scholarly journals Detection of Local Cu-to-Cu Bonding Defects in Wafer-to-Wafer Hybrid Bonding Using GHz-SAM

Author(s):  
Ingrid de Wolf ◽  
Ahmad Khaled ◽  
Soon-Wook Kim ◽  
Soon-Wook Kim ◽  
Eric Beyne ◽  
...  

Abstract This paper demonstrates the application of GHz-SAM for the detection of local non-bonded regions between micron-sized Cu-pads in a wafer-to-wafer hybrid bonded sample. GHz-SAM is currently the only available non-destructive failure analysis technique that can offer this information on wafer level scale, with such high resolution.

Author(s):  
Yi-Sheng Lin ◽  
Yu-Hsiang Hsiao ◽  
Shu-Hua Lee

Abstract Electro Optical Terahertz Pulse Reflectometry (EOTPR) is an E-FA (Electrical Failure Analysis) technique in the semiconductor industry for non-destructive electrical fault isolation for shorts, leakages and opens. This paper introduces the capability and presents several case studies identifying the physical location of defects where EOTPR is useful as a non-destructive analysis technique. In this paper, the methodology and application of EOTPR on open and short failure isolations in advanced 2.5D IC and wafer level packages (WLP) have been presented. The experimental results of P-FA (Physical Failure Analysis) verify the accuracy of the EOTPR system in determining the distance to defect.


Author(s):  
Dandan Wang ◽  
Hua Feng ◽  
Pik Kee Tan ◽  
Guorong Low ◽  
Khiam Oh Chong ◽  
...  

Abstract Focused Ion Beam is widely used in semiconductor industry for critical applications such as TEM sample preparation and circuit edit. In this paper, we introduce an automated failure analysis technique for high precision polishing at the wafer level. Using FIB, it is possible to precisely mill at a region of interest, capture images at the region of interest simultaneously and cut into the die directly to expose the exact failure without damaging other sections of the specimen.


Author(s):  
Naoki Seimiya ◽  
Takuhei Watanabe ◽  
Takashi Ichinomiya

Abstract We developed the non-destructive failure analysis method that is combination of Lock-in thermography (LIT) and high resolution 3D oblique CT. It made possible to complete the total analysis efficiently, because we can distinguish the type of failure by this non-destructive method.


Author(s):  
Yan Li ◽  
Liang Hu ◽  
Gang Li ◽  
Rajen Dias ◽  
Deepak Goyal

Abstract Fault isolation and failure analysis for Si related issues in microelectronic packages need non-destructive and high resolution techniques to reduce the analysis time. This paper illustrates non-destructive and high resolution CSAM techniques, which are shown to be very effective in subtle thin film defect and die edge defect CSAM imaging.


Author(s):  
Erick Kim ◽  
Kamjou Mansour ◽  
Gil Garteiz ◽  
Javeck Verdugo ◽  
Ryan Ross ◽  
...  

Abstract This paper presents the failure analysis on a 1.5m flex harness for a space flight instrument that exhibited two failure modes: global isolation resistances between all adjacent traces measured tens of milliohm and lower resistance on the order of 1 kiloohm was observed on several pins. It shows a novel method using a temperature controlled air stream while monitoring isolation resistance to identify a general area of interest of a low isolation resistance failure. The paper explains how isolation resistance measurements were taken and details the steps taken in both destructive and non-destructive analyses. In theory, infrared hotspot could have been completed along the length of the flex harness to locate the failure site. However, with a field of view of approximately 5 x 5 cm, this technique would have been time prohibitive.


Author(s):  
Bhanu Sood ◽  
Lucas Severn ◽  
Michael Osterman ◽  
Michael Pecht ◽  
Anton Bougaev ◽  
...  

Abstract A review of the prevalent degradation mechanisms in Lithium ion batteries is presented. Degradation and eventual failure in lithium-ion batteries can occur for a variety of dfferent reasons. Degradation in storage occurs primarily due to the self-discharge mechanisms, and is accelerated during storage at elevated temperatures. The degradation and failure during use conditions is generally accelerated due to the transient power requirements, the high frequency of charge/discharge cycles and differences between the state-of-charge and the depth of discharge influence the degradation and failure process. A step-by-step methodology for conducting a failure analysis of Lithion batteries is presented. The failure analysis methodology is illustrated using a decision-tree approach, which enables the user to evaluate and select the most appropriate techniques based on the observed battery characteristics. The techniques start with non-destructive and non-intrusive steps and shift to those that are more destructive and analytical in nature as information about the battery state is gained through a set of measurements and experimental techniques.


Author(s):  
Kuo Hsiung Chen ◽  
Wen Sheng Wu ◽  
Yu Hsiang Shu ◽  
Jian Chan Lin

Abstract IR-OBIRCH (Infrared Ray – Optical Beam Induced Resistance Change) is one of the main failure analysis techniques [1] [2] [3] [4]. It is a useful tool to do fault localization on leakage failure cases such as poor Via or contact connection, FEoL or BEoL pattern bridge, and etc. But the real failure sites associated with the above failure mechanisms are not always found at the OBIRCH spot locations. Sometimes the real failure site is far away from the OBIRCH spot and it will result in inconclusive PFA Analysis. Finding the real failure site is what matters the most for fault localization detection. In this paper, we will introduce one case using deep sub-micron process generation which suffers serious high Isb current at wafer donut region. In this case study a BEoL Via poor connection is found far away from the OBIRCH spots. This implies that layout tracing skill and relation investigation among OBIRCH spots are needed for successful failure analysis.


Author(s):  
O. Diaz de Leon ◽  
M. Nassirian ◽  
C. Todd ◽  
R. Chowdhury

Abstract Integration of circuits on semiconductor devices with resulting increase in pin counts is driving the need for improvements in packaging for functionality and reliability. One solution to this demand is the Flip- Chip concept in Ultra Large Scale Integration (ULSI) applications [1]. The flip-chip technology is based on the direct attach principle of die to substrate interconnection.. The absence of bondwires clearly enables packages to become more slim and compact, and also provides higher pin counts and higher-speeds [2]. However, due to its construction, with inherent hidden structures the Flip-Chip technology presents a challenge for non-destructive Failure Analysis (F/A). The scanning acoustic microscope (SAM) has recently emerged as a valuable evaluation tool for this purpose [3]. C-mode scanning acoustic microscope (C-SAM), has the ability to demonstrate non-destructive package analysis while imaging the internal features of this package. Ultrasonic waves are very sensitive, particularly when they encounter density variations at surfaces, e.g. variations such as voids or delaminations similar to air gaps. These two anomalies are common to flip-chips. The primary issue with this package technology is the non-uniformity of the die attach through solder ball joints and epoxy underfill. The ball joints also present defects as open contacts, voids or cracks. In our acoustic microscopy study packages with known defects are considered. It includes C-SCAN analysis giving top views at a particular package interface and a B-SCAN analysis that provides cross-sectional views at a desired point of interest. The cross-section analysis capability gives confidence to the failure analyst in obtaining information from a failing area without physically sectioning the sample and destroying its electrical integrity. Our results presented here prove that appropriate selection of acoustic scanning modes and frequency parameters leads to good reliable correlation between the physical defects in the devices and the information given by the acoustic microscope.


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