A Comprehensive Analysis Methodology for Gate Oxide Integrity Failure Using Combined FA Techniques

2011 ◽  
Author(s):  
Hua Younan ◽  
Nistala Ramesh Rao ◽  
Chen Shuting ◽  
Zhu Lei ◽  
Chia Chin Ning ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Detection Limit ◽  
Failure Analysis ◽  
Gate Oxide ◽  
Comprehensive Analysis ◽  
New Method ◽  
Analysis Methodology ◽  
Icp Ms ◽  
Wide Range ◽  
Gate Oxide Integrity

Abstract In this paper, a comprehensive analysis methodology for gate oxide integrity (GOI) failure using combined FA techniques is proposed. The current method integrates the failure analysis flow we previously reported with a new flow proposed in this paper. The method is applicable to a wide range of GOI failure cases and has been used in analyzing many product wafers with GOI failure. In particular, there is one wafer with GOI failure that results from known failed process machines. This wafer could be readily analyzed with this new method to identify the root causes. The newly proposed flow is based on our previous report on GOI failure analysis, but the detection limit of contamination elements was significantly improved. The enhancement of detection limit is mainly attributable to the utilization of Vapor Phase Decomposition and Inductively Coupled Plasma Mass Spectrometry (VPD ICP-MS). The ICP-MS technique is highly sensitive and capable of simultaneously measuring a large number of elements at very low concentration level in the range of ppb (part per billion) to ppt (part to trillion). This enhanced sensitivity enables effective investigation of contamination caused by specific machines. A case study of GOI failure investigated by the proposed new method will be discussed in detail. In the study, Al, Fe, Mo and Sn contamination from a suspected tool were detected by ICPMS, followed by confirmation by Secondary Ion Mass Spectrometry (SIMS) on the affected product wafers. Failurepart isolation investigations of the affected diffusion furnace revealed that the root cause of the failure is due to a defective gas flow valve.

A New Failure Analysis Flow of Gate Oxide Integrity Failure in Wafer Fabrication

2009 ◽  
Author(s):  
Hua Younan ◽  
Chu Susan ◽  
Gui Dong ◽  
Mo Zhiqiang ◽  
Xing Zhenxiang ◽  
...  
Keyword(s):  
Failure Analysis ◽  
Gate Dielectric ◽  
Dielectric Breakdown ◽  
Defect Density ◽  
Gate Oxide ◽  
Oxide Thickness ◽  
Fault Isolation ◽  
Wafer Fabrication ◽  
Root Cause ◽  
Gate Oxide Integrity

Abstract As device feature size continues to shrink, the reducing gate oxide thickness puts more stringent requirements on gate dielectric quality in terms of defect density and contamination concentration. As a result, analyzing gate oxide integrity and dielectric breakdown failures during wafer fabrication becomes more difficult. Using a traditional FA flow and methods some defects were observed after electrical fault isolation using emission microscopic tools such as EMMI and TIVA. Even with some success with conventional FA the root cause was unclear. In this paper, we will propose an analysis flow for GOI failures to improve FA’s success rate. In this new proposed flow both a chemical method, Wright Etch, and SIMS analysis techniques are employed to identify root cause of the GOI failures after EFA fault isolation. In general, the shape of the defect might provide information as to the root cause of the GOI failure, whether related to PID or contamination. However, Wright Etch results are inadequate to answer the questions of whether the failure is caused by contamination or not. If there is a contaminate another technique is required to determine what the contaminant is and where it comes from. If the failure is confirmed to be due to contamination, SIMS is used to further determine the contamination source at the ppm-ppb level. In this paper, a real case of GOI failure will be discussed and presented. Using the new failure analysis flow, the root cause was identified to be iron contamination introduced from a worn out part made of stainless steel.

scholarly journals A simplified isotope dilution approach for the U-Pb dating of speleogenic and other low-<sup>232</sup>Th carbonates by multi-collector ICP-MS

2021 ◽  
Author(s):  
Andrew J. Mason ◽  
Anton Vaks ◽  
Sebastian F. M. Breitenbach ◽  
John N. Hooker ◽  
Gideon M. Henderson
Keyword(s):  
Mass Spectrometry ◽  
Isotope Dilution ◽  
Inductively Coupled Plasma ◽  
New Method ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Plasma Mass Spectrometry

Abstract. We describe a new method for the measurement of U/Pb ratios by isotope dilution multi-collector inductively coupled plasma mass spectrometry (MC-ICP-MS) for the dating of geologically young clean carbonates, particularly speleothems. The method is intended for materials containing little or no initial 232Th. We illustrate and validate the method with four examples ranging from 0.57 Ma to 20 Ma old. The new method is capable of applying the 235U-207 and 238U-234U-206Pb chronometers, common Pb and quantifiable residual 234U/238U disequilibrium permitting. These provide an alternative to the more widely used 238U-206Pb chronometer, which can be highly inaccurate for samples a few million years old, owing to uncertainties in the excess initial 234U (hence, excess radiogenic 206Pb) commonly observed in speleothems.

