scholarly journals 3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

2017 ◽  
Vol 8 ◽  
pp. 801-812 ◽  
Author(s):  
Brett B Lewis ◽  
Robert Winkler ◽  
Xiahan Sang ◽  
Pushpa R Pudasaini ◽  
Michael G Stanford ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Electron Beam ◽  
Pulsed Laser ◽  
Grain Structure ◽  
Platinum Concentration ◽  
Platinum Nanowires ◽  
Structure Morphology ◽  
Electron Beam Induced Deposition ◽  
High Degree

We investigate the growth, purity, grain structure/morphology, and electrical resistivity of 3D platinum nanowires synthesized via electron beam induced deposition with and without an in situ pulsed laser assist process which photothermally couples to the growing Pt–C deposits. Notably, we demonstrate: 1) higher platinum concentration and a coalescence of the otherwise Pt–C nanogranular material, 2) a slight enhancement in the deposit resolution and 3) a 100-fold improvement in the conductivity of suspended nanowires grown with the in situ photothermal assist process, while retaining a high degree of shape fidelity.

scholarly journals A novel copper precursor for electron beam induced deposition

2018 ◽  
Vol 9 ◽  
pp. 1220-1227 ◽  
Author(s):  
Caspar Haverkamp ◽  
George Sarau ◽  
Mikhail N Polyakov ◽  
Ivo Utke ◽  
Marcos V Puydinger dos Santos ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical Transmission ◽  
Pure Copper ◽  
Dielectric Behavior ◽  
Copper Oxidation ◽  
Transmission Electron ◽  
Sum Formula ◽  
Electron Beam Induced Deposition ◽  
High Degree ◽  
Good Agreement

A fluorine free copper precursor, Cu(tbaoac)2 with the chemical sum formula CuC16O6H26 is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microscopy proved that pure copper nanocrystals with sizes of up to around 15 nm were dispersed inside the carbonaceous matrix. Raman investigations revealed a high degree of amorphization of the carbonaceous matrix and showed hints for partial copper oxidation taking place selectively on the surfaces of the deposits. Optical transmission/reflection measurements of deposited pads showed a dielectric behavior of the material in the optical spectral range. The general behavior of the permittivity could be described by applying the Maxwell–Garnett mixing model to amorphous carbon and copper. The dielectric function measured from deposited pads was used to simulate the optical response of tip arrays fabricated out of the same precursor and showed good agreement with measurements. This paves the way for future plasmonic applications with copper-FEBID.

scholarly journals In Situ Real-Time Annealing of Ultrathin Vertical Fe Nanowires Grown by Focused Electron Beam Induced Deposition

2019 ◽  
Author(s):  
Javier Pablo-Navarro ◽  
Robert Winkler ◽  
Georg Haberfehlner ◽  
César Magén ◽  
Harald Plank ◽  
...  
Keyword(s):  
Electron Beam ◽  
Real Time ◽  
Electron Beam Induced Deposition

In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films

2021 ◽  
Vol 130 (8) ◽  
pp. 085301
Author(s):  
M. Novotný ◽  
P. Fitl ◽  
S. A. Irimiciuc ◽  
J. Bulíř ◽  
J. More-Chevalier ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
In Situ Monitoring ◽  
Laser Deposition ◽  
Silver Films

scholarly journals In situ growth optimization in focused electron-beam induced deposition

2013 ◽  
Vol 4 ◽  
pp. 919-926 ◽  
Author(s):  
Paul M Weirich ◽  
Marcel Winhold ◽  
Christian H Schwalb ◽  
Michael Huth
Keyword(s):  
Electron Beam ◽  
Rate Of Change ◽  
In Situ Growth ◽  
Growth Optimization ◽  
Evolutionary Genetic ◽  
Order Of Magnitude ◽  
Electron Beam Induced Deposition ◽  
Deposition Processes ◽  
Fitness Parameter

We present the application of an evolutionary genetic algorithm for the in situ optimization of nanostructures that are prepared by focused electron-beam-induced deposition (FEBID). It allows us to tune the properties of the deposits towards the highest conductivity by using the time gradient of the measured in situ rate of change of conductance as the fitness parameter for the algorithm. The effectiveness of the procedure is presented for the precursor W(CO)6 as well as for post-treatment of Pt–C deposits, which were obtained by the dissociation of MeCpPt(Me)3. For W(CO)6-based structures an increase of conductivity by one order of magnitude can be achieved, whereas the effect for MeCpPt(Me)3 is largely suppressed. The presented technique can be applied to all beam-induced deposition processes and has great potential for a further optimization or tuning of parameters for nanostructures that are prepared by FEBID or related techniques.

