirm the formation of interfacial A14C3 for pure Al thin films on SiC reacted at 9000C. The implications of the calculations and experimental observations for the production of ohmic contacts to p-type SiC are discussed.

scholarly journals Impact of ferromagnetic layer thickness on the spin pumping in Co60Fe20B20/Ta bilayer thin films

2021 ◽  
Author(s):  
Soumyarup Hait ◽  
Sajid Husain ◽  
Nanhe Kumar Gupta ◽  
Nilamani Behera ◽  
Ankit Kumar ◽  
...  
Keyword(s):  
Thin Films ◽  
Layer Thickness ◽  
Ferromagnetic Layer ◽  
Spin Pumping

Tunable optical and electrical properties of p-type Cu2O thin films

2021 ◽  
Author(s):  
Daniel A. Fentahun ◽  
Alekha Tyagi ◽  
Sugandha Singh ◽  
Prerna Sinha ◽  
Amodini Mishra ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Optical And Electrical Properties ◽  
Cu2o Thin Films ◽  
P Type

scholarly journals A novel and potentially scalable CVD-based route towards SnO2:Mo thin films as transparent conducting oxides

2021 ◽  
Author(s):  
Tianlei Ma ◽  
Marek Nikiel ◽  
Andrew G. Thomas ◽  
Mohamed Missous ◽  
David J. Lewis
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Mixed Valence ◽  
Chemical Vapour ◽  
X Ray Diffraction ◽  
X Ray ◽  
Conducting Oxides ◽  
Valence States ◽  
3 Omega ◽  
First Time

AbstractIn this report, we prepared transparent and conducting undoped and molybdenum-doped tin oxide (Mo–SnO2) thin films by aerosol-assisted chemical vapour deposition (AACVD). The relationship between the precursor concentration in the feed and in the resulting films was studied by energy-dispersive X-ray spectroscopy, suggesting that the efficiency of doping is quantitative and that this method could potentially impart exquisite control over dopant levels. All SnO2 films were in tetragonal structure as confirmed by powder X-ray diffraction measurements. X-ray photoelectron spectroscopy characterisation indicated for the first time that Mo ions were in mixed valence states of Mo(VI) and Mo(V) on the surface. Incorporation of Mo6+ resulted in the lowest resistivity of $$7.3 \times 10^{{ - 3}} \Omega \,{\text{cm}}$$ 7.3 × 10 - 3 Ω cm , compared to pure SnO2 films with resistivities of $$4.3\left( 0 \right) \times 10^{{ - 2}} \Omega \,{\text{cm}}$$ 4.3 0 × 10 - 2 Ω cm . Meanwhile, a high transmittance of 83% in the visible light range was also acquired. This work presents a comprehensive investigation into impact of Mo doping on SnO2 films synthesised by AACVD for the first time and establishes the potential for scalable deposition of SnO2:Mo thin films in TCO manufacturing. Graphical abstract

scholarly journals Giant Tuning of Electronic and Thermoelectric Properties by Epitaxial Strain in p-Type Sr-Doped LaCrO3 Transparent Thin Films

2021 ◽  
Author(s):  
Dong Han ◽  
Rahma Moalla ◽  
Ignasi Fina ◽  
Valentina M. Giordano ◽  
Marc d’Esperonnat ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermoelectric Properties ◽  
Epitaxial Strain ◽  
P Type

scholarly journals Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films

Surfaces ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 106-114
Author(s):  
Yannick Hermans ◽  
Faraz Mehmood ◽  
Kerstin Lakus-Wollny ◽  
Jan P. Hofmann ◽  
Thomas Mayer ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Fast Method ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Post Annealing ◽  
Rf Signal ◽  
First Time

Thin films of ZnWO4, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO4 thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO4 thin films.

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