scholarly journals Temperature Dependence of Dielectric Properties of Ferroelectric Heterostructures with Domain-Provided Negative Capacitance

Nanomaterials ◽  
2021 ◽  
Vol 12 (1) ◽  
pp. 75
Author(s):  
Maksim A. Pavlenko ◽  
Yuri A. Tikhonov ◽  
Anna G. Razumnaya ◽  
Valerii M. Vinokur ◽  
Igor A. Lukyanchuk

It is well known that the ferroelectric layers in dielectric/ferroelectric/dielectric heterostructures harbor polarization domains resulting in the negative capacitance crucial for manufacturing energy-efficient field-effect transistors. However, the temperature behavior of the characteristic dielectric properties, and, hence, the corresponding behavior of the negative capacitance, are still poorly understood, restraining the technological progress thereof. Here we investigate the temperature-dependent properties of domain structures in the SrTiO3/PbTiO3/SrTiO3 heterostructures and demonstrate that the temperature–thickness phase diagram of the system includes the ferroelectric and paraelectric regions, which exhibit different responses to the applied electric field. Using phase-field modeling and analytical calculations we find the temperature dependence of the dielectric constant of ferroelectric layers and identify the regions of the phase diagram wherein the system demonstrates negative capacitance. We further discuss the optimal routes for implementing negative capacitance in energy-efficient ferroelectric field-effect transistors.

2010 ◽  
Vol 96 (15) ◽  
pp. 153505 ◽  
Author(s):  
Henrik A. Nilsson ◽  
Philippe Caroff ◽  
Claes Thelander ◽  
Erik Lind ◽  
Olov Karlström ◽  
...  

2020 ◽  
Vol 10 (8) ◽  
pp. 2979
Author(s):  
Soohyun Kim ◽  
Jungchun Kim ◽  
Doyoung Jang ◽  
Romain Ritzenthaler ◽  
Bertrand Parvais ◽  
...  

The temperature dependent carrier transport characteristics of n-type gate-all-around nanowire field effect transistors (GAA NW-FET) on bulk silicon are experimentally compared to bulk fin field effect transistors (FinFET) over a wide range of temperatures (25–125 °C). A similar temperature dependence of threshold voltage (VTH) and subthreshold swing (SS) is observed for both devices. However, effective mobility (μeff) shows significant differences of temperature dependence between GAA NW-FET and FinFET at a high gate effective field. At weak Ninv (= 5 × 1012 cm2/V∙s), both GAA NW-FET and FinFET are mainly limited by phonon scattering in μeff. On the other hand, at strong Ninv (= 1.5 × 1013 cm2/V∙s), GAA NW-FET shows 10 times higher dμeff/dT and 1.6 times smaller mobility degradation coefficient (α) than FinFET. GAA NW-FET is less limited by surface roughness scattering, but FinFET is relatively more limited by surface roughness scattering in carrier transport.


2018 ◽  
Vol 30 (28) ◽  
pp. 1800932 ◽  
Author(s):  
Xingqiang Liu ◽  
Renrong Liang ◽  
Guoyun Gao ◽  
Caofeng Pan ◽  
Chunsheng Jiang ◽  
...  

2021 ◽  
Vol 186 ◽  
pp. 108181
Author(s):  
Baoliang Liu ◽  
Xiaoqing Huang ◽  
Yanxin Jiao ◽  
Ning Feng ◽  
Xuhui Chen ◽  
...  

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