scholarly journals Direct white noise characterization of short-channel MOSFETs

Author(s):  
Kenji Ohmori ◽  
Shuhei Amakawa

On-wafer evaluation of white thermal and shot noise in nanoscale MOSFETs is demonstrated by directly sensing the drain current under zero- and nonzsero-drain-bias (V<sub>d</sub>) conditions for the first time, without recourse to a hot noise source, commonly needed in noise figure measurement. The dependence of white noise intensity on the drain bias clearly shows thermal noise at V<sub>d</sub>=0 V and shot noise at V<sub>d</sub>>0 V with its gate-bias-dependent suppression. An empirical expression for the Fano factor (shot-noise suppression factor) that is well-behaved even at V<sub>d</sub>=0V exactly and suitable for measurement-based evaluation is proposed. The direct measurement approach could allow more accurate and predictive noise modeling of RF MOSFETs than has conventionally been possible.

2020 ◽  
Author(s):  
Kenji Ohmori ◽  
Shuhei Amakawa

On-wafer evaluation of white thermal and shot noise in nanoscale MOSFETs is demonstrated by directly sensing the drain current under zero- and nonzsero-drain-bias (V<sub>d</sub>) conditions for the first time, without recourse to a hot noise source, commonly needed in noise figure measurement. The dependence of white noise intensity on the drain bias clearly shows thermal noise at V<sub>d</sub>=0 V and shot noise at V<sub>d</sub>>0 V with its gate-bias-dependent suppression. An empirical expression for the Fano factor (shot-noise suppression factor) that is well-behaved even at V<sub>d</sub>=0V exactly and suitable for measurement-based evaluation is proposed. The direct measurement approach could allow more accurate and predictive noise modeling of RF MOSFETs than has conventionally been possible.


2021 ◽  
Author(s):  
Kenji Ohmori ◽  
Shuhei Amakawa

On-wafer evaluation of white thermal and shot noise in nanoscale MOSFETs is demonstrated by directly sensing the drain current under zero- and nonzsero-drain-bias (V<sub>d</sub>) conditions for the first time, without recourse to a hot noise source, commonly needed in noise figure measurement. The dependence of white noise intensity on the drain bias clearly shows thermal noise at V<sub>d</sub>=0 V and shot noise at V<sub>d</sub>>0 V with its gate-bias-dependent suppression. An empirical expression for the Fano factor (shot-noise suppression factor) that is well-behaved even at V<sub>d</sub>=0V exactly and suitable for measurement-based evaluation is proposed. The direct measurement approach could allow more accurate and predictive noise modeling of RF MOSFETs than has conventionally been possible.


2011 ◽  
Vol 10 (04) ◽  
pp. 381-394 ◽  
Author(s):  
AISHA GOKCE ◽  
RYAN STEARRETT ◽  
E. R. NOWAK ◽  
C. NORDMAN

Charge-current shot noise is investigated in single magnetic tunnel junctions and devices having multiple junctions that are connected in series. The ratio of the measured shot noise in single junctions to the expected Poisson value, namely the Fano factor, F, is observed to vary from 1 to well below 0.5. Deviations from F = 1 are attributed to localized states (defects) located in the tunnel barrier or at the interfaces with the magnetic electrodes. For series arrays of junctions, the Fano factor scales inversely with the number (1 ≤ N ≤ 30) of junctions in series, even for junctions exhibiting sub-Poissonian (F < 1) shot noise. The 1/N scaling is consistent with the incoherent tunneling of electrons across junctions and indicates that each junction behaves as an individual noise source. The advantages of incorporating series arrays of magnetic tunnel junctions into devices for magnetic field sensing are discussed.


2021 ◽  
Author(s):  
Kenji Ohmori ◽  
Shuhei Amakawa

<p>We propose a methodology of variable-temperature broadband noise characterization for cryogenic MOSFETs. A DUT is mounted on a reusable PCB <i>vehicle</i> with a built-in low-noise amplifier, and loaded into a cryogenic chamber. Using the vehicle, we measured flicker (low frequency) and white noise, and have successfully revealed dominance of shot noise in the temperature range from 300 to 120 K for the first time.</p>


1992 ◽  
Vol 258 ◽  
Author(s):  
G. Fortunato ◽  
L. Mariucci ◽  
A. Mattacchini ◽  
A. Pecora

ABSTRACTAn avalanche increase of the drain current for high source-drain voltage (commonly called “kink effect”) has been observed for the first time in short-channel amorphous silicon thin-film transistors, fabricated using electron-beam lithography. This effect, caused by generation mechanisms at the drain junction, has been shown to be not only field but also temperature enhanced. The Frenkel-Poole mechanism is proposed in order to explain the data.


2021 ◽  
Vol 68 (4) ◽  
pp. 1478-1482 ◽  
Author(s):  
Kenji Ohmori ◽  
Shuhei Amakawa

2021 ◽  
Author(s):  
Kenji Ohmori ◽  
Shuhei Amakawa

<p>We propose a methodology of variable-temperature broadband noise characterization for cryogenic MOSFETs. A DUT is mounted on a reusable PCB <i>vehicle</i> with a built-in low-noise amplifier, and loaded into a cryogenic chamber. Using the vehicle, we measured flicker (low frequency) and white noise, and have successfully revealed dominance of shot noise in the temperature range from 300 to 120 K for the first time.</p>


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