Inductively Coupled Plasma-Mass Spectrometry (ICP-MS) and Laser Ablation Inductively Coupled Plasma-Mass Spectrometry (LA-ICP-MS)

2016 ◽  
pp. 398-423 ◽  
Author(s):  
Mark Golitko ◽  
Laure Dussubieux
Keyword(s):  
Mass Spectrometry ◽  
Laser Ablation ◽  
Inductively Coupled Plasma ◽  
Chemical Information ◽  
Ceramic Surface ◽  
Mineralogical Characterization ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Wide Range ◽  
Plasma Mass Spectrometry

Inductively Coupled Plasma Mass Spectrometry (ICP-MS) is a versatile technique capable of measuring nearly every element on the Periodic Table down to extremely low concentrations. Using liquid sampling, it is a powerful method for bulk compositional characterization but has been only sporadically applied to archaeological ceramic studies. With laser ablation sampling, ICP-MS can be used to produce spatially resolved chemical information and has a wide range of archaeological applications including the analysis of ceramic surface treatments, paste composition, temper composition, and identification of post-burial chemical alteration. ICP-MS and LA-ICP-MS are particularly valuable when used in conjunction with bulk and mineralogical characterization techniques to elucidate which potential cultural, geological, or environmental effects are responsible for bulk compositional patterning, as well as providing complimentary compositional provenance information for individual phases of ceramic paste.

Rapid, versatile and sensitive method for the quantification of radium in environmental samples through cationic extraction and inductively coupled plasma mass spectrometry

2018 ◽  
Vol 33 (6) ◽  
pp. 1031-1040 ◽  
Author(s):  
Claire Dalencourt ◽  
Annie Michaud ◽  
Azza Habibi ◽  
Alexa Leblanc ◽  
Dominic Larivière
Keyword(s):  
Mass Spectrometry ◽  
Detection Limit ◽  
Environmental Samples ◽  
Inductively Coupled Plasma ◽  
Selective Method ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Cationic Resin ◽  
Plasma Mass Spectrometry ◽  
Sensitive Method

Rapid and selective method for radium quantification with interference removal by cationic resin and ICP-MS/MS, leading to a detection limit of 10 fg L−1 for 226Ra and 228Ra.

scholarly journals Quantitation of intracellular zidovudine phosphates by use of combined cartridge-radioimmunoassay methodology.

1996 ◽  
Vol 40 (11) ◽  
pp. 2651-2654 ◽  
Author(s):  
B L Robbins ◽  
B H Waibel ◽  
A Fridland
Keyword(s):  
Detection Limit ◽  
New Method ◽  
Pharmacokinetic Studies ◽  
Clinical Method ◽  
Drug Concentrations ◽  
Wide Range

This report describes the development of a potentially clinical method to measure the cellular metabolites of zidovudine (ZDV) in patients receiving the drug. This new method combines the use of Sep-Pak cartridges to separate ZDV phosphates with radioimmunoassaying to quantitate ZDV. The detection limit is 0.02 pmol/10(6) cells, and this assay can measure a wide range of intracellular drug concentrations. The use of the cartridge-radioimmunoassay methodology should prove very useful for in vivo cellular pharmacokinetic studies of ZDV.

Unraveling the mechanism and impact of oxide production in LA-ICP-MS by comprehensive analysis of REE-Th-U phosphates

2017 ◽  
Vol 32 (10) ◽  
pp. 2003-2010 ◽  
Author(s):  
Keita Itano ◽  
Tsuyoshi Iizuka
Keyword(s):  
Mass Spectrometry ◽  
Laser Ablation ◽  
Trace Element ◽  
Inductively Coupled Plasma ◽  
Comprehensive Analysis ◽  
Inductively Coupled ◽  
Oxide Production ◽  
Icp Ms ◽  
Isotopic Analyses ◽  
Plasma Mass Spectrometry

Oxide interference can be problematic for trace element and isotopic analyses using laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS).