Electron Beam-Induced Deposition for Atom Probe Tomography Specimen Capping Layers

2016 ◽  
Vol 23 (2) ◽  
pp. 321-328 ◽  
Author(s):  
David R. Diercks ◽  
Brian P. Gorman ◽  
Johannes J. L. Mulders
Keyword(s):  
Electron Beam ◽  
Atom Probe Tomography ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Atom Probe ◽  
Near Surface ◽  
Surface Features ◽  
Dicobalt Octacarbonyl ◽  
Electron Beam Induced Deposition

AbstractSix precursors were evaluated for use as in situ electron beam-induced deposition capping layers in the preparation of atom probe tomography specimens with a focus on near-surface features where some of the deposition is retained at the specimen apex. Specimens were prepared by deposition of each precursor onto silicon posts and shaped into sub-70-nm radii needles using a focused ion beam. The utility of the depositions was assessed using several criteria including composition and uniformity, evaporation behavior and evaporation fields, and depth of Ga+ ion penetration. Atom probe analyses through depositions of methyl cyclopentadienyl platinum trimethyl, palladium hexafluoroacetylacetonate, and dimethyl-gold-acetylacetonate [Me2Au(acac)] were all found to result in tip fracture at voltages exceeding 3 kV. Examination of the deposition using Me2Au(acac) plus flowing O2 was inconclusive due to evaporation of surface silicon from below the deposition under all analysis conditions. Dicobalt octacarbonyl [Co2(CO)8] and diiron nonacarbonyl [Fe2(CO)9] depositions were found to be effective as in situ capping materials for the silicon specimens. Their very different evaporation fields [36 V/nm for Co2(CO)8 and 21 V/nm for Fe2(CO)9] provide options for achieving reasonably close matching of the evaporation field between the capping material and many materials of interest.

scholarly journals Identifying the crossover between growth regimes via in-situ conductance measurements in focused electron beam induced deposition

2014 ◽  
Vol 1 (1) ◽  
Author(s):  
M. Winhold ◽  
P. M. Weirich ◽  
C. H. Schwalb ◽  
M. Huth
Keyword(s):  
Genetic Algorithm ◽  
Electron Beam ◽  
Elevated Temperatures ◽  
Ion Beam ◽  
Optimization Procedure ◽  
Ternary Systems ◽  
Deposition Process ◽  
Algorithm Optimization ◽  
Electron Beam Induced Deposition

AbstractFocused electron beam induced deposition presents a promising technique for the fabrication of nanostructures. However, due to the dissociation of mostly organometallic precursor molecules employed for the deposition process, prepared nanostructures contain organic residues leading to rather low conductance of the deposits. Post-growth treatment of the structures by electron irradiation or in reactive atmospheres at elevated temperatures can be applied to purify the samples. Recently, an in-situ conductance optimization process involving evolutionary genetic algorithm techniques has been introduced leading to an increase of conductance by one order of magnitude for tungsten-based deposits using the precursor W(CO)6. This method even allows for the optimization of conductance of nano-structures for which post-growth treatment is not possible or desirable. However, the mechanisms responsible for the observed enhancement have not been studied in depth. In this work, we identified the dwell-time dependent change of conductivity of the samples to be the major contributor to the change of conductance. Specifically, the chemical composition drastically changes with a variation of dwelltime resulting in an increase of the metal content by 15 at% for short dwell-times. The relative change of growth rate amounts to less than 25 % and has a negligible influence on conductance. We anticipate the in-situ genetic algorithm optimization procedure to be of high relevance for new developments regarding binary or ternary systems prepared by focused electron or ion beam induced deposition.

scholarly journals In situ real-time annealing of ultrathin vertical Fe nanowires grown by focused electron beam induced deposition

2019 ◽  
Vol 174 ◽  
pp. 379-386 ◽  
Author(s):  
Javier Pablo-Navarro ◽  
Robert Winkler ◽  
Georg Haberfehlner ◽  
César Magén ◽  
Harald Plank ◽  
...  
Keyword(s):  
Electron Beam ◽  
Real Time ◽  
Electron Beam Induced Deposition

scholarly journals Growth and nanomechanical characterization of nanoscale 3D architectures grown via focused electron beam induced deposition

Nanoscale ◽  
2017 ◽  
Vol 9 (42) ◽  
pp. 16349-16356 ◽  
Author(s):  
Brett B. Lewis ◽  
Brittnee A. Mound ◽  
Bernadeta Srijanto ◽  
Jason D. Fowlkes ◽  
George M. Pharr ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Electron Beam Induced Deposition ◽  
Scanning Electron

Nanomechanical measurements of platinum–carbon 3D nanoscale architectures grown via focused electron beam induced deposition (FEBID) were performed using a nanoindentation system in a scanning electron microscope (SEM) for simultaneous in situ imaging.

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