Strontium isotopic analysis of environmental microsamples by inductively coupled plasma - tandem mass spectrometry

2022 ◽  
Author(s):  
Stefano Bertinetti ◽  
Eduardo Bolea-Fernandez ◽  
Mery Malandrino ◽  
Beatrice Moroni ◽  
David Cappelletti ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Tandem Mass Spectrometry ◽  
Inductively Coupled Plasma ◽  
Isotopic Analysis ◽  
New Method ◽  
Tandem Mass ◽  
Inductively Coupled ◽  
Icp Ms

In this work, a new method has been developed for accurate and precise Sr isotopic analysis of microsamples via inductively coupled plasma - tandem mass spectrometry (ICP-MS/MS). For introduction of...

Development and evaluation of an element-tagged immunoassay coupled with inductively coupled plasma mass spectrometry detection: can we apply the new assay in the clinical laboratory?

2020 ◽  
Vol 58 (6) ◽  
pp. 873-882 ◽  
Author(s):  
Wencan Jiang ◽  
Gongwei Sun ◽  
Xinyu Wen ◽  
Shasha Men ◽  
Wenbin Cui ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Inductively Coupled Plasma ◽  
Clinical Laboratory ◽  
Clinical Sample ◽  
New Method ◽  
Systematic Evaluation ◽  
Clinical Samples ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Plasma Mass Spectrometry

AbstractIntroductionElement-tagged immunoassay coupled with inductively coupled plasma-mass spectrometry (ICP-MS) detection has the potential to revolutionize immunoassay analysis in clinical detection; however, a systematic evaluation with the standard guidelines of the assay is needed to ensure its performance meets the requirements of the clinical laboratory.MethodsCarcinoembryonic antigen (CEA) was chosen for analysis using the proposed method. A systematic evaluation of the proposed assay was carried out according to the Clinical and Laboratory Standards Institute (CLSI). The 469 clinical samples were analyzed using the new method and compared with the electrochemiluminescent immunoassay (ECLIA) method.ResultsThe measurement range of the assay was 1–900 ng/mL, with a detection limit of 0.83 ng/mL. The inter-assay and intra-assay imprecision were 4.67% and 5.38% with high concentration samples, and 9.27% and 17.64% with low concentration samples, respectively. The cross-reactivity (%) for different antigens was less than 0.05%, and the recovery was between 94% and 108%. Percentage deviation of all the dilutions was less than 12.5% during linearity estimation. The interference bias caused by different substances was less than 10%. The reference interval of the assay was 0–4.442 ng/mL. Comparison with the commercial ECLIA method for clinical sample detection, the proposed method showed a correlation of 0.9878 and no significant differences between the methods were observed (p = 0.6666).ConclusionsThe ICP-MS based immunoassay was successfully developed, and the analytical performance of the assay met the requirements of the CLSI, which fully proved the clinical transferability and application of the new method.

scholarly journals Advanced in situ geochronological and trace element microanalysis by laser ablation techniques

2006 ◽  
Vol 10 ◽  
pp. 25-28 ◽  
Author(s):  
Dirk Frei ◽  
Julie A. Hollis ◽  
Axel Gerdes ◽  
Dan Harlov ◽  
Christine Karlsson ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Laser Ablation ◽  
Trace Element ◽  
Inductively Coupled Plasma ◽  
Age Dating ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Wide Range ◽  
Plasma Mass Spectrometry

Laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) was developed in 1985 and the first commercial laser ablation systems were introduced in the mid 1990s. Since then, LA-ICP-MS has become an important analytical tool in the earth sciences. Initially, the main interest for geologists was in its ability to quantitatively determine the contents of a wide range of elements in many minerals at very low concentrations (a few ppm and below) with relatively high spatial resolution (spot diameters of typically 30–100 μm). The potential of LA-ICP-MS for rapid in situ U–Th–Pb geochronology was already realised in the early to mid 1990s. However, the full potential of LA-ICP-MS as the low-cost alternative to ion-microprobe techniques for highly precise and accurate in situ U–Th–Pb age dating was not realised until the relatively recent advances in laser technologies and the introduction of magnetic sectorfield ICP-MS (SF-ICPMS) instruments. In March 2005, the Geological Survey of Denmark and Greenland (GEUS) commissioned a new laser ablation magnetic sectorfield inductively coupled plasma mass spectrometry (LA-SF-ICP-MS) facility employing a ThermoFinnigan Element2 high resolution magnetic sectorfield ICP-MS and a Merchantek New Wave 213 nm UV laser ablation system. The new GEUS LA-SF-ICP-MS facility is widely used on Survey research projects in Denmark and Greenland, as well as in collaborative research and contract projects conducted with partners from academia and industry worldwide. Here, we present examples from some of the these ongoing studies that highlight the application of the new facility for advanced geochronological and trace element in situ microanalysis of geomaterials. The application of LASF-ICP-MS based in situ zircon geochronology to regional studies addressing the Archaean geology of southern West Greenland is presented by Hollis et al. (2006, this volume).